Patent US1496891A successfully refreshed from Google Patents.
Patent EP0264908A2 successfully refreshed from Google Patents.
EP0264908A2
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EP
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High sensitivity resists having autodecomposition temperatures greater than about 160 C
Assignee: International Business Machines Corp
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Filing: 1987-10-20
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Granted: —
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Expires: 2007-10-20
Abstract
Abstract The present invention relates to increasing the autodecomposition temperature of particular resists. The resists are comprised of structures having recurrent acid labile groups which are typically pendant to the polymeric backbone. The autodecomposition temperature of a resist is increased by selecting substituent sidechains on the acid labile group which exhibit increased stability. Sidechain structures which provide increased autodecomposition stability include secondary structures capable of forming secondary carbonium ion intermediates and having an available proton adjacent to the carbonium ion formed during cleavage. Moieties which can be used as the secondary sidechain structures include secondary alkyl, including both cyclic and alicyclic alkyl, substituted deactivated secondary benzyl, and substituted deactivated secondary heterocyclics.
Inventors
- 👤 William Ross Brunsvold
- 👤 Willard Earl Conley
- 👤 Dale Murray Crockatt
- 👤 Nancy Ellen Iwamoto
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-10-30 07:31
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/039
Claims Analysis
Total Claims: 18
Claim 1
Independent Claim
57 words
A resist comprised of at least one polymer copolymer or terpolymer having recurrent acid labile groups pendant to the polymer backbone, wherein the improvement comprises: selecting a substituent side chain on said acid labile groups which is capable of forming secondary carbonium ion intermediates and having an avilable proton adjacent to the carbonium ion formed during cleavage.
Claim 2
Dependent Claim
57 words
A resist comprised of at least one polymer copolymer or terpolymer having recurrent acid labile groups pendant to the polymer backbone, wherein the improvement comprises: selecting a substituent side chain on said acid labile groups which is capable of forming secondary carbonium ion intermediates and having an avilable proton adjacent to the carbonium ion formed during cleavage.
Claim 3
Dependent Claim
19 words
The resist of Claim 1 wherein the autodecomposition temperature of said recurrent acid labile groups is greater than 160°C.
Claim 4
Dependent Claim
32 words
The resist of Claim 1 wherein said substituent side chain, upon acid-catalyzed deprotection of said acid labile group, is capable of forming a less stable intermediate carbonium ion than a t-butyl ion.
Claim 5
Dependent Claim
32 words
The resist of Claim 1 wherein said substituent side chain is selected from the group consisting of cyclic secondary alkyl, alicyclic secondary alkyl, substituted deactivated secondary benzyl, and substituted deactivated secondary heterocyclics.
Claim 6
Dependent Claim
21 words
The resist of Claim 4 wherein said cyclic and alicyclic secondary alkyls are comprised of up to about 10 carbon atoms.
Claim 7
Dependent Claim
21 words
The resist of Claim 5 wherein said cyclic and alicyclic secondary alkyls are comprised of up to about 6 carbon atoms.
Claim 8
Dependent Claim
22 words
The resist of Claim 6 wherein said secondary alkyls are selected from the group consisting of cyclohexyl-, sec-butyl, isopropyl, isobutyl, and 2-pentyl.
Claim 9
Dependent Claim
55 words
The resist of Claim 4 wherein said substituted deactivated secondary benzyl is selected from the group consisting of 1-(4-nitrophenyl)alkyl-, 1-(3-methoxyphe- nyl)alkyl-, and 1-(4-methoxycarbonyl-phenyl)alkyl-, wherein the alkyl group comprises up to about 4 carbon atoms, and 1-(3-halophenyl alkyl, wherein the halogen is C1, Br, or I, wherein the alkyl comprises up to about 4 carbon atoms.
Claim 10
Dependent Claim
25 words
The resist of Claim 8 wherein said substituted deactivated secondary benzyl is selected from the group consisting of 1-(4-nitrophenyl) ethyl - and 1-(3-methoxy- phenyl) ethyl.
Claim 11
Dependent Claim
24 words
The resist of Claim 4 wherein said substituted deactivated secondary heterocyclic is selected from the group consisting of 1-(2-tetrahydrofurfuryl) alkyl- and (1-(4-or 2-pyridyl) alkyl.
Claim 12
Dependent Claim
15 words
The resist of Claim 10 wherein said substituted deactivated secondary heterocyclic is 1-(2-tetrahydrofur- furyl) ethyl.
Claim 13
Dependent Claim
35 words
A method of using the resist of Claim 1, comprising: (a) providing a layer of said resist; and (b) irradiating said resist to initiate the formation of a hydrogen-bonded polymeric structure in the irradiated areas.
Claim 14
Dependent Claim
47 words
The method of Claim 12 wherein said polymer is selected from the group consisting of substituted polyvinyl benzoates, substituted polyvinylphenols, substituted maleimide-comprising polymers, substituted styrene-maleimide copolymers and terpolymers, substituted styrene-acrylate copolymers and terpolymers, and other copolymers or terpolymers comprising styrene and containing functionalities capable of hydrogen bonding.
Claim 15
Dependent Claim
27 words
The method of Claims 12 or Claim 13 including the additional step: (c) developing said resist to provide a positive tone or a negative tone resist pattern.
Claim 16
Dependent Claim
111 words
A method of using the resist of Claim 1, comprising: (a) applying a layer of said resist of Claim 1 to a substrate; (b) applying a layer ofa diazoquinone sensitized novolak resist over said underlaying layer of said resist of Claim 1; (c) imaging said diazoquinone sensitized novolak resist to provide a patterned resist layer over said underlaying layer of said resist of Claim 1; and (d) irradiating the overall resist structure using a radiation wavelength ranging from about 200 nm to about 300 nm, so that exposed portions of said underlaying layer of resist of Claim 1 are exposed to radiation in areas wherein the novolak resist is not present.
Claim 17
Dependent Claim
51 words
The method of Claim 15 wherein said resist of Claim 1 is comprised of a polymer selected from the group consisting of substituted polyvinyl benzoates, substituted polyvinylphenols, substituted maleimide copolymers and terpolymers, substituted styrene-acrylate copolymers and terpolymers, and other copolymers or terpolymers comprising styrene and containing functionalities capable of hydrogen bonding.
Claim 18
Dependent Claim
28 words
The method of Claim 15 or Claim 16 including the additional step: (e) developing said underlaying resist to provide a positive tone or a negative tone resist pattern.
References Cited (Backward Citations)
No citation records indexed.
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