Patent EP0413282A2 successfully refreshed from Google Patents.
EP0413282A2
Expired / Lapsed
EP
⏱️ 0.0 years remaining
Method and apparatus for producing magnetically-coupled planar plasma
Assignee: Lam Research Corp
•
Filing: 1990-08-11
•
Granted: —
•
Expires: 2010-08-11
Abstract
Abstract An apparatus for producing a planar plasma in a low pressure process gas includes a chamber (12) and an external planar coil (20). Radiofrequency resonant current is induced in the planar coil which in turn produces a planar magnetic field within the enclosure. The magnetic field causes circulating flux of electrons which in turn produces a planar region of ionic and radical species. The system may be used for plasma treatment of a variety of planar articles, typically semiconductor wafers which are oriented parallel to the plasma within the enclosure.
Inventors
- 👤 John Seldon Ogle
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-04 23:54
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32009; H01J37/32082; H01J37/321; H10; H10P; H10P50/00; H05; H05H; H05H1/00; H05H1/24; H05H1/46
Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
88 words
An apparatus for producing a planar plasma, said apparatus comprising: an enclosure having an interior bounded at least in part by a dielectric shield; means for introducing a process gas to the interior of the enclosure; an electrically-conductive substantially planar coil disposed outside the enclosure proximate the dielectric shield; and means for coupling a radiofrequency source to the coil, said coupling means including (1) means for matching the impedance of the radiofrequency source to the coil and (2) means for tuning the resulting circuit to provide for resonance.
Claim 2
Independent Claim
88 words
An apparatus for producing a planar plasma, said apparatus comprising: an enclosure having an interior bounded at least in part by a dielectric shield; means for introducing a process gas to the interior of the enclosure; an electrically-conductive substantially planar coil disposed outside the enclosure proximate the dielectric shield; and means for coupling a radiofrequency source to the coil, said coupling means including (1) means for matching the impedance of the radiofrequency source to the coil and (2) means for tuning the resulting circuit to provide for resonance.
Claim 3
Independent Claim
85 words
An apparatus for treating articles with a plasma, said apparatus comprising: an enclosure having an interior bounded at least in part by a dielectric shield; means within the enclosure for supporting the article to be treated in a preselected plane; an electrically conductive planar coil disposed outside the enclosure proximate the dielectric shield, said coil being oriented parallel to the preselected plane; means for coupling a radiofrequency source to the planar coil; and means for introducing a process gas into the enclosure under controlled pressure.
Claim 4
Independent Claim
85 words
An apparatus for treating articles with a plasma, said apparatus comprising: an enclosure having an interior bounded at least in part by a dielectric shield; means within the enclosure for supporting the article to be treated in a preselected plane; an electrically conductive planar coil disposed outside the enclosure proximate the dielectric shield, said coil being oriented parallel to the preselected plane; means for coupling a radiofrequency source to the planar coil; and means for introducing a process gas into the enclosure under controlled pressure.
Claim 5
Dependent Claim
14 words
An apparatus as in claim 2, wherein the coil is arranged as a spiral.
Claim 6
Dependent Claim
14 words
An apparatus as in claim 2, wherein the coil is arranged as concentric loops.
Claim 7
Dependent Claim
40 words
An apparatus as in claim 2, wherein the means for coupling the radiofrequency generator includes (1) means for matching the impedance of the radiofrequency source to the planar coil and (2) means for tuning the circuit to provide for resonance.
Claim 8
Dependent Claim
24 words
An apparatus as in claim 2, wherein the means for introducing the process gas includes a plurality of ports which circumscribe the dielectric shield.
Claim 9
Independent Claim
64 words
A method for treating articles with a plasma, said method comprising: placing the articles within an enclosure; introducing a process gas to the enclosure at a controlled pressure; and resonating a radiofrequency current in a substantially planar coil located outside the enclosure proximate a dielectric shield formed in the enclosure, whereby a planar plasma substantially parallel to the coil is formed inside the enclosure.
Claim 10
Independent Claim
64 words
A method for treating articles with a plasma, said method comprising: placing the articles within an enclosure; introducing a process gas to the enclosure at a controlled pressure; and resonating a radiofrequency current in a substantially planar coil located outside the enclosure proximate a dielectric shield formed in the enclosure, whereby a planar plasma substantially parallel to the coil is formed inside the enclosure.
Claim 11
Dependent Claim
24 words
A method as in claim 7, wherein the article is a planar article which is oriented in a plane parallel to the planar coil.
Claim 12
Dependent Claim
13 words
A method as in claim 7, wherein the process gas is an etchant.
Claim 13
Dependent Claim
43 words
A method as in claim 7, further comprising applying a radiofrequency potential across the planar coil and a surface within the enclosure on which the article is supported, whereby plasma ions and radicals are accelerated in a direction normal to the planar article.
References Cited (Backward Citations)
No citation records indexed.
USPTO Annuity & Maintenance Windows
Maintenance schedule is calculated for granted US utility patents.