Patent JPS5226214A successfully refreshed from Google Patents.
JPS5226214A
Expired / Lapsed
JP
⏱️ 0.0 years remaining
Method for coating resist
Assignee: Hitachi Ltd
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Filing: 1975-08-25
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Granted: —
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Expires: 1995-08-25
Abstract
Abstract PURPOSE:To prevent a resist from thickening on a peripheral surface of a resist film on coating the resist on wafer by means of forming the resist film in such a manner that the rotation speed of the wafer to be coated after reaching the maximum value is kept for a slight time and reduced to that of one step below.
Inventors
- 👤 Tamotsu Sasaki
Bibliographic Details
Application Number
—
Jurisdiction
JP
Data Source
google_patents
Last Synchronized
2026-11-08 05:59
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/16; G03F7/162
Claims Analysis
Total Claims: 0
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References Cited (Backward Citations)
JPS493029A
Cited
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