Painting of electron beam

Abstract

Abstract PURPOSE:To revise the influence by proximity effect by deciding the representative point of each figure wherein the exposure amount at each representative point agrees with resist sensitivity and a painting is done at a speed corresponding to the exposure amount. CONSTITUTION:Figures 6-11 having the distance l between patterns of less than a fixed value epsilon are searched and selected to decide the maximum points, c, d, f, h, j, n, of exposure amounts as representative points. For l>epsilon, the length L and the width W are searched and figures 1, 2, 4 having the relation of L, W<=gamma are selected and the middle points, k, l, m on long sides are decided as representative points. With the exposure amount of a resist and the beam sweep speeds of figures decided, the exposure amounts at the representative points will be obtained. In this way, the exposure amount at each rpresentative point is successively obtained and the sweep speed is obtained so that the exposure amount may agree with the resist sensitivity for painting. In this way, proximity effect at the time of painting electron beams will be revised and accurate paintings will be obtained.

Inventors

• 👤 Eiji Takeda
• 👤 Nobuo Miyamoto
• 👤 Shojiro Asai

Bibliographic Details