Patent US1950506A successfully refreshed from Google Patents.
Patent US3134758A successfully refreshed from Google Patents.
US3134758A
Expired / Lapsed
US
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Vinyl esters and derivatives thereof and process of preparing same
Assignee: Kurashiki Rayon Co Ltd
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Filing: 1960-07-15
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Granted: 1964-05-26
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Expires: 1980-07-15
Abstract
No abstract record available.
Inventors
- 👤 Imoto Saburo
- 👤 Matsumoto Masakazu
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-04 23:46
CPC Classifications
C; C08; C08F; C08F18/00; C08F18/24; C08F8/00; C08F8/12; C08J; C08J5/00; C08J5/18
Claims Analysis
Total Claims: 4
Claim 1
Independent Claim
124 words
CRYSTALLINE POLYVINYL FORMATE EXHIBITING A CLEAR RING X-RAY DIFFRACTION PATTERN IN THE UNSTRETCHED CONDITION: SAID POLYVINYL FORMATE EXHIBITING A CLEAR X-RAY DIFFRACTION PATTERN OF FIBER WHEN DRAWN AND SAID DRAWN FIBER WAVVE LENGTHS BEING 5 A: SAID POLYVINYL FORMATE CONVERTIBLE BY SAPONIFICATION TO POLYVINYL ALCOHOL HAVING A SMALL CONTENT OF 1,2 GLYCOL BONDS; AND WHERE SAID POLYVINYL FORMATE IS PRODUCED BY THE PROCESS WHICH COMPRISES PREPARING A POLYMERIZATION SYSTEM COMPRISING A FREE RADICAL POLYMERIZATION CATALYST AND VINYL FORMATE MONOMER, MAINTAINING THE POLYMERIZATION SYSTEM AT A TEMPERATURE WITHIN THE RANGE OF ABOVE THE SOLIDFICATION POINT OF THE POLYMERIZATION SYSTEM TO AT MOST 0*C. DURING THE POLYMERIZATION OF SAID VINYL FORMATE MONOMER, AND RECOVERING CRYSTALLINE POLYVINYL FROMATE PRODUCED BY SAID POLYMERIZATION OF SAID VINYL FORMATE MONOMER.
Claim 2
Dependent Claim
124 words
CRYSTALLINE POLYVINYL FORMATE EXHIBITING A CLEAR RING X-RAY DIFFRACTION PATTERN IN THE UNSTRETCHED CONDITION: SAID POLYVINYL FORMATE EXHIBITING A CLEAR X-RAY DIFFRACTION PATTERN OF FIBER WHEN DRAWN AND SAID DRAWN FIBER WAVVE LENGTHS BEING 5 A: SAID POLYVINYL FORMATE CONVERTIBLE BY SAPONIFICATION TO POLYVINYL ALCOHOL HAVING A SMALL CONTENT OF 1,2 GLYCOL BONDS; AND WHERE SAID POLYVINYL FORMATE IS PRODUCED BY THE PROCESS WHICH COMPRISES PREPARING A POLYMERIZATION SYSTEM COMPRISING A FREE RADICAL POLYMERIZATION CATALYST AND VINYL FORMATE MONOMER, MAINTAINING THE POLYMERIZATION SYSTEM AT A TEMPERATURE WITHIN THE RANGE OF ABOVE THE SOLIDFICATION POINT OF THE POLYMERIZATION SYSTEM TO AT MOST 0*C. DURING THE POLYMERIZATION OF SAID VINYL FORMATE MONOMER, AND RECOVERING CRYSTALLINE POLYVINYL FROMATE PRODUCED BY SAID POLYMERIZATION OF SAID VINYL FORMATE MONOMER.
Claim 3
Dependent Claim
155 words
CRYSTALLINE POLYVINYL ALCOHOL HAVING A SMALL CONTENT OF 1, 2 GLYCOL BONDS AND A LOW DEGREE OF SWELLING IN WATER; SAID POLYVINYL ALCOHOL BEING PRODUCED BY THE SAPONIFICATION OF POLYVINYL FORMATE POLYMER; SAID POLYVINYL FORMATE POLYMER BEING OBTAINED BY THE POLYMERIZATION OF A MATERIAL SELECTED FROM THE GROUP CONSISTING OF VINYL FORMATE MONOMER AND A MONOMER MIXTURE OF VINYL FORMATE CONTAINING FROM 1% TO 25 MOL PERCENT OF VINYL ACETATE, SAID POLYMERIZATION BEING CONDUCTED AT A TEMPERATURE WITHIN THE RANGE OF ABOVE THE SOLIDIFICATION POINT OF THE POLYMERIZATION SYSTEM TO AT MOST 0*C., AND WHERE THE POLYMERIZATION SYSTEM CONSISTS OF A FREE RADICAL POLYMERIZATION CATALYST, AND COMPOUNDS SELECTED FROM THE GROUP CONSISTING OF SAID MATERIALS AND SAID MATERIALS CONTAINED IN A POLYMERIZATION SOLVENT; SAID POLYMERIZATION SOLVENT BEING SUFFICIENT TO MAINTAIN SAID MATERIALS IN SOLUTION DURING SAID POLYMERIZATION AND BEING A LOWER ALKYL FORMATE SELECTED FROM THE GROUP CONSISTING OF 1 TO 6 CARBON ALKYL FORMATES.
Claim 4
Dependent Claim
155 words
CRYSTALLINE POLYVINYL ALCOHOL HAVING A SMALL CONTENT OF 1, 2 GLYCOL BONDS AND A LOW DEGREE OF SWELLING IN WATER; SAID POLYVINYL ALCOHOL BEING PRODUCED BY THE SAPONIFICATION OF POLYVINYL FORMATE POLYMER; SAID POLYVINYL FORMATE POLYMER BEING OBTAINED BY THE POLYMERIZATION OF A MATERIAL SELECTED FROM THE GROUP CONSISTING OF VINYL FORMATE MONOMER AND A MONOMER MIXTURE OF VINYL FORMATE CONTAINING FROM 1% TO 25 MOL PERCENT OF VINYL ACETATE, SAID POLYMERIZATION BEING CONDUCTED AT A TEMPERATURE WITHIN THE RANGE OF ABOVE THE SOLIDIFICATION POINT OF THE POLYMERIZATION SYSTEM TO AT MOST 0*C., AND WHERE THE POLYMERIZATION SYSTEM CONSISTS OF A FREE RADICAL POLYMERIZATION CATALYST, AND COMPOUNDS SELECTED FROM THE GROUP CONSISTING OF SAID MATERIALS AND SAID MATERIALS CONTAINED IN A POLYMERIZATION SOLVENT; SAID POLYMERIZATION SOLVENT BEING SUFFICIENT TO MAINTAIN SAID MATERIALS IN SOLUTION DURING SAID POLYMERIZATION AND BEING A LOWER ALKYL FORMATE SELECTED FROM THE GROUP CONSISTING OF 1 TO 6 CARBON ALKYL FORMATES.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1967-05-26 | 1967-11-25 | 1968-05-26 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1971-05-26 | 1971-11-25 | 1972-05-26 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1975-05-26 | 1975-11-25 | 1976-05-26 | $7700.00 | Window Closed / Lapsed |