Semiconductor preparation and deposition process
Abstract
Abstract A PROCESS WHICH INCLUDES THE PREPARATION OF A SUBSTRATE AND SUBSEQUENT EPITAXIAL DEPOSITION OF GERMANIUM ON THE SUBSTRATE IS DESCRIBED. PREPARATION OF THE SUBSTRATE, EITHER GERMANIUM OR GALLIUM ARSENIDE, INCLUDES A CHEMICAL TREATMENT STEP TO REMOVE SURFACE FILMS, RAPID QUENCHING, RINSING AND DRYING STEPS, AND A HEATING STEP PRIOR TO DEPOSITION. DEPOSITION OF GERMANIUM IS CARRIED OUT IN AN OPEN TUBE DISPROPORTIONATION SYSTEM, BY INTRODUCING A GERMANIUM HALIDE SPECIE WHICH IS CAPABEL OF DISPROPORTIONATING AT A DEPOSITION SITE IN CONCENTRATIONS AND AT VELOCITIES SUCH THAT THE DEPOSITION OF GERMANIUM TENDS TO BE SURFACE LIMITED RATHER THAN MASS TRANSPORT LIMITED. THE DEPOSITION, PREFERABLY CARRIED OUT ON A (110) ORIENTED SUBSTRATE, IS EPITAXIAL, SMOOTH AND SHINY AND IS SUITABLE FOR SUBSEQUENT PROCESSING REQUIRING PHOTOGRAPHIC TECHNIQUES. D R A W I N G
Inventors
- 👤 Melvin Berkenblit
- 👤 Arnold Reisman
Bibliographic Details
Claims Analysis
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1974-05-03 | 1974-11-02 | 1975-05-04 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1978-05-03 | 1978-11-02 | 1979-05-04 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1982-05-03 | 1982-11-02 | 1983-05-04 | $7700.00 | Window Closed / Lapsed |