US3933985A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Process for production of polycrystalline silicon
Assignee: Motorola Solutions Inc
•
Filing: 1971-09-24
•
Granted: 1976-01-20
•
Expires: 1991-09-24
Abstract
Abstract There is disclosed a process for the hydrogen reduction of silicon tetrachloride to produce trichlorosilane. In accordance with the process, hydrogen and silicon tetrachloride vapors are passed through a reaction chamber at relatively high flow rates with approximately 50 mole percent silicon tetrachloride in the mixture. The reaction vessel is held at a temperature of between 900° and 1200° C. This process is a part of an overall system for the production of polycrystalline silicon for the semiconductor industry.
Inventors
- 👤 Michael A. Rodgers
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-26 12:34
CPC Classifications
C; C01; C01B; C01B33/00; C01B33/02; C01B33/04; C01B33/08; C01B33/107; C30; C30B; C30B15/00
Claims Analysis
Total Claims: 5
Claim 1
Independent Claim
101 words
In a process producing polycrystalline silicon by the hydrogen reduction of trichlorosilane with hydrogen to produce silicon, unreacted trichlorosilane, and silicon tetrachloride and separating the trichlorosilane from the silicon tetrachloride, the improvement which comprises mixing the separated silicon tetrachloride with hydrogen to form a mixture consisting essentially of silicon tetrachloride and hydrogen; reacting said mixture in the absence of any other reactive material or catalyst at a temperature between 900° and 1100°C, at a dwell time of the order of several seconds and directly thereafter separating the trichlorosilane from the resultant product therefrom for use in the production of polycrystalline silicon.
Claim 2
Dependent Claim
101 words
In a process producing polycrystalline silicon by the hydrogen reduction of trichlorosilane with hydrogen to produce silicon, unreacted trichlorosilane, and silicon tetrachloride and separating the trichlorosilane from the silicon tetrachloride, the improvement which comprises mixing the separated silicon tetrachloride with hydrogen to form a mixture consisting essentially of silicon tetrachloride and hydrogen; reacting said mixture in the absence of any other reactive material or catalyst at a temperature between 900° and 1100°C, at a dwell time of the order of several seconds and directly thereafter separating the trichlorosilane from the resultant product therefrom for use in the production of polycrystalline silicon.
Claim 3
Dependent Claim
18 words
A process of producing trichlorosilane as recited in claim 1 wherein said mixture comprises 25-55% silicon tetrachloride vapor.
Claim 4
Dependent Claim
19 words
A process of producing trichlorosilane as recited in claim 2 wherein the mixture comprises approximately 50% silicon tetrachloride vapor.
Claim 5
Dependent Claim
16 words
A process of producing trichlorosilane as recited in claim 1 wherein said temperature is approximately 1100°C.
References Cited (Backward Citations)
US2595620A
Cited
US2768061A
Cited
US2943918A
Cited
US2904404A
Cited
GB904009A
Cited
US3325314A
Cited
US3488152A
Cited
US3565590A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1979-01-19 | 1979-07-21 | 1980-01-20 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1983-01-19 | 1983-07-21 | 1984-01-20 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1987-01-19 | 1987-07-21 | 1988-01-20 | $7700.00 | Window Closed / Lapsed |