Patent US3945902A successfully refreshed from Google Patents.
US3945902A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Metallized device and method of fabrication
Assignee: RCA Corp
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Filing: 1974-07-22
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Granted: 1976-03-23
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Expires: 1994-07-22
Abstract
Abstract A diamond body and an oxide substrate are simultaneously sputter-etched such that the diamond body is cleaned and a layer of the sputtered oxide is deposited on the clean surface of the diamond body, then a metallic layer is deposited on the oxide layer. This provides a metallized diamond body whose metallic layer will adhere to the body.
Inventors
- 👤 Frank Zygmunt Hawrylo
- 👤 Henry Kressel
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-24 16:33
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/06; C23C14/10; C23C14/02; C23C14/021; C23C14/022; C23C14/08; C23C14/081; C30; C30B; C30B29/00; C30B29/02; C30B29/04; C30B33/00; Y; Y10; Y10T; Y10T428/00; Y10T428/24; Y10T428/24802; Y10T428/24917; Y10T428/26; Y10T428/263; Y10T428/264; Y10T428/265; Y10T428/29; Y10T428/2982; Y10T428/2991; Y10T428/2993; Y10T428/30
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
45 words
A method of preparing a body of crystalline material for subsequent metallization comprising the step of simultaneously sputter etching the surfaces of said crystalline body and an oxide substrate in order to clean said crystalline body and to provide an oxide layer on said body.
Claim 2
Independent Claim
45 words
A method of preparing a body of crystalline material for subsequent metallization comprising the step of simultaneously sputter etching the surfaces of said crystalline body and an oxide substrate in order to clean said crystalline body and to provide an oxide layer on said body.
Claim 3
Dependent Claim
22 words
The method in accordance with claim 1 in which the body of crystalline material is mounted on said oxide substrate for sputter-etching.
Claim 4
Dependent Claim
26 words
The method in accordance with claim 2 in which the sputtering rate for said oxide substrate is greater than that of said body of crystalline material.
Claim 5
Independent Claim
52 words
A method of metallizing a body of crystalline material comprising the steps of simultaneously sputter etching the surfaces of said crystalline body and an oxide substrate in order to clean said crystalline body and to provide an oxide layer on said body and subsequently depositing a metal layer on said oxide layer.
Claim 6
Independent Claim
52 words
A method of metallizing a body of crystalline material comprising the steps of simultaneously sputter etching the surfaces of said crystalline body and an oxide substrate in order to clean said crystalline body and to provide an oxide layer on said body and subsequently depositing a metal layer on said oxide layer.
Claim 7
Dependent Claim
22 words
The method of metallizing a body of crystalline material in accordance with claim 4 in which said body is a diamond material.
Claim 8
Dependent Claim
35 words
The method of metallizing a body of crystalline material in accordance with claim 5 in which said oxide substrate is an oxide selected from the group consisting of oxides of silicon and oxides of aluminum.
References Cited (Backward Citations)
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1979-03-23 | 1979-09-22 | 1980-03-23 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1983-03-23 | 1983-09-22 | 1984-03-23 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1987-03-23 | 1987-09-22 | 1988-03-23 | $7700.00 | Window Closed / Lapsed |