Abstract This disclosure is directed to an improved integrated semiconductor transistor device which has the feature of a heavily doped epitaxial semiconductor region in contact with a buried sub-collector region. Additional features include dielectric sidewall isolation combined with PN junction isolation between the substrate and the collector portion of the transistor. The epitaxial contact to the buried sub-collector region is formed simultaneous with the formation of polycrystalline silicon filler material that fills in the dielectric isolation moat or channel located around the sides of individual electrically isolated transistor devices in order to achieve a planar surface structure. Another feature of the transistor device is the use of a base region that extends completely across and in contact with the sidewalls of the dielectric isolation moat. Preferably, the emitter region also extends across and in contact with three of the four of the sidewalls of the dielectric isolation moat. In this manner, transistor devices can be made very small with external electrical metal contacts made to the emitter region, the base region, and to the heavily doped epitaxial semiconductor region that is in contact with the buried sub-collector region. This epitaxial contact region to the buried sub-collector region is located within a portion of the polycrystalline silicon filler material that is bounded by the dielectric isolation sidewall material.
A method for fabricating an integrated semiconductor structure comprising the steps of: a. forming a region of first conductivity type extending from a surface of a monocrystalline semiconductor substrate of second conductivity type into said substrate, b. forming a monocrystalline epitaxial layer of said first conductivity type over said surface, including said region of first conductivity type, c. etching a groove through said monocrystalline epitaxial layer to expose a portion of said region of first conductivity type and isolate a portion of said epitaxial layer from the remainder of said epitaxial layer, d. forming a dielectric layer within said groove, e. forming an opening in said dielectric layer to reexpose a portion of said region of first conductivity type, f. depositing doped semiconductor material of said first conductivity type and having an upper surface in said groove to form simultaneously a body of high conductivity, monocrystalline semiconductor material contacting said region of first conductivity type through said opening and extending to the upper surface of said doped semiconductor material, and a body of polycrystalline semiconductor material surrounding said body of monocrystalline semiconductor material in said groove, and g. forming at least one region of second conductivity type in said isolated portion of said epitaxial layer to provide a semiconductor device.
Claim 2
Independent Claim
210 words
A method for fabricating an integrated semiconductor structure comprising the steps of: a. forming a region of first conductivity type extending from a surface of a monocrystalline semiconductor substrate of second conductivity type into said substrate, b. forming a monocrystalline epitaxial layer of said first conductivity type over said surface, including said region of first conductivity type, c. etching a groove through said monocrystalline epitaxial layer to expose a portion of said region of first conductivity type and isolate a portion of said epitaxial layer from the remainder of said epitaxial layer, d. forming a dielectric layer within said groove, e. forming an opening in said dielectric layer to reexpose a portion of said region of first conductivity type, f. depositing doped semiconductor material of said first conductivity type and having an upper surface in said groove to form simultaneously a body of high conductivity, monocrystalline semiconductor material contacting said region of first conductivity type through said opening and extending to the upper surface of said doped semiconductor material, and a body of polycrystalline semiconductor material surrounding said body of monocrystalline semiconductor material in said groove, and g. forming at least one region of second conductivity type in said isolated portion of said epitaxial layer to provide a semiconductor device.
Claim 3
Dependent Claim
14 words
The method of claim 1 wherein said semiconductor device is an NPN transistor device.
Claim 4
Dependent Claim
14 words
The method of claim 1 wherein said semiconductor device is a PNP transistor device.
Claim 5
Dependent Claim
22 words
The method of claim 1 including the step of diffusing base and emitter regions into said isolated portion of said epitaxial layer.
Claim 6
Dependent Claim
22 words
The method of claim 4 including the step of forming metal contacts to said emitter, base and high conductivity monocrystalline semiconductor body.