US4332879A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Process for depositing a film of controlled composition using a metallo-organic photoresist
Assignee: The AT&T MVPD Group LLC
•
Filing: 1978-12-01
•
Granted: 1982-06-01
•
Expires: 1998-12-01
Abstract
Abstract The specification describes a process for depositing a film of controlled composition on a substrate by using a metallo-organic photoresist in which the organic portion is combusted by heating in a reactive atmosphere to leave a residual deposit of a desired substance on the substrate. The film may be formed as a patterned or unpatterned layer. In addition, the residual deposit may be subsequently subjected to a chemical reaction to alter its composition.
Inventors
- 👤 Antonio C. Pastor
- 👤 Ricardo C. Pastor
- 👤 Gregory L. Tangonan
- 👤 Shi-Yin Wong
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-26 09:49
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/027; G03F7/0047; H; H05; H05K; H05K1/00; H05K1/02; H05K1/03; H05K1/0306; H05K1/09; H05K1/092; H05K3/00; H05K3/02
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
139 words
A process for depositing a film of controlled composition on a substrate comprising the steps of: (a) providing a polymerizable material which is suitable for use as a photoresist; (b) introducing into said polymerizable material a predetermined amount of a chosen substance containing a selected cation and which is capable of being chemically linked to said polymerizable material upon polymerization, to form a cation-containing polymerizable material; (d) polymerizing said cation-containing polymerizable material to form a metallo-organic photoresist of chosen composition having said cation substitutionally incorporated therein; and (c) depositing said cation-containing polymerizable material on said substrate to a predetermined thickness; (e) heating said deposited metallo-organic photoresist in a selected reactive atmosphere to elevated temperatures sufficient to combust the organic portion of said metallo-organic photoresist and to leave behind on said substrate an inorganic residue which contains said selected cation.
Claim 2
Dependent Claim
139 words
A process for depositing a film of controlled composition on a substrate comprising the steps of: (a) providing a polymerizable material which is suitable for use as a photoresist; (b) introducing into said polymerizable material a predetermined amount of a chosen substance containing a selected cation and which is capable of being chemically linked to said polymerizable material upon polymerization, to form a cation-containing polymerizable material; (d) polymerizing said cation-containing polymerizable material to form a metallo-organic photoresist of chosen composition having said cation substitutionally incorporated therein; and (c) depositing said cation-containing polymerizable material on said substrate to a predetermined thickness; (e) heating said deposited metallo-organic photoresist in a selected reactive atmosphere to elevated temperatures sufficient to combust the organic portion of said metallo-organic photoresist and to leave behind on said substrate an inorganic residue which contains said selected cation.
Claim 3
Dependent Claim
27 words
The process as set forth in claim 1 which further comprises the step of: defining a predetermined pattern in said photoresist during said polymerizing of step "d".
Claim 4
Dependent Claim
37 words
The process as set forth in claim 2 wherein said substrate is fused silica, said chosen composition comprises a lead-containing compound, and said residue is a lead-containing oxide having a thickness of 100 A to 4000 A.
Claim 5
Dependent Claim
39 words
The process as set forth in claim 1 wherein said selected reactive atmosphere comprises a material containing a substance selected from the group consisting of fluorine, chlorine, bromine, iodine, sulfur, selenium, tellurium, oxygen, hydrogen, nitrogen, helium, argon, and air.
Claim 6
Dependent Claim
34 words
The process as set forth in claim 1 or claim 2 which further comprises the step of exposing said residue to a second chosen reactive atmosphere to form a reaction product with said residue.
Claim 7
Dependent Claim
29 words
The process as set forth in claim 5 wherein said reaction product is chosen from the group consisting of an oxide, a halide, a chalcogenide, and a free element.
Claim 8
Dependent Claim
45 words
The process as set forth in claim 1 which further comprises the step of heating said substrate having said residue deposited thereon to elevated temperatures sufficient to diffuse at least a portion of said residue into said substrate to thereby form an optical waveguiding region.
Claim 9
Dependent Claim
16 words
The process as set forth in claim 1 wherein said inorganic residue contains a phosphorescent material.
Claim 10
Dependent Claim
38 words
The process as set forth in claim 1 wherein said cation is selected from the group consisting of lead, boron, europium, samarium, praseodymium, lanthanum, copper, iron, yttrium, aluminum, neodymium, tantalum, indium, tin, and binary and ternary mixtures thereof.
References Cited (Backward Citations)
DE1439726A1
Cited
US3753768A
Cited
US3834939A
Cited
US3620809A
Cited
US3904783A
Cited
US3994727A
Cited
US3779807A
Cited
US3925080A
Cited
US3982941A
Cited
US3885076A
Cited
US3977878A
Cited
US4027059A
Cited
US4103073A
Cited
US4039698A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1985-05-31 | 1985-11-30 | 1986-06-01 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1989-05-31 | 1989-11-30 | 1990-06-01 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1993-05-31 | 1993-11-30 | 1994-06-01 | $7700.00 | Window Closed / Lapsed |