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US4346163A
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Resist for use in forming a positive pattern with a radiation and process for forming a positive pattern with radiation
Assignee: Panasonic Holdings Corp
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Filing: 1980-09-22
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Granted: 1982-08-24
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Expires: 2000-09-22
Abstract
Abstract 1. A resist for use in forming a positive pattern with a radiation comprising a copolymer composed of methyl methacrylate and methacrylic acid and a cross-linking agent having the following general formula: <IMAGE> +TR <IMAGE> wherein R is H or CH3, x is an integer of 1 to 9, and y and z are zero, or an integer of 1 to 3. 2. A process for forming a positive pattern on a substrate with a radiation.
Inventors
- 👤 Kenichi Takeyama
- 👤 Takayoshi Morimoto
- 👤 Kunio Hibino
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 06:07
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/039; C; C09; C09D; C09D133/00; C09D133/04; C09D133/06; C09D133/10; C09D133/12; C08; C08L; C08L63/00
Claims Analysis
Total Claims: 3
Claim 1
Independent Claim
115 words
A process for forming a positive pattern with a radiation comprising the steps of: (1) applying on a substrate a resist comprising a copolymer composed of 100 moles of methyl methacrylate and 1 to 15 moles of methacrylic acid and a cross-linking agent having the following general formula: ##STR8## wherein R is H or CH 3 , x is an integer of 1 to 9, and y and z are zero, or an integer of 1, 2 or 3, (2) cross-linking the copolymer with the cross-linking agent by heating, (3) irradiating the desired area with a radiation and then (4) developing the latent image formed in the resist with the radiation with an organic solvent.
Claim 2
Dependent Claim
115 words
A process for forming a positive pattern with a radiation comprising the steps of: (1) applying on a substrate a resist comprising a copolymer composed of 100 moles of methyl methacrylate and 1 to 15 moles of methacrylic acid and a cross-linking agent having the following general formula: ##STR8## wherein R is H or CH 3 , x is an integer of 1 to 9, and y and z are zero, or an integer of 1, 2 or 3, (2) cross-linking the copolymer with the cross-linking agent by heating, (3) irradiating the desired area with a radiation and then (4) developing the latent image formed in the resist with the radiation with an organic solvent.
Claim 3
Dependent Claim
27 words
A process according to claim 1 wherein the cross-linking of the copolymer with the cross-linking agent is carried out at a temperature of 100° to 170° C.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1985-08-23 | 1986-02-22 | 1986-08-24 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1989-08-23 | 1990-02-22 | 1990-08-24 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1993-08-23 | 1994-02-22 | 1994-08-24 | $7700.00 | Window Closed / Lapsed |