§
PatentCue
Patent Intelligence
Join Waitlist Sign In
Patent US4388397A successfully refreshed from Google Patents.
← Back to Patent Explorer
US4388397A Expired / Lapsed US ⏱️ 0.0 years remaining

Photosensitive composition for dry development

Assignee: Tokyo Ohka Kogyo Co Ltd
•
Filing: 1981-03-27
•
Granted: 1983-06-14
•
Expires: 2001-03-27
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

Abstract A novel photosensitive composition for dry development in the ultra-fine pattern formation of the semiconductor industry, which is composed of at least one of acrylic and vinyl ketone polymers and a specified subliming hisazide compound as a photocuring agent, is disclosed. The use of the photosensitive composition provides a very effective ultra-fine pattern formation process in the semiconductor industry with such advantages that unexposed areas are selectively removable by treating with a plasma, and consequently plasma development becomes available so that high resolution may easily be obtained. Automating and dry processing of all the stages ranging from development processing to stripping processing become available when using the photosensitive composition of this invention. No expensive treating reagents are needed and environmental pollution is eliminated.

Inventors

  • 👤 Wataru Kanai

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-26 20:10
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/008; Y; Y10; Y10S; Y10S430/00; Y10S430/1053; Y10S430/1055; Y10S430/106; Y10S430/108; Y10S430/109; Y10S430/111; Y10S430/128

Claims Analysis

Total Claims: 9
Claim 1
Independent Claim 75 words
In a photosensitive composition for dry development comprising a polymer and a subliming bisazide compound as a photocuring agent, the improvement comprising: (a) selecting as the polymer, polyglycidyl methacrylate, and (b) selecting the subliming bisazide compound from subliming bisazide compounds of the formula: ##STR2## where R is a hydrogen or a halogen atom and X is an oxygen atom, a carbonyl group, a methylene group, a sulfur atom, a disulfide group or a sulfone group.
Claim 2
Dependent Claim 75 words
In a photosensitive composition for dry development comprising a polymer and a subliming bisazide compound as a photocuring agent, the improvement comprising: (a) selecting as the polymer, polyglycidyl methacrylate, and (b) selecting the subliming bisazide compound from subliming bisazide compounds of the formula: ##STR2## where R is a hydrogen or a halogen atom and X is an oxygen atom, a carbonyl group, a methylene group, a sulfur atom, a disulfide group or a sulfone group.
Claim 3
Dependent Claim 22 words
A composition as claimed in claim 1 wherein said polymer has a molecular weight of from tens of thousands to two million.
Claim 4
Dependent Claim 22 words
A composition as claimed in claim 1 wherein said polymer has a molecular weight of from hundreds of thousands to one million.
Claim 5
Dependent Claim 35 words
A composition as claimed in claim 1 wherein said biszaide compound is a member selected from the group consisting of 4,4'-diazidodiphenyl ether, 4,4'-diazidodiphenyl methane, 4,4'-diazidodiphenyl sulfide, 4,4'-diazidodiphenyl disulfide, 4,4'-diazidodiphenyl sulfone, 3,3'-diazidodiphenyl sulfone and 3,3'-dichloro-4,4'-diazidodiphenyl methane.
Claim 6
Dependent Claim 30 words
A composition as claimed in claim 1 wherein said bisazide compound is used in an amount of from 5 to 30% by weight based on the amount of the polymer.
Claim 7
Dependent Claim 30 words
A composition as claimed in claim 1 wherein said bisazide compound is used in an amount of from 15 to 25% by weight based on the amount of the polymer.
Claim 8
Dependent Claim 16 words
The composition of claim 1 in which R is hydrogen and X is a carbonyl group.
Claim 9
Dependent Claim 18 words
The composition of claim 7 in which the N 3 groups respectively are in the 4- and 4'-positions.

References Cited (Backward Citations)

US2852379A Cited
GB850954A Cited
US3118765A Cited
US3260599A Cited
US3718474A Cited
US4018937A Cited
US4091194A Cited
JPS52113163A Cited
US4299911A Cited
US4197133A Cited
US4297433A Cited
US4241165A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1986-06-13 1986-12-13 1987-06-14 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1990-06-13 1990-12-13 1991-06-14 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1994-06-13 1994-12-13 1995-06-14 $7700.00 Window Closed / Lapsed

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag