Method of activating titanium surfaces

Claim 3

A method as claimed in claim 1 wherein the solution for the activating of the surface contains a concentration of hexafluosilicic acid between 0.1 and 2.0 mol/L.

Claim 4

A method as claimed in claim 1 wherein silicon is used as an oxide compound, acid compound, fluoride compound or fluorine-complex compound for the hexafluosilicic acid of the activating solution.

Claim 5

A method as claimed in claim 3 wherein the fluoride-containing solution is an etching agent which comprises a solution of nitric-acid and hydrofluoric-acid.

Claim 6

A method as claimed in claim 1 wherein the acids are present in said etching agent in the respective concentrations of 400 g/L of HNO 3 and 5 g/L of HF.

Claim 7

A method as claimed in claim 1 wherein the activating solution consists of the acids in the following amounts: hexafluousilic acid: 0.6 mol/L hydrofluoric acid: 0.3 mol/L chromic acid: 1.8 mol/L.

Claim 8

In a method of activating a titanium surface for subsequent plating with a metallic coating comprising wet blasting a titanium surface to be plated with fine grain Al 2 O 3 , and contacting the thus wet-blasted surface with a fluoride-containing solution for a period of several minutes at room temperature, the improvement comprising activating the wet-blasted titanium surface, following contact with the fluoride containing solution, with an activating solution consisting essentially of chromic acid, hydrofluoric acid and hexafluosilic acid in the following molar ratios of the constituent elements: 7≧F/Si≧6 6≧Cr/Bi≧3 at a temperature of 35° to 100° C. for 15 to 50 minutes.

Claim 9

In a method of activating a titanium surface for subsequent plating with a metallic coating comprising wet blasting a titanium surface to be plated with fine grain Al 2 O 3 , and contacting the thus wet-blasted surface with a fluoride-containing solution for a period of several minutes at room temperature, the improvement comprising activating the wet-blasted titanium surface, following contact with the fluoride containing solution, with an activating solution consisting essentially of chromic acid, hydrofluoric acid and hexafluosilic acid in the following molar ratios of the constituent elements: 7≧F/Si≧6 6≧Cr/Bi≧3 at a temperature of 35° to 100° C. for 15 to 50 minutes.

Claim 10

The improvement as claimed in claim 7 wherein the solution for the activating of the surface contains a concentration of hexafluosilicic acid between 0.1 and 2.0 mol/L.

Claim 11

The improvement as claimed in claim 7 wherein silicon is used as an oxide compound, acid compound, fluoride compound or fluorine-complex compound for the hexafluosilicic acid of the activating solution.

Claim 12

The improvement as claimed in claim 7 wherein the activating solution consists of the acids in the following amounts: hexafluousilic acid: 0.6 mol/L hydrofluoric acid: 0.3 mol/L chromic acid: 1.8 mol/L.

Claim 13

A solution for activating a titanium surface for subsequent metallic plating thereof, said solution; consisting essentially of: chromic acid, hydrofluoric acid and hexafluosilic acid, said acids being present in the following amounts: hexafluosilicic acid: 0.6 mol/L hydrofluoric acid: 0.3 mol/L chromic acid: 1.8 mol/L.

Claim 14

A solution for activating a titanium surface for subsequent metallic plating thereof, said solution; consisting essentially of: chromic acid, hydrofluoric acid and hexafluosilic acid, said acids being present in the following amounts: hexafluosilicic acid: 0.6 mol/L hydrofluoric acid: 0.3 mol/L chromic acid: 1.8 mol/L.