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Patent US4460938A successfully refreshed from Google Patents.
US4460938A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Process for producing hybrid circuits with integrated capacitors and resistors and circuits obtained by this process
Assignee: Individual
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Filing: 1983-11-03
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Granted: 1984-07-17
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Expires: 2003-11-03
Abstract
Abstract Process for the production of hybrid circuits with integrated capacitors and resistors in which a thin film of tantalum doped with nitrogen and oxygen is deposited on a substrate, this tantalum film is etched to form a base electrode for the said capacitors and a pattern for the resistors, a mask is placed on the etched film and through the said mask a first anodic oxidation of the tantalum film is performed and at the end of this process a metal coating is deposited and etched in an appropriate manner for forming a second electrode for the capacitors and electrical connections for the system, wherein following the first anodic oxidation a second, more advanced anodic oxidation of the tantalum film is carried out solely at the locations of the resistors in order to selectively reduce the thickness of the tantalum film. The invention also relates to the hybrid circuit with integrated capacitors and resistors obtained by this process.
Inventors
- 👤 Alain Clei
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 17:20
CPC Classifications
H; H10; H10D; H10D86/00; H10D86/80; H10D86/85
Claims Analysis
Total Claims: 5
Claim 1
Independent Claim
225 words
A process for the production of hybrid circuits with integrated capacitors and resistors, comprising the steps of: (a) depositing a tantalum film doped with nitrogen and oxygen on a substrate; (b) etching said tantalum film to form a base electrode for a first capacitor, a pattern for a first resistor, first conducting bridge connecting said base electrode to one end of said pattern, and a second conducting bridge connected to the other end of said pattern; (c) depositing a mask on said etched film for covering said first and second conducting bridges, leaving said base electrode and said pattern unmasked; (d) performing a first anodic oxidation of the unmasked portions of said etched film, for obtaining an oxide layer having a thickness suitable for the dielectric to be given said first capacitor; (e) making a cut in said first conducting bridge for electrically isolating said base electrode from said pattern; (f) performing a second anodic oxidation of said pattern only, for obtaining a tantalum layer having a thickness suitable for said first resistor; (g) removing said mask; and (h) depositing and etching a conductive coating for forming an upper electrode for said first capacitor, a first electrical connection connected to said upper electrode, a second electrical connection connected to said second conducting bridge, and a third electrical connection for reconnecting said cut first conducting bridge.
Claim 2
Dependent Claim
225 words
A process for the production of hybrid circuits with integrated capacitors and resistors, comprising the steps of: (a) depositing a tantalum film doped with nitrogen and oxygen on a substrate; (b) etching said tantalum film to form a base electrode for a first capacitor, a pattern for a first resistor, first conducting bridge connecting said base electrode to one end of said pattern, and a second conducting bridge connected to the other end of said pattern; (c) depositing a mask on said etched film for covering said first and second conducting bridges, leaving said base electrode and said pattern unmasked; (d) performing a first anodic oxidation of the unmasked portions of said etched film, for obtaining an oxide layer having a thickness suitable for the dielectric to be given said first capacitor; (e) making a cut in said first conducting bridge for electrically isolating said base electrode from said pattern; (f) performing a second anodic oxidation of said pattern only, for obtaining a tantalum layer having a thickness suitable for said first resistor; (g) removing said mask; and (h) depositing and etching a conductive coating for forming an upper electrode for said first capacitor, a first electrical connection connected to said upper electrode, a second electrical connection connected to said second conducting bridge, and a third electrical connection for reconnecting said cut first conducting bridge.
Claim 3
Dependent Claim
23 words
A process according to claim 1, wherein the step of making a cut in said first conducting bridge is performed by laser machining.
Claim 4
Dependent Claim
141 words
A hybrid circuit with integrated capacitors and resistors comprising a tantalum film doped with nitrogen and oxygen applied on a substrate, said film having been etched to form a base electrode for a first capacitor, a pattern for a first resistor, a first conducting bridge connecting said base electrode to one end of said pattern, and a second conducting bridge connected to the other end of said pattern, said first conducting bridge being severed by a cut, said first resistor having a tantalum layer with a thickness formed as a result of first and second anodic oxidations, said first capacitor having a dielectric layer with a thickness formed as a result of said first anodic oxidation only, and further comprising an upper electrode formed on said dielectric layer, and a conductive coating applied across said cut of said first conducting bridge.
Claim 5
Dependent Claim
141 words
A hybrid circuit with integrated capacitors and resistors comprising a tantalum film doped with nitrogen and oxygen applied on a substrate, said film having been etched to form a base electrode for a first capacitor, a pattern for a first resistor, a first conducting bridge connecting said base electrode to one end of said pattern, and a second conducting bridge connected to the other end of said pattern, said first conducting bridge being severed by a cut, said first resistor having a tantalum layer with a thickness formed as a result of first and second anodic oxidations, said first capacitor having a dielectric layer with a thickness formed as a result of said first anodic oxidation only, and further comprising an upper electrode formed on said dielectric layer, and a conductive coating applied across said cut of said first conducting bridge.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1987-07-17 | 1988-01-16 | 1988-07-17 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1991-07-17 | 1992-01-16 | 1992-07-17 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1995-07-17 | 1996-01-16 | 1996-07-17 | $7700.00 | Window Closed / Lapsed |