US4507331A
Expired / Lapsed
US
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Dry process for forming positive tone micro patterns
Assignee: International Business Machines Corp
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Filing: 1983-12-12
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Granted: 1985-03-26
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Expires: 2003-12-12
Abstract
Abstract A dry process for forming a positive tone micro pattern by coating a substrate with an organic polymer film then with a film of an oxygen etch barrier, selected from the group consisting of films of organometallic, including organosilicon compounds and metals, exposing the etch barrier film to a low energy proton beam in a patternwise manner, and developing the pattern by means of oxygen reactive ion etching.
Inventors
- 👤 Hiroyuki Hiraoka
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-26 00:12
CPC Classifications
H; H10; H10P; H10P50/00; H10P50/20; H10P50/28; H10P50/286; H10P50/287; G; G03; G03F; G03F7/00; G03F7/004; G03F7/09; G03F7/094; H10P50/73
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
83 words
A dry process for forming a positive tone micro pattern with high resolution and high aspect ratio, said process comprising the steps of: (1) depositing an organic polymer film on a substrate; (2) depositing an oxygen etch barrier film on said organic polymer film said oxygen etch barrier film consisting of an organometallic, including ogranosilicon compound or a metal; (3) patternwise exposing said barrier film to a low energy proton beam, and (4) developing the pattern by means of oxygen reactive ion etching.
Claim 2
Dependent Claim
83 words
A dry process for forming a positive tone micro pattern with high resolution and high aspect ratio, said process comprising the steps of: (1) depositing an organic polymer film on a substrate; (2) depositing an oxygen etch barrier film on said organic polymer film said oxygen etch barrier film consisting of an organometallic, including ogranosilicon compound or a metal; (3) patternwise exposing said barrier film to a low energy proton beam, and (4) developing the pattern by means of oxygen reactive ion etching.
Claim 3
Dependent Claim
17 words
A process as claimed in claim 1 wherein the barrier film is deposited from the vapor state.
Claim 4
Dependent Claim
18 words
A process as claimed in claim 1 wherein the barrier film is from 150 to 250 angstroms thick.
Claim 5
Dependent Claim
16 words
A process as claimed in claim 1 wherein the barrier film comprises an organo metallic compound.
Claim 6
Dependent Claim
15 words
A process as claimed in claim 1 wherein the barrier film comprises a silicon-containing compound.
Claim 7
Dependent Claim
13 words
A process as claimed in claim 1 wherein the barrier film is poly(tetravinylsilane).
Claim 8
Dependent Claim
16 words
A process as claimed in claim 1 wherein the barrier film is a volatile hydride-forming metal.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1988-03-25 | 1988-09-24 | 1989-03-26 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1992-03-25 | 1992-09-24 | 1993-03-26 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1996-03-25 | 1996-09-24 | 1997-03-26 | $7700.00 | Window Closed / Lapsed |