Wafer height correction system for focused beam system

Claim 2

An adjustable height wafer support for a focused beam system wherein a column directs a focused beam into a target chamber and the target chamber has said wafer support therein for supporting a wafer in the path of the beam emitted from the column, the improvement comprising: a flexible member between said wafer support and the column and fastened to both said wafer support and the column, together with means for flexing said flexible member to position said wafer support correctly with respect to the position of focus of the beam.

Claim 3

An adjustable height wafer support for a focused beam system wherein a column directs a focused beam into a target chamber and the target chamber has said wafer support therein for supporting a wafer in the path of the beam emitted from the column, the improvement comprising: a flexible member between said target chamber and said wafer support and fastened to both said target chamber and said wafer support, together with means for flexing said flexible member to position said wafer support correctly with respect to the position of focus of the beam, at least part of said means for flexing being positioned outside of said target chamber.

Claim 4

An adjustable height wafer support for a focused beam system wherein a column directs a focused beam into a target chamber and the target chamber has said wafer support therein for supporting a wafer in the path of the beam emitted from the column, the improvement comprising: a flexible member between said target chamber and said wafer support and fastened to both said target chamber and said wafer support, together with means for flexing said flexible member to position said wafer support correctly with respect to the position of focus of the beam, at least part of said means for flexing being positioned outside of said target chamber.

Claim 5

The support of claim 2 wherein said target chamber has a floor and said flexible member is mounted on said floor, said wafer support also being mounted on said flexible member so that flexure of said flexible member moves said wafer support with respect to said floor of said target chamber.

Claim 6

The support of claim 3 wherein said flexible member comprises a flange having one portion thereof secured to said floor of said target chamber and another portion thereof secured with respect to said wafer support.

Claim 7

The support of claim 4 wherein said flange is circular and carries a central stud thereon, said circular flange being secured adjacent its periphery to said floor and said central stud thereon being secured with respect to said wafer support.

Claim 8

The support of claim 5 wherein said flange has a stud extending through an opening in the floor of said target chamber and motor means is connected to said stud exteriorly of said target chamber to apply force to said stud to flex said flange.

Claim 9

An adjustable height wafer support for a focused beam system wherein a column directs a focused beam into a target chamber having a floor and the target chamber has said wafer support therein on the floor of said target chamber for supporting a wafer in the parth of the beam emitted from the column, the improvement comprising: a flexible flange having one portion thereof secured to said floor of said target chamber and another portion thereof secured with respect to said wafer support, a fluid pressure chamber between said flange and said floor of said target chamber so that introduction of fluid under pressure into said pressure chamber causes flexure of said flange to move said wafer support with respect to said floor of said target chamber, and to position said wafer support correctly with respect to the position of focus of the beam.

Claim 10

An adjustable height wafer support for a focused beam system wherein a column directs a focused beam into a target chamber having a floor and the target chamber has said wafer support therein on the floor of said target chamber for supporting a wafer in the parth of the beam emitted from the column, the improvement comprising: a flexible flange having one portion thereof secured to said floor of said target chamber and another portion thereof secured with respect to said wafer support, a fluid pressure chamber between said flange and said floor of said target chamber so that introduction of fluid under pressure into said pressure chamber causes flexure of said flange to move said wafer support with respect to said floor of said target chamber, and to position said wafer support correctly with respect to the position of focus of the beam.

Claim 11

An adjustable height wafer support for a focused beam system wherein a column directs a focused beam into a target chamber and the target chamber has said wafer support therein for supporting a wafer in the path of the beam emitted from the column, the improvement comprising: a flexible member mounted on said target chamber, means for flexing said flexible member, said wafer support being mounted on said flexible member so that flexure of said flexible member moves said wafer support with respect to said column to position said wafer support correctly with respect to the position of focus of the beam.

Claim 12

An adjustable height wafer support for a focused beam system wherein a column directs a focused beam into a target chamber and the target chamber has said wafer support therein for supporting a wafer in the path of the beam emitted from the column, the improvement comprising: a flexible member mounted on said target chamber, means for flexing said flexible member, said wafer support being mounted on said flexible member so that flexure of said flexible member moves said wafer support with respect to said column to position said wafer support correctly with respect to the position of focus of the beam.

Claim 13

The support of claim 8 wherein said flexible support comprises a flange having one portion thereof secured to said target chamber and another portion thereof secured with respect to said wafer support.

Claim 14

An adjustable height wafer support comprising in combination: a focused beam column for providing a focused beam to a focal plane; a target chamber, said target chamber carrying a wafer support therein, said column being secured to said target chamber to direct the focused beam toward said wafer support; and flexible means associated with said target chamber between said column and said wafer support for repositioning the focal plane with respect to said wafer support by flexure of said flexure means.

Claim 15

An adjustable height wafer support comprising in combination: a focused beam column for providing a focused beam to a focal plane; a target chamber, said target chamber carrying a wafer support therein, said column being secured to said target chamber to direct the focused beam toward said wafer support; and flexible means associated with said target chamber between said column and said wafer support for repositioning the focal plane with respect to said wafer support by flexure of said flexure means.

Claim 16

An adjustable height wafer support comprising in combination: a focused beam column for providing a focused beam to a focal plane; a target chamber, said target chamber carrying a wafer support therein, said column being secured to said target chamber to direct the focused beam toward said wafer support; flexure means mounted on said target chamber, said wafer support being mounted on said flexure means for flexure of said flexure means to reposition said wafer support with respect to the focal plane in said target chamber and consequently with respect to said column.

Claim 17

An adjustable height wafer support comprising in combination: a focused beam column for providing a focused beam to a focal plane; a target chamber, said target chamber carrying a wafer support therein, said column being secured to said target chamber to direct the focused beam toward said wafer support; flexure means mounted on said target chamber, said wafer support being mounted on said flexure means for flexure of said flexure means to reposition said wafer support with respect to the focal plane in said target chamber and consequently with respect to said column.

Claim 18

The support of claim 11 wherein said flexure means has first and second relatively moveable portions comprising a substantially circular flange having a central post, one of said portions being secured to said floor of said target chamber and other of said portions being secured to said wafer support.

Claim 19

The support of claim 12 wherein a motor is connected to said flange to flex said flange to move said central post with respect to said flange to adjust position of said wafer support with respect to said floor.

Claim 20

The support of claim 13 wherein said flange is secured with respect to said floor and said wafer support is mounted on said central post, said central post extending through said floor and being acted upon by said motor means.

Claim 21

The support of claim 10 wherein said flexible means comprises a flange having a fluid space thereunder, said wafer support being mounted on said flange so that when fluid under pressure is introduced into said fluid space, said flange flexes to move said wafer support with respect to said column.

Claim 22

The support of claim 10 wherein said flexible support is formed as part of said target chamber around said column and a bridge is secured between said target chamber away from said flexible support and adjacent to said column, motor means between said bridge and said column to move said column with respect to said bridge, said wafer support being secured to said target chamber away from said support so that flexure of said flexible support moves said column with respect to said wafer support.