Trench-defined semiconductor structure

Claim 2

A semiconductor structure comprising a semiconductor substrate having an N type conductivity, a trench formed within said substrate, first and second spaced apart regions defining an N type conductivity region within said substrate, each of said first and second regions having a P type conductivity, being disposed at the surface of said substrate and having an end thereof butting said trench, an insulating material disposed within said trench, and an N+ layer disposed within said substrate and arranged substantially parallel to the surface of said substrate, said N+ layer being spaced from said first and second P regions, said N type region having an N+ segment disposed therein adjacent to said trench extending from the surface of said substrate to said N+ layer.

Claim 3

A semiconductor structure as set forth in claim 1 wherein said insulating material produces negative charges.

Claim 4

A semiconductor structure as set forth in claim 2 wherein said insulating material is polyimide.

Claim 5

A semiconductor structure comprising a semiconductor substrate having a given type conductivity, an epitaxial semiconductor layer having a conductivity type opposite to that of said substrate, a buried semiconductor layer interposed between said substrate and said epitaxial layer and having said opposite type conductivity, said buried layer having a higher electrical conductivity than that of said epitaxial layer, first and second substantially parallelly arranged trenches extending from the surface of said epitaxial layer through said buried layer into said substrate, first and second spaced apart regions disposed within and at the surface of said epitaxial layer extending from said first trench to said second trench and having said given type conductivity, a third region formed in said epitaxial layer interposed between and defined by said first and second regions having ends butted against said first and second trenches, and an insulating medium disposed within said first and second trenches, said third region including first and second segments disposed adjacent to said first and second trenches, respectively, and extending from the surface of said epitaxial layer to said buried layer, the electrical conductivity of each of said first and second segments being higher than that of the remaining portion of said third region.

Claim 6

A semiconductor structure comprising a semiconductor substrate having a given type conductivity, an epitaxial semiconductor layer having a conductivity type opposite to that of said substrate, a buried semiconductor layer interposed between said substrate and said epitaxial layer and having said opposite type conductivity, said buried layer having a higher electrical conductivity than that of said epitaxial layer, first and second substantially parallelly arranged trenches extending from the surface of said epitaxial layer through said buried layer into said substrate, first and second spaced apart regions disposed within and at the surface of said epitaxial layer extending from said first trench to said second trench and having said given type conductivity, a third region formed in said epitaxial layer interposed between and defined by said first and second regions having ends butted against said first and second trenches, and an insulating medium disposed within said first and second trenches, said third region including first and second segments disposed adjacent to said first and second trenches, respectively, and extending from the surface of said epitaxial layer to said buried layer, the electrical conductivity of each of said first and second segments being higher than that of the remaining portion of said third region.

Claim 7

A semiconductor structure as set forth in claim 4 wherein said insulating material is polyimide.

Claim 8

A semiconductor structure comprising a semiconductor substrate having a given type conductivity and a first impurity concentration, an epitaxial semiconductor layer having a conductivity type opposite to that of said substrate and a second impurity concentration, a buried semiconductor layer interposed between said substrate and said epitaxial layer and having said opposite type conductivity, said buried layer having a higher electrical conductivity than that of said epitaxial layer and a third impurity concentration, first and second substantially parallelly arranged trenches extending from the surface of said epitaxial layer through said buried layer into said substrate, first and second spaced apart regions disposed within and at the surface of said epitaxial layer extending from said first trench to said second trench and having said given type conductivity and a fourth impurity concentration, a third region disposed in said epitaxial layer and interposed between and defined by said first and second regions having ends butted against said first and second trenches, and an insulating medium disposed within said first and second trenches, said third region including first and second segments having a fifth impurity concentration disposed adjacent to said first and second trenches, respectively, and extending from the surface of said epitaxial layer to said buried layer, the electrical conductivity of each of said first and second segments being higher than that of the remaining portion of said third region, said fifth impurity concentration being significantly higher than that of said second impurity concentration.

Claim 9

A semiconductor structure comprising a semiconductor substrate having a given type conductivity and a first impurity concentration, an epitaxial semiconductor layer having a conductivity type opposite to that of said substrate and a second impurity concentration, a buried semiconductor layer interposed between said substrate and said epitaxial layer and having said opposite type conductivity, said buried layer having a higher electrical conductivity than that of said epitaxial layer and a third impurity concentration, first and second substantially parallelly arranged trenches extending from the surface of said epitaxial layer through said buried layer into said substrate, first and second spaced apart regions disposed within and at the surface of said epitaxial layer extending from said first trench to said second trench and having said given type conductivity and a fourth impurity concentration, a third region disposed in said epitaxial layer and interposed between and defined by said first and second regions having ends butted against said first and second trenches, and an insulating medium disposed within said first and second trenches, said third region including first and second segments having a fifth impurity concentration disposed adjacent to said first and second trenches, respectively, and extending from the surface of said epitaxial layer to said buried layer, the electrical conductivity of each of said first and second segments being higher than that of the remaining portion of said third region, said fifth impurity concentration being significantly higher than that of said second impurity concentration.

Claim 10

A semiconductor structure as set forth in claim 6 wherein said insulating medium is polyimide.

Claim 11

A semiconductor structure as set forth in claim 7 wherein a layer of silicon dioxide is disposed within said trenches on the surfaces thereof.

Claim 12

A semiconductor structure as set forth in claim 8 wherein a layer of silicon nitride is disposed on said silicon oxide layer and said polyimide is disposed on said silicon nitride layer.

Claim 13

A semiconductor structure as set forth in claim 7 wherein said fifth impurity concentration is substantially equal to said third impurity concentration.

Claim 14

A semiconductor structure as set forth in claim 7 wherein said second impurity is arsenic having a maximum surface concentration of 2×10 16 atoms per cubic centimeter, said third impurity is arsenic having a maximum concentration of 1-2×10 20 atoms per cubic centimeter and said fifth impurity is phosphorous having a concentration of 5×10 18 atoms per cubic centimeter.

Claim 15

A semiconductor structure as set forth in claim 11 wherein said fourth impurity is boron having a maximum surface concentration of 5×10 18 atoms per cubic centimeter.

Claim 16

A PNP bipolar transistor structure comprising a semiconductor substrate having a buried region, a trench disposed within said substrate extending from the surface thereof through said buried region, a negative charge source disposed within said trench, and emitter, base and collector regions butted against said trench, said base region including an N+ doped segment disposed against said trench and extending from the surface of said substrate to said buried region, said N+ doped segment having a higher doping concentration than that of the principal portion of said base region.

Claim 17

A PNP bipolar transistor structure comprising a semiconductor substrate having a buried region, a trench disposed within said substrate extending from the surface thereof through said buried region, a negative charge source disposed within said trench, and emitter, base and collector regions butted against said trench, said base region including an N+ doped segment disposed against said trench and extending from the surface of said substrate to said buried region, said N+ doped segment having a higher doping concentration than that of the principal portion of said base region.

Claim 18

A PNP bipolar transistor structure as set forth in claim 13 wherein said negative charge source is an insulating medium.

Claim 19

A PNP bipolar transistor structure as set forth in claim 14 wherein said insulating medium is polyimide.