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US4575480A
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Photoresist composition
Assignee: NAGASE DENSHI KAGAKU KK
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Filing: 1984-10-22
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Granted: 1986-03-11
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Expires: 2004-10-22
Abstract
Abstract A positive photoresist composition in the form of solution which comprises a resin soluble in an aqueous alkaline solution, a 1,2-quinonediazide derivative as a photosensitizer, and at least one anti-halation agent in amounts of about 1 to about 10 parts by weight in relation to 100 parts by weight of the resin in the composition, the anti-halation agent being selected from the group consisting of dyestuffs of specific structures.
Inventors
- 👤 Takeshi Kotani
- 👤 Yoshiaki Horiuchi
- 👤 Yoichi Kamata
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 06:56
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/022; G03F7/0226; G03F7/09; G03F7/091
Claims Analysis
Total Claims: 3
Claim 1
Independent Claim
92 words
A positive photoresist composition in the form of solution which comprises a resin soluble in an aqueous alkaline solution, a 1,2-quinonediazide derivative as a photosensitizer, and an anti-halation agent having the general formula of ##STR9## wherein R 1 represents a hydrogen, an alkyl or an alkoxyalkyl group, and R 2 represents an alkyl, an alkoxyalkyl or an aryl group which may contain one or more of hydrophilic substituents, in amounts of about 1 to about 10 parts by weight in relation to 100 parts by weight of the resin in the composition.
Claim 2
Dependent Claim
92 words
A positive photoresist composition in the form of solution which comprises a resin soluble in an aqueous alkaline solution, a 1,2-quinonediazide derivative as a photosensitizer, and an anti-halation agent having the general formula of ##STR9## wherein R 1 represents a hydrogen, an alkyl or an alkoxyalkyl group, and R 2 represents an alkyl, an alkoxyalkyl or an aryl group which may contain one or more of hydrophilic substituents, in amounts of about 1 to about 10 parts by weight in relation to 100 parts by weight of the resin in the composition.
Claim 3
Dependent Claim
15 words
The positive photoresist composition as claimed in claim 1 wherein the anti-halation agent is ##STR10##
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1989-03-10 | 1989-09-09 | 1990-03-11 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1993-03-10 | 1993-09-09 | 1994-03-11 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1997-03-10 | 1997-09-09 | 1998-03-11 | $7700.00 | Window Closed / Lapsed |