Patent US4586980A successfully refreshed from Google Patents.
US4586980A
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Pattern forming method
Assignee: Canon Inc
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Filing: 1985-02-15
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Granted: 1986-05-06
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Expires: 2005-02-15
Abstract
Abstract A pattern of a monomolecular film or a monomolecular built-up film is formed on a base through the steps of providing a lift-off layer on a base on which a monomolecular film or a monomolecular built-up film is to be deposited, depositing the monomolecular film or the monomolecular built-up film on the base and the lift-off layer, and removing the lift-off layer from the base.
Inventors
- 👤 Yutaka Hirai
- 👤 Yoshinori Tomida
- 👤 Hiroshi Matsuda
- 👤 Yukuo Nishimura
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 23:07
CPC Classifications
B; B05; B05D; B05D1/00; B05D1/18; B05D1/20; B05D1/202; B82; B82Y; B82Y30/00; B82Y40/00; H; H10; H10F; H10F19/00; H10F19/30; H10F19/31; H10K; H10K71/00; H10K71/20; H10K71/221; H10K85/00; H10K85/701; H10P; H10P76/00; H10P76/20; H10P76/202; H10K85/60; H10K85/649; H10K85/652; Y; Y02; Y02E; Y02E10/00; Y02E10/50; Y02E10/549
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
70 words
A pattern forming method, wherein a pattern of a monomolecular film or a monomolecular built-up film is formed on a base through the steps of providing a lift-off layer on a base on which a monomolecular film or a monomolecular built-up film is to be deposited, depositing the monomolecular film or the monomolecular built-up film on the base and the lift-off layer, and removing the lift-off layer from the base.
Claim 2
Dependent Claim
70 words
A pattern forming method, wherein a pattern of a monomolecular film or a monomolecular built-up film is formed on a base through the steps of providing a lift-off layer on a base on which a monomolecular film or a monomolecular built-up film is to be deposited, depositing the monomolecular film or the monomolecular built-up film on the base and the lift-off layer, and removing the lift-off layer from the base.
Claim 3
Dependent Claim
72 words
A pattern forming method according to claim 1, wherein said base comprises an inorganic substrate comprised of glass or SiO 2 , or an organic substrate comprised of polyethylene, polyethylene terephthalate or polyimide, or a substrate comprised of a metal of Al, Ta, W, In or Cu, or an alloy thereof, on which one of a vapor deposition metal film, a conductive oxide glass and a molecular amorphous semiconductor film is provided.
Claim 4
Dependent Claim
35 words
A pattern forming method according to claim 1, wherein said lift-off layer is comprised of a material selected from the group consisting of Al, Mo, Si, Ge, A1 2 O 3 and SiO 2 .
Claim 5
Dependent Claim
29 words
A pattern forming method according to claim 1, wherein the thickness of said lift-off layer is 5-10 times the thickness of said monomolecular film or said monomolecular built-up film.
Claim 6
Dependent Claim
22 words
A pattern forming method according to claim 1, wherein said lift-off layer is removed from said base by etching with an etchant.
Claim 7
Dependent Claim
41 words
A pattern forming method according to claim 5, wherein said etchant is an aqueous solution of the acid selected from the group consisting of hydrochloric acid, nitric acid, phosphoric acid, hydrofluoric acid and a mixture of nitric acid and hydrofluoric acid.
Claim 8
Dependent Claim
27 words
A pattern forming method according to claim 1, wherein said lift-off layer is formed by a vapor deposition method, a sputtering method or a plasma CVD method.
Claim 9
Dependent Claim
22 words
A pattern forming method according to claim 1, wherein said monomolecular film or said monomolecular built-up film is formed by Langmuir-Blodgett method.
Claim 10
Dependent Claim
25 words
A pattern forming method according to claim 1, wherein said monomolecular film or said monomolecular built-up film comprises a merocyanine derivative or a diacetylene derivative.
References Cited (Backward Citations)
US4119483A
Cited
US4502914A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1989-05-05 | 1989-11-04 | 1990-05-06 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1993-05-05 | 1993-11-04 | 1994-05-06 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1997-05-05 | 1997-11-04 | 1998-05-06 | $7700.00 | Window Closed / Lapsed |