Patent US4587433A successfully refreshed from Google Patents.
US4587433A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Dose control apparatus
Assignee: Axcelis Technologies Inc
•
Filing: 1985-04-03
•
Granted: 1986-05-06
•
Expires: 2005-04-03
Abstract
Abstract An apparatus for measuring and compensating for neutral ions in an ion beam in the dose control system of an ion implanter. The gas pressure in the implantation volume (15) is measured, and the pressure signal is converted to an effective beam current signal in accordance with a known relationship among the gas pressure, the apparent beam current as measured by a Faraday cage and the neutral beam. The resulting effective beam current signal is inputted to the dose control system.
Inventors
- 👤 Marvin Farley
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 15:05
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/30; H01J37/304; H01J37/317; H01J37/3171
Claims Analysis
Total Claims: 3
Claim 1
Independent Claim
127 words
In an ion implanter comprising a target chamber, means for directing an ion beam against one or more workpieces within said target chamber, and a dose control system for controlling the dose of ions implanted into said workpiece: means for measuring the current of the positive striking the workpiece, said current representing an apparent beam current; means for measuring the gas pressure in said target chamber; means for converting said pressure measurement to an equivalent neutral beam current signal in accordance with a predetermined relationship among said pressure, the apparent beam current, and the neutral beam current; and means for adding said neutral beam current signal to a signal representative of the apparent beam current, to provide an effective beam current signal to said dose control system.
Claim 2
Dependent Claim
127 words
In an ion implanter comprising a target chamber, means for directing an ion beam against one or more workpieces within said target chamber, and a dose control system for controlling the dose of ions implanted into said workpiece: means for measuring the current of the positive striking the workpiece, said current representing an apparent beam current; means for measuring the gas pressure in said target chamber; means for converting said pressure measurement to an equivalent neutral beam current signal in accordance with a predetermined relationship among said pressure, the apparent beam current, and the neutral beam current; and means for adding said neutral beam current signal to a signal representative of the apparent beam current, to provide an effective beam current signal to said dose control system.
Claim 3
Dependent Claim
27 words
Apparatus as claimed in claim 1, in which said means for converting said pressure signal and said means for adding said beam current signals in a microprocessor.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1989-05-05 | 1989-11-04 | 1990-05-06 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1993-05-05 | 1993-11-04 | 1994-05-06 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1997-05-05 | 1997-11-04 | 1998-05-06 | $7700.00 | Window Closed / Lapsed |