US4654231A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Vanadium dioxide film deposition
Assignee: United States Department of the Navy
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Filing: 1985-05-21
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Granted: 1987-03-31
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Expires: 2005-05-21
Abstract
Abstract A method of producing high quality stoichiometric thin films of vanadium dioxide by reactive evaporation utilizes an electron beam to evaporate a source of vanadium in a controlled, low pressure oxygen gas environment with the film being deposited at a predetermined rate onto a substrate which is heated to and maintained at a predetermined temperature above 500° C.
Inventors
- 👤 Glen A. Nyberg
- 👤 Robert A. Buhrman
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 10:38
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/06; C23C14/08; C23C14/083
Claims Analysis
Total Claims: 2
Claim 1
Independent Claim
110 words
A method of depositing a film of vanadium dioxide onto a substrate, comprising the steps of: heating the substrate to a temperature of between 565° C. and 595° C.; maintaining a low pressure oxygen gas environment, said environment having a practical base pressure of approximately 1×10 -7 Torr and an oxygen partial pressure controlled within a range of from 0.95×10 -3 Torr to 1.20×10 -3 Torr; and evaporating a source of pure vanadium in said environment such that the rate of film deposition upon the substrate is between 0.665 and 0.735 angstroms per second, whereby the film exhibits a blue-to-red change in transmission color upon heating through the transition temperature.
Claim 2
Independent Claim
110 words
A method of depositing a film of vanadium dioxide onto a substrate, comprising the steps of: heating the substrate to a temperature of between 565° C. and 595° C.; maintaining a low pressure oxygen gas environment, said environment having a practical base pressure of approximately 1×10 -7 Torr and an oxygen partial pressure controlled within a range of from 0.95×10 -3 Torr to 1.20×10 -3 Torr; and evaporating a source of pure vanadium in said environment such that the rate of film deposition upon the substrate is between 0.665 and 0.735 angstroms per second, whereby the film exhibits a blue-to-red change in transmission color upon heating through the transition temperature.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1990-03-30 | 1990-09-29 | 1991-03-31 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1994-03-30 | 1994-09-29 | 1995-03-31 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1998-03-30 | 1998-09-29 | 1999-03-31 | $7700.00 | Window Closed / Lapsed |