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US4670535A Expired / Lapsed US ⏱️ 0.0 years remaining

Photosensitive polyimide precursor and process for producing the same

Assignee: Mitsubishi Gas Chemical Co Inc
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Filing: 1986-06-17
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Granted: 1987-06-02
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Expires: 2006-06-17
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Abstract

Abstract The photosensitive polyimide precursor of the invention has a recurring unit represented by the following general formula [I]: ##STR1## (R 1 represents a tetravalent aromatic hydrocarbon residue; R 2 and R 3 each represent a divalent aromatic or aliphatic hydrocarbon residue; and R 4 represents a divalent aromatic hydrocarbon residue represented by ##STR2## wherein R 5 , R 6 , R 7 , R 8 , R 9 , R 10 , R 11 and R 12 , identical or different, each represent hydrogen atom, a halogen group or an alkyl group). The photosensitive polyimide precursor of the invention has a viscosity of 50 centipoises or above as measured at 23° C. in the state of a 10% (by weight) solution in N,N-dimethylacetamide. Its photosensitivity is as high as about 20-100 times that of prior products. After heat cyclization, it exhibits a heat resistance of 400° C. or above. The photosensitive polyimide precursor of the invention can be produced by subjecting a tetracarboxylic acid dianhydride and a diamino compound to a polycondensation reaction in an organic polar solvent.

Inventors

  • 👤 Akitoshi Sugio
  • 👤 Takao Kawaki
  • 👤 Katsushige Hayashi

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-01 15:16
CPC Classifications
C; C08; C08G; C08G73/00; C08G73/06; C08G73/10; C08G73/1075; C08G73/1082; G; G03; G03F; G03F7/00; G03F7/004; G03F7/038; G03F7/0387

Claims Analysis

Total Claims: 14
Claim 1
Independent Claim 113 words
A photosensitive polyimide precursor having a recurring unit represented by the following formula [I]: ##STR15## (R 1 represents a tetravalent aromatic hydrocarbon residue; R 2 and R 3 each represent a divalent aromatic or aliphatic hydrocarbon residue; and R 4 represents a divalent aromatic hydrocarbon residue represented by ##STR16## wherein R 5 , R 6 , R 7 , R 8 , R 9 , R 10 , R 11 and R 12 , identical or different, each represent hydrogen atom, a halogen group or an alkyl group) and having a viscosity of 50 centipoises or above as measured at 23° C. in the state of a 10% (by weight) solution in N,N-dimethylacetamide.
Claim 2
Dependent Claim 113 words
A photosensitive polyimide precursor having a recurring unit represented by the following formula [I]: ##STR15## (R 1 represents a tetravalent aromatic hydrocarbon residue; R 2 and R 3 each represent a divalent aromatic or aliphatic hydrocarbon residue; and R 4 represents a divalent aromatic hydrocarbon residue represented by ##STR16## wherein R 5 , R 6 , R 7 , R 8 , R 9 , R 10 , R 11 and R 12 , identical or different, each represent hydrogen atom, a halogen group or an alkyl group) and having a viscosity of 50 centipoises or above as measured at 23° C. in the state of a 10% (by weight) solution in N,N-dimethylacetamide.
Claim 3
Dependent Claim 53 words
A photosensitive polyimide precursor according to claim 1, wherein said divalent aromatic or aliphatic hydrocarbon residue represented by R 2 and R 3 is a group represented by one of the following groups: ##STR17## wherein X represents hydrogen atom, a halogen group or an alkyl group and m represents an integer of 1-6.
Claim 4
Dependent Claim 13 words
A photosensitive polyimide precursor according to claim 2, wherein X is hydrogen atom.
Claim 5
Dependent Claim 36 words
A photosensitive polyimide precursor according to claim 1, wherein R 5 , R 6 , R 7 , R 8 , R 9 , R 10 , R 11 and R 12 each represent hydrogen atom.
Claim 6
Dependent Claim 63 words
A photosensitive polyimide precursor according to claim 1, wherein the tetravalent aromatic hydrocarbon residue represented by R 1 is a group represented by one of the following formulas: ##STR18## wherein A represents --CH 2 --, --S--, --CO--, --SO 2 --, --C(CH 3 ) 2 -- or --C(CF 3 ) 2 -- and Z represents hydrogen atom, a halogen group or an alkyl group.
Claim 7
Dependent Claim 27 words
A photosensitive polyimide precursor according to claim 5, wherein the tetravalent aromatic hydrocarbon residue represented by R 1 is a group represented by the following formula: ##STR19##
Claim 8
Dependent Claim 27 words
A photosensitive polyimide precursor according to claim 5, wherein the tetravalent aromatic hydrocarbon residue represented by R 1 is a group represented by the following formula: ##STR20##
Claim 9
Dependent Claim 64 words
A photosensitive polyimide precursor according to claim 1, wherein the tetravalent aromatic hydrocarbon residue represented by R 1 has a formula ##STR21## or a formula ##STR22## the divalent aromatic hydrocarbon residues represented by R 2 and R 3 have a formula ##STR23## or a formula ##STR24## and the divalent aromatic hydrocarbon residue represented by R 4 has a formula ##STR25## or a formula ##STR26##
Claim 10
Dependent Claim 57 words
A process for producing a photosensitive polyimide precursor which comprises reacting a tetracarboxylic acid dianhydride represented by the following formula [II]: ##STR27## wherein R 1 is as defined in formula [I], with a diamino compound represented by the following formula [III]: ##STR28## wherein R 2 , R 3 and R 4 are as defined in formula [I].
Claim 11
Dependent Claim 57 words
A process for producing a photosensitive polyimide precursor which comprises reacting a tetracarboxylic acid dianhydride represented by the following formula [II]: ##STR27## wherein R 1 is as defined in formula [I], with a diamino compound represented by the following formula [III]: ##STR28## wherein R 2 , R 3 and R 4 are as defined in formula [I].
Claim 12
Dependent Claim 22 words
A process according to claim 9, wherein said tetracarboxylic acid dianhydride represented by formula [II]is pyromellitic anhydride or 3,3', 4,4'-benzophenonetetracarboxylic acid anhydride.
Claim 13
Dependent Claim 18 words
A process according to claim 9, wherein said diamino compound represented by formula [III] is 1,3- or 1,4-bis-[2-(3-aminobenzoyl)-ethenyl]-benzene.
Claim 14
Dependent Claim 18 words
A process according to claim 9, wherein said diamino compound represented by formula [III] is 1,3- or 1,4-bis-[2-(4-aminobenzoyl)-ethenyl]-benzene.

References Cited (Backward Citations)

US4595745A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1990-06-01 1990-12-01 1991-06-02 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1994-06-01 1994-12-01 1995-06-02 $3760.00 Window Closed / Lapsed
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