US4687938A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Ion source
Assignee: Hitachi Ltd
•
Filing: 1985-12-12
•
Granted: 1987-08-18
•
Expires: 2005-12-12
Abstract
Abstract An ion source includes an ion source material holder adapted to load an ion source material thereon and having an aperture at the bottom thereof, an ion emitter mounted on the ion source material holder at the aperture, heating means for heating the ion source material holder and the ion emitter, and an ion extracting electrode for extracting an ion beam from the ion emitter. The ion emitter is made of a mixture of a material having a large work function and a material having a small work function, in order to be able to emit both positive ions and negative ions from the ion emitter. The polarity of a voltage applied between the ion emitter and the ion extracting electrode is changed so that one of the positive ion beam and the negative ion beam can be selectively extracted from the ion emitter.
Inventors
- 👤 Hifumi Tamura
- 👤 Hiroyasu Shichi
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 13:58
CPC Classifications
H; H01; H01J; H01J27/00; H01J27/02; H01J27/26; H01J37/00; H01J37/02; H01J37/04; H01J37/08
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
155 words
An ion source including ion source material holding means adapted to load an ion source material therein and having an aperture at the bottom thereof, an ion emitter mounted on said ion source material holding means at said aperture, heating means for heating said ion source material holding means and said ion emitter, an ion extracting electrode for forming a strong electric field on the surface of said ion emitter, thereby extracting an ion beam from said ion emitter, and polarity changing means for changing the polarity of an ion extracting voltage applied between said ion emitter and said ion extracting electrode, wherein said ion emitter is made of a mixture of a material having a large work function for extracting positive ions upon application of said extracting voltage having a first polarity and a material having a small work function for extracting negative ions upon application of said extracting voltage having a second polarity.
Claim 2
Dependent Claim
155 words
An ion source including ion source material holding means adapted to load an ion source material therein and having an aperture at the bottom thereof, an ion emitter mounted on said ion source material holding means at said aperture, heating means for heating said ion source material holding means and said ion emitter, an ion extracting electrode for forming a strong electric field on the surface of said ion emitter, thereby extracting an ion beam from said ion emitter, and polarity changing means for changing the polarity of an ion extracting voltage applied between said ion emitter and said ion extracting electrode, wherein said ion emitter is made of a mixture of a material having a large work function for extracting positive ions upon application of said extracting voltage having a first polarity and a material having a small work function for extracting negative ions upon application of said extracting voltage having a second polarity.
Claim 3
Dependent Claim
33 words
An ion source according to claim 1, wherein said ion emitter is formed by sintering a mixture of a material having a large work function and a material having a small work function.
Claim 4
Dependent Claim
32 words
An ion source according to claim 2, wherein tungsten is used as the material having a large work function, and lanthanum hexaboride is used as the material having a small work function.
Claim 5
Dependent Claim
30 words
An ion source according to claim 3, wherein said ion emitter is formed by sintering a mixture of tungsten and lanthanum hexaboride, and has a porosity of 5 to 30%.
Claim 6
Dependent Claim
13 words
An ion source according to claim 1, wherein said ion emitter is porous.
Claim 7
Dependent Claim
14 words
An ion source according to claim 1, wherein said ion source material is CsCl.
Claim 8
Dependent Claim
14 words
An ion source according to claim 1, wherein said ion source material is CsI.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1990-08-17 | 1991-02-16 | 1991-08-18 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1994-08-17 | 1995-02-16 | 1995-08-18 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1998-08-17 | 1999-02-16 | 1999-08-18 | $7700.00 | Window Closed / Lapsed |