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US4741798A Expired / Lapsed US ⏱️ 0.0 years remaining

Installation for etching material

Assignee: HANS HILLMULLER MASCHINENBAU & Co A CORP OF GERMANY GmbH
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Filing: 1986-11-12
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Granted: 1988-05-03
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Expires: 2006-11-12
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Abstract

Abstract In an installation for etching material to be etched consisting at least partly of metal, preferably copper, oxidizing agent is added to the etching medium containing an acid, directly before the actual etching operation, in a quantity which is in a ratio to the quantity required according to stoichiometric calculation for etching the quantity of metal to be removed respectively from the material to be etched. For this a device is provided which emits a first electrical signal. This gives information about the quantity of material to be removed from the material to be etched respectively being processed. A second signal is emitted by a detector when the material to be etched enters the actual etching machine. Both signals are processed by a central control unit. This takes place in such a way that the central control unit emits a third signal which it has ascertained according to a memorized program from the first signal and whenever the detector signal is received. The third signal corresponds to the respectively desired quantity of oxidizing agent and acts on a metering device which then undertakes measuring of the quantity of oxidizing agent. In the same way acid may be added to the etching medium for regeneration in a stoichiometrically defined quantity.

Inventors

  • 👤 Rainer D. Haas

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-30 21:11
CPC Classifications
C; C23; C23F; C23F1/00; C23F1/08; H; H05; H05K; H05K3/00; H05K3/02; H05K3/06; H05K3/068

Claims Analysis

Total Claims: 15
Claim 1
Independent Claim 231 words
Apparatus for etching supports that have deposited thereon an etchable metal with an etching medium, which apparatus includes (a) an etching chamber, (b) means to convey said supports with metal deposited thereon through said etching chamber, (c) a plurality of nozzles which are positioned to spray etching medium containing acid on said supports as they move through said etching chamber, (d) a sump for receiving etching medium withdrawn from said etching chamber, (e) circulating means for circulating etching medium from said sump back to said plurality of nozzles, (f) a reservoir for providing an oxidizing agent and a reservoir for providing an acid, (g) a device for emitting a first signal indicative of the quantity of metal on said support, (h) a detector which emits a second signal when said support enters said etching chamber, (i) a control unit which receives said first and second signals and which generates a third signal indicative of the quantity of material in said reservoirs which needs to be included into said etching medium in order to achieve the amount stoichiometrically necessary, for said etching medium to remove the desired quantity of deposited metal from said support, and (j) metered conduits establishing fluid flow connection of said reservoirs of (f) with either the sump of (d) or the circulation means of (e), said metered conduits being responsive to said third signal set forth in (i).
Claim 2
Dependent Claim 231 words
Apparatus for etching supports that have deposited thereon an etchable metal with an etching medium, which apparatus includes (a) an etching chamber, (b) means to convey said supports with metal deposited thereon through said etching chamber, (c) a plurality of nozzles which are positioned to spray etching medium containing acid on said supports as they move through said etching chamber, (d) a sump for receiving etching medium withdrawn from said etching chamber, (e) circulating means for circulating etching medium from said sump back to said plurality of nozzles, (f) a reservoir for providing an oxidizing agent and a reservoir for providing an acid, (g) a device for emitting a first signal indicative of the quantity of metal on said support, (h) a detector which emits a second signal when said support enters said etching chamber, (i) a control unit which receives said first and second signals and which generates a third signal indicative of the quantity of material in said reservoirs which needs to be included into said etching medium in order to achieve the amount stoichiometrically necessary, for said etching medium to remove the desired quantity of deposited metal from said support, and (j) metered conduits establishing fluid flow connection of said reservoirs of (f) with either the sump of (d) or the circulation means of (e), said metered conduits being responsive to said third signal set forth in (i).
Claim 3
Dependent Claim 26 words
Apparatus according to claim 1 wherein said control unit is a means for calculating the third signal from the first signal according to a prescribed algorithm.
Claim 4
Dependent Claim 34 words
Apparatus according to claim 1 wherein said control unit is a means for assigning the third signal to the first signal according to tables which are stored in a memory of the control unit.
Claim 5
Dependent Claim 74 words
Apparatus according to claim 1 wherein said device of (g) comprises an optical reflection measuring device which determines the exposed metal surface on the material to be etched and a thickness measuring device which determines the thickness of the layer of metal to be removed from said support and said control unit calculates the quantity of metal to be etched from the exposed surface and the thickness of the metal layer to be removed.
Claim 6
Dependent Claim 33 words
Apparatus according to claim 1 wherein said device (g) is a reading head, which deciphers a code provided on said support in which case the first signal is representative of the deciphered code.
Claim 7
Dependent Claim 41 words
Apparatus according to claim 1 wherien said device (g) is a keyboard, by which a code for the respective material to be processed or the quantity of metal to be etched can be fed directly by hand into said control unit.
Claim 8
Independent Claim 221 words
A method for etching supports that have deposited thereon an etchable metal with an etching medium, which method includes (a) providing an etching zone, (b) conveying said supports with metal deposited thereon through said etching zone, (c) spraying an etching medium containing acid with a means for spraying on said supports as they move through said etching zone to thereby etch said deposited metal, (d) withdrawing etching medium from said etching zone with withdrawing means, (e) circulating withdrawn etching medium with circulating means back to the spraying means of stop (c) (f) providing a supply of an oxidizing agent and a supply of acid, (g) emitting a first signal indicative of the quantity of metal on said support, (h) emitting a second signal when said support enters said etching zone, (i) receiving said first and second signals and generating a third signal indicative of the quantity of oxidizing agent and acid which needs to be included into said etching medium in order to achieve the amount stoichiometrically necessary to remove the desired quantity of deposited metal from said support, and (j) metering the supplies of oxidizing agent and acid set forth in step (f) to the withdrawing means of step (d) and the circulating means of step (e), said metering being responsive to said third signal set forth in step (i).
Claim 9
Independent Claim 221 words
A method for etching supports that have deposited thereon an etchable metal with an etching medium, which method includes (a) providing an etching zone, (b) conveying said supports with metal deposited thereon through said etching zone, (c) spraying an etching medium containing acid with a means for spraying on said supports as they move through said etching zone to thereby etch said deposited metal, (d) withdrawing etching medium from said etching zone with withdrawing means, (e) circulating withdrawn etching medium with circulating means back to the spraying means of stop (c) (f) providing a supply of an oxidizing agent and a supply of acid, (g) emitting a first signal indicative of the quantity of metal on said support, (h) emitting a second signal when said support enters said etching zone, (i) receiving said first and second signals and generating a third signal indicative of the quantity of oxidizing agent and acid which needs to be included into said etching medium in order to achieve the amount stoichiometrically necessary to remove the desired quantity of deposited metal from said support, and (j) metering the supplies of oxidizing agent and acid set forth in step (f) to the withdrawing means of step (d) and the circulating means of step (e), said metering being responsive to said third signal set forth in step (i).
Claim 10
Dependent Claim 21 words
A method according to claim 7 wherein said third signal is calculated from the first signal according to a prescribed algorithm.
Claim 11
Dependent Claim 29 words
A method according to claim 7 wherein said third signal is assigned to the first signal according to tables which are stored in a memory of a control unit.
Claim 12
Dependent Claim 74 words
A method according to claim 7 wherein said first signal is emitted by an optical reflection measuring device which determines the exposed metal surface on the material to be etched and a thickness measuring device which determines the thickness of the layer of metal to be removed from said support, and the quantity of metal to be etched from the exposed surface and the thickness of the metal layer to be removed is calculated.
Claim 13
Dependent Claim 11 words
A method according to claim 7 wherein said metal is cooper.
Claim 14
Dependent Claim 12 words
A method according to claim 7 wherein said acid is sulphuric acid.
Claim 15
Dependent Claim 11 words
A method according to claim 12 wherein said metal is copper.

References Cited (Backward Citations)

US3419446A Cited
US3880685A Cited
US3645811A Cited
US3964956A Cited
US4042444A Cited
US4208240A Cited
US4397708A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1991-05-03 1991-11-02 1992-05-03 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1995-05-03 1995-11-02 1996-05-03 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1999-05-03 1999-11-02 2000-05-03 $7700.00 Window Closed / Lapsed

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