Patent US4749587A successfully refreshed from Google Patents.
US4749587A
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US
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Process for depositing layers on substrates in a vacuum chamber
Assignee: OC Oerlikon Balzers AG
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Filing: 1986-06-19
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Granted: 1988-06-07
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Expires: 2006-06-19
Abstract
Abstract In the previously used methods for the deposition of layers on surfaces by means of chemical reactions with gases, which are introduced into the reaction room or chamber (chemical vapor deposition, CVD), electrical glow discharge and mainly high-frequency discharges were used for the activation of the reactants. According to the invention, the maintaining of a low-voltage arc discharge in the reaction room during the coating is recommended. The surprising result of this is a considerably stronger activation and ionization and a more uniform coating also on surfaces of complex shape.
Inventors
- 👤 Erich Bergmann
- 👤 Elmar Hummer
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 05:39
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/50; C23C16/503
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
119 words
A process for the deposition of at least one layer on a substrate in a vacuum chamber of an evaporation vessel by Chemical Vapor Deposition, comprising introducing chemical reactants of the substance forming the at least one layer into the vacuum chamber in a gaseous form, activating and partly ionizing the reactants by gas discharge in a space adjacent the substrate to be coated so as to induce it to enter into a layer forming reaction on the substrate surface, and effecting the activation and ionization of the reactants by an electric arc discharge to produce ions between an anode and a cathode, and accelerating the produced ion in the direction toward the substrate surface by an electric field.
Claim 2
Dependent Claim
119 words
A process for the deposition of at least one layer on a substrate in a vacuum chamber of an evaporation vessel by Chemical Vapor Deposition, comprising introducing chemical reactants of the substance forming the at least one layer into the vacuum chamber in a gaseous form, activating and partly ionizing the reactants by gas discharge in a space adjacent the substrate to be coated so as to induce it to enter into a layer forming reaction on the substrate surface, and effecting the activation and ionization of the reactants by an electric arc discharge to produce ions between an anode and a cathode, and accelerating the produced ion in the direction toward the substrate surface by an electric field.
Claim 3
Dependent Claim
16 words
A process according to claim 1, wherein a suitable medium is used to cool the anode.
Claim 4
Dependent Claim
17 words
A process according to claim 2, wherein the cathode is positioned out of sight of the substrate.
Claim 5
Dependent Claim
20 words
A process according to claim 3, wherein the cathode is located in a separate chamber attached to the evaporation vessel.
Claim 6
Dependent Claim
19 words
A process according to claim 1, wherein the gas pressure in the reaction chamber is less than 1 pascal.
References Cited (Backward Citations)
US679926A
Cited
US3573098A
Cited
US3625848A
Cited
US4551221A
Cited
US4512867A
Cited
US4540596A
Cited
US4622452A
Cited
US4559121A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1991-06-07 | 1991-12-07 | 1992-06-07 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1995-06-07 | 1995-12-07 | 1996-06-07 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1999-06-07 | 1999-12-07 | 2000-06-07 | $7700.00 | Window Closed / Lapsed |