Patent US1668978A successfully refreshed from Google Patents.
Patent US4755442A successfully refreshed from Google Patents.
US4755442A
Expired / Lapsed
US
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Pattern developing process and apparatus therefor
Assignee: Toshiba Corp
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Filing: 1986-08-11
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Granted: 1988-07-05
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Expires: 2006-08-11
Abstract
Abstract A resist is coated on a photomask and a predetermined pattern is exposed on the resist. The photomask is dipped in a developing solution together with an electrode which exhibits a stable potential in the developing solution, so that a change in current flowing between the photomask and the electrode is detected on the basis of a change in capacitance between the photomask and the developing solution, while developing the pattern formed on the resist. The current abruptly changes (e.g., exhibits its peak) around the time at which the resist is removed and a chromium underlying layer of the photomask is exposed. The time obtained by multiplying the time until the change appears by a predetermined coefficient is regarded as the time corresponding to the end of the developing step.
Inventors
- 👤 Hiroyuki Hasebe
- 👤 Masayuki Suzuki
- 👤 Yasuo Matsuoka
- 👤 Takashi Tsuchiya
- 👤 Kinya Usuda
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 16:37
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/26; G03F7/30; H; H10; H10P; H10P95/00
Claims Analysis
Total Claims: 20
Claim 1
Independent Claim
164 words
A pattern developing process comprising: a resist-forming step of forming a resist film on a surface of a conductor; a pattern-forming step of forming a predetermined pattern on said resist film by an electron beam; a developing step of developing the pattern, such that said conductor on which the resist pattern is formed is dipped in a developer containing an organic solvent and an ionized material to selectively remove the resist film; a detecting step in which an electrode exhibiting a stable potential in the developer is dipped in the developer to detect a change in electrochemical parameter between said electrode and said conductor, based on a change in capacitance between said conductor and said developer; and an end-determining step for determining the end point of said developing step, with reference to a reference time between the time preceding a changing point of the electrochemical parameter by a predetermined period and the time following the changing point of the parameter by another predetermined period.
Claim 2
Dependent Claim
164 words
A pattern developing process comprising: a resist-forming step of forming a resist film on a surface of a conductor; a pattern-forming step of forming a predetermined pattern on said resist film by an electron beam; a developing step of developing the pattern, such that said conductor on which the resist pattern is formed is dipped in a developer containing an organic solvent and an ionized material to selectively remove the resist film; a detecting step in which an electrode exhibiting a stable potential in the developer is dipped in the developer to detect a change in electrochemical parameter between said electrode and said conductor, based on a change in capacitance between said conductor and said developer; and an end-determining step for determining the end point of said developing step, with reference to a reference time between the time preceding a changing point of the electrochemical parameter by a predetermined period and the time following the changing point of the parameter by another predetermined period.
Claim 3
Dependent Claim
17 words
The process according to claim 1, wherein said changing point is the peak of the electrochemical parameter.
Claim 4
Dependent Claim
20 words
The process according to claim 2, wherein the electrochemical parameter is a current flowing between said electrode and said conductor.
Claim 5
Dependent Claim
23 words
The process according to claim 2, wherein the electrochemical parameter is a differential value of a capacitance between said electrode and said conductor.
Claim 6
Dependent Claim
21 words
The process according to claim 2, wherein the peak of the electrochemical parameter is the first peak appearing during the development.
Claim 7
Dependent Claim
30 words
The process according to claim 1, wherein the end of said developing step is the time calculated by multiplying the period taken until said reference time by a predetermined coefficient.
Claim 8
Dependent Claim
36 words
The process according to claim 6, wherein the end of said developing step is the time calculated by multiplying the period taken until the appearance of the peak of the electrochemical parameter by a predetermined coefficient.
Claim 9
Dependent Claim
17 words
The process according to claim 7, wherein the predetermined coefficient is determined by a pattern area ratio.
Claim 10
Dependent Claim
20 words
The process according to claim 8, wherein the pattern area ratio is determined from the peak of the electrochemical parameter.
Claim 11
Dependent Claim
13 words
The process according to claim 1, wherein said electrode is made of platinum.
Claim 12
Dependent Claim
14 words
The process according to claim 1, wherein said electrode is made of silver/silver chloride.
Claim 13
Dependent Claim
42 words
The process according to claim 1, wherein said conductor has a resist on which a pattern for determining the end of said developing step is formed in advance, and is developed in said pattern developing step to increase the resist removal area.
Claim 14
Dependent Claim
23 words
The process according to claim 12, wherein the resist removal area is not less than 5% of the surface area of the conductor.
Claim 15
Dependent Claim
18 words
The process according to claim 1, wherein the changing point in an inflection point of the electrochemical parameter.
Claim 16
Dependent Claim
19 words
The process according to claim 14, wherein the electrochemical parameter is a capacitance between said electrode and said conductor.
Claim 17
Dependent Claim
18 words
The process according to claim 1, wherein the changing point is an extremal value of the electrochemical parameter.
Claim 18
Dependent Claim
24 words
The process according to claim 16, wherein the electrochemical parameter is a differential value of a current flowing between said electrode and said conductor.
Claim 19
Dependent Claim
21 words
The process according to claim 17, wherein the extremal value is a maximum vlaue of the differential value of the current.
Claim 20
Dependent Claim
21 words
The process according to claim 17, wherein the extremal value is a minimum value of the differential value of the current.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1991-07-05 | 1992-01-04 | 1992-07-05 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1995-07-05 | 1996-01-04 | 1996-07-05 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1999-07-05 | 2000-01-04 | 2000-07-05 | $7700.00 | Window Closed / Lapsed |