Apparatus for providing an electrical connection to a metallic pad situated on a brittle dielectric substrate

Claim 1

In an integrated circuit wherein an interconnect pin is brazed to a metallic pad located on a dielectric substrate and situated within a pattern of conductive metallurgy formed on a surface of the dielectric substrate, the improvement comprising: a dielectric layer, situated on the surface of the substrate and above the pattern, said dielectric layer having both a lower coefficient of thermal expansion than that of said dielectric substrate and an opening wherein said opening is concentrically aligned with the pad and is smaller than the pad such that a portion of said dielectric layer overlaps a closed peripheral portion of said pad and thereby defines a closed wall to contain brazing material such that said brazing material is prevented from contacting an edge of the pad in order to reduce stress occurring at an interface between the pad and the substrate; a head of an interconnect pin situated in said opening; and a brazed bond between the head of said pin and said pad wherein said brazing material is contained within said closed wall.