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US4780169A
Expired / Lapsed
US
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Non-uniform gas inlet for dry etching apparatus
Assignee: Motorola Solutions Inc
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Filing: 1987-05-11
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Granted: 1988-10-25
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Expires: 2007-05-11
Abstract
Abstract A gas inlet having a non-uniform array of inlet holes for the non-uniform introduction of an etching gas into a reaction chamber of a dry etching apparatus. The non-uniform introduction of gas compensates for non-uniform characteristics in the dry etching apparatus resulting in a uniform etch.
Inventors
- 👤 Mark M. Stark
- 👤 Douglas H. Warenback
- 👤 David J. Drage
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 12:06
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32431; H01J37/3244
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
146 words
In a reaction chamber for containing a glow discharge including a means for creating a plasma glow discharge in the presence of a gas for etching, said chamber being structured for producing a non-uniform etch in a surface to be treated, the improvement comprising: an inlet plate coupled to a surface of said reaction chamber for defining a gas chamber; means for holding said surface to be etched within said reaction chamber, adjacent said inlet plate and outside said gas chamber; wherein said inlet plate defines at least one array of holes through said inlet plate so that gas can flow from said gas chamber to said surface to be treated; and said holes being non-uniformly distributed over the surface of said inlet plate so that gas flows more readily through some areas of said plate than through others so as to provide a uniform etch.
Claim 2
Dependent Claim
146 words
In a reaction chamber for containing a glow discharge including a means for creating a plasma glow discharge in the presence of a gas for etching, said chamber being structured for producing a non-uniform etch in a surface to be treated, the improvement comprising: an inlet plate coupled to a surface of said reaction chamber for defining a gas chamber; means for holding said surface to be etched within said reaction chamber, adjacent said inlet plate and outside said gas chamber; wherein said inlet plate defines at least one array of holes through said inlet plate so that gas can flow from said gas chamber to said surface to be treated; and said holes being non-uniformly distributed over the surface of said inlet plate so that gas flows more readily through some areas of said plate than through others so as to provide a uniform etch.
Claim 3
Dependent Claim
37 words
The reaction chamber as set forth in claim 1, wherein said inlet plate comprising more than one array of holes wherein the holes in each array have a different diameter from the holes in the other arrays.
Claim 4
Dependent Claim
23 words
The reaction chamber as set forth in claim 2 wherein the larger diameter holes are located near the center of said inlet plate.
Claim 5
Dependent Claim
17 words
The reaction chamber as set forth in claim 3 wherein said arrays together form a spoked pattern.
Claim 6
Dependent Claim
16 words
The reaction chamber as set forth in claim 1 wherein said array forms a spoked pattern.
Claim 7
Dependent Claim
14 words
A gas inlet as claimed in claim 7 wherein said inlet plate comprises aluminum.
Claim 8
Dependent Claim
14 words
A gas inlet as claimed in claim 6 wherein said inlet plate is anodized.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1991-10-25 | 1992-04-25 | 1992-10-25 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1995-10-25 | 1996-04-25 | 1996-10-25 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1999-10-25 | 2000-04-25 | 2000-10-25 | $7700.00 | Window Closed / Lapsed |