Lithographic mask structure and process for preparing the same

Claim 2

A lithographic mask structure comprising: a mask support film; and a substrate including a central flat top surface and an outer peripheral bonding surface, said peripheral bonding surface being inclined so that a thickness of the substrate decreases in a radial direction and having an annular groove therein, said mask support film being disposed on said substrate so as to cover said flat top surface, and an outer peripheral portion of said mask support film being adhesively bonded to said inclined peripheral bonding surface of said substrate, wherein said annular groove prevents adhesive disposed on the said peripheral bonding surface from reaching an interface between said flat top surface and said mask support film.

Claim 3

A lithographic mask structure according to claim 1, further comprising a mask member which is applied with a desired pattern to said mask support film.

Claim 4

A lithographic mask structure according to claim 1, further comprising a mask member applied as a film to said mask support film.

Claim 5

A lithographic mask structure according to claim 1, wherein said groove includes a venting portion through which adhesive can flow out from the groove.

Claim 6

A lithographic mask structure according to claim 1, wherein said annular groove is formed at a middle portion in a radial direction of said peripheral bonding surface.

Claim 7

A lithographic mask structure according to claim 1, wherein said annular groove is formed along an inner peripheral portion of said peripheral bonding surface adjacent to an outer peripheral portion of said flat top surface.

Claim 8

A lithographic mask structure according to claim 5, wherein said mask support film is adhesively bonded to said substrate at a portion located outside of said groove in the radial direction of said peripheral bonding surface.

Claim 9

A lithographic mask structure according to claim 6, wherein said mask support film is adhesively bonded to said substrate at a portion located outside of said groove in the radial direction of said peripheral bonding surface.

Claim 10

A lithographic mask structure comprising: a mask support film; and a substrate including a central flat top surface formed at a first level, and an outer peripheral flat bonding surface formed at a second level lower than the first level of said flat top surface so that a thickness of the peripheral surface is smaller than that of said central portion; an annular groove formed adjacent to an axial wall adjoining said top surface and said bonding surface, and at an inner peripheral portion of said bonding surface; said mask support film being disposed on said substrate so as to cover said flat top surface and having an outer peripheral portion adhesively bonded to said peripheral flat bonding surface of said substrate, wherein the adhesive is prevented by said groove from reaching an interface between said flat top surface and said mask support film.

Claim 11

A lithographic mask structure comprising: a mask support film; and a substrate including a central flat top surface formed at a first level, and an outer peripheral flat bonding surface formed at a second level lower than the first level of said flat top surface so that a thickness of the peripheral surface is smaller than that of said central portion; an annular groove formed adjacent to an axial wall adjoining said top surface and said bonding surface, and at an inner peripheral portion of said bonding surface; said mask support film being disposed on said substrate so as to cover said flat top surface and having an outer peripheral portion adhesively bonded to said peripheral flat bonding surface of said substrate, wherein the adhesive is prevented by said groove from reaching an interface between said flat top surface and said mask support film.