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US4812901A Expired / Lapsed US ⏱️ 0.0 years remaining

Probe apparatus

Assignee: Tokyo Electron Ltd
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Filing: 1987-09-23
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Granted: 1989-03-14
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Expires: 2007-09-23
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Abstract

Abstract A probe apparatus is disclosed, in which, when performing a predetermined processing on an object having a pattern recurring at a predetermined pitch by moving the object at a pitch equal to the predetermined pitch, the difference between the pitch of actual movement of the object and the pitch of the recurrence of pattern is detected by pattern recognition, and the pitch of movement of the object is corrected according to the detected difference.

Inventors

  • 👤 Wataru Karasawa

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-30 06:09
CPC Classifications
G; G01; G01R; G01R1/00; G01R1/02; G01R1/06; G01R1/067; G01R1/073; G01R1/07307; G01R31/00; G01R31/28; G01R31/2851; G01R31/2855; G01R31/2872

Claims Analysis

Total Claims: 7
Claim 1
Independent Claim 149 words
A probe apparatus comprising: means for moving a semiconductor wafer having a plurality of chips, said plurality of chips being arranged in patterns and said plurality of chips having a predetermined pitch; measuring means for measuring an electric characteristic of each chip of said plurality of chips on said semiconductor wafer while said semiconductor wafer is being moved; pattern recognition means for evaluating the patterns of said plurality of chips at at least two predetermined locations on said semiconductor wafer; detecting means for detecting an arrangement pitch of said plurality of chips and for detecting a pitch at which said semiconductor wafer is moving along; calculation means for calculating a difference between said arrangement pitch and said pitch at which said semiconductor wafer is moving along; means for correcting said difference such that said arrangement pitch and said pitch at which said semiconductor wafer is moving along are identical.
Claim 2
Dependent Claim 149 words
A probe apparatus comprising: means for moving a semiconductor wafer having a plurality of chips, said plurality of chips being arranged in patterns and said plurality of chips having a predetermined pitch; measuring means for measuring an electric characteristic of each chip of said plurality of chips on said semiconductor wafer while said semiconductor wafer is being moved; pattern recognition means for evaluating the patterns of said plurality of chips at at least two predetermined locations on said semiconductor wafer; detecting means for detecting an arrangement pitch of said plurality of chips and for detecting a pitch at which said semiconductor wafer is moving along; calculation means for calculating a difference between said arrangement pitch and said pitch at which said semiconductor wafer is moving along; means for correcting said difference such that said arrangement pitch and said pitch at which said semiconductor wafer is moving along are identical.
Claim 3
Dependent Claim 38 words
The probe apparatus according to claim 1, wherein: the difference between said arrangement pitch and said pitch at which said semiconductor wafer is moving along results from a mechanical error associated with the movement of said semiconductor wafer.
Claim 4
Dependent Claim 49 words
The probe apparatus according to claim 1, wherein: the difference between said arrangement pitch and said pitch at which said semiconductor wafer is moving along results from fluctuations in the chip size of said plurality of chips which may occur in the process of forming chips on the wafer.
Claim 5
Dependent Claim 33 words
The probe apparatus according to claim 1, wherein: the difference between said arrangement pitch and said pitch at which said semiconductor wafer is moving along results from temperature variations of said semiconductor wafer.
Claim 6
Dependent Claim 158 words
A probe apparatus comprising: means for moving a semiconductor wafer having a plurality of chips, said plurality of chips being arranged in patterns and said plurality of chips having a predetermined pitch; measuring means for measuring an electric characteristic of each chip of said plurality of chips on said semiconductor wafer while said semiconductor wafer is being moved; pattern recognition means for evaluating the patterns of said plurality of chips at at least two predetermined locations on said semiconductor wafer; detecting means for detecting an arrangement pitch of said plurality of chips and for detecting a pitch at which said semiconductor wafer is moving along; calculation means for calculating a difference between said arrangement pitch and said pitch at which said semiconductor wafer is moving along; means for correcting said difference such that said arrangement pitch and said pitch at which said semiconductor wafer is moving along are identical; means for uniformly controlling said semiconductor wafer's temperature level.
Claim 7
Dependent Claim 158 words
A probe apparatus comprising: means for moving a semiconductor wafer having a plurality of chips, said plurality of chips being arranged in patterns and said plurality of chips having a predetermined pitch; measuring means for measuring an electric characteristic of each chip of said plurality of chips on said semiconductor wafer while said semiconductor wafer is being moved; pattern recognition means for evaluating the patterns of said plurality of chips at at least two predetermined locations on said semiconductor wafer; detecting means for detecting an arrangement pitch of said plurality of chips and for detecting a pitch at which said semiconductor wafer is moving along; calculation means for calculating a difference between said arrangement pitch and said pitch at which said semiconductor wafer is moving along; means for correcting said difference such that said arrangement pitch and said pitch at which said semiconductor wafer is moving along are identical; means for uniformly controlling said semiconductor wafer's temperature level.

References Cited (Backward Citations)

US3899634A Cited
US3810017A Cited
US4104589A Cited
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USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1992-03-13 1992-09-12 1993-03-14 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1996-03-13 1996-09-12 1997-03-14 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2000-03-13 2000-09-12 2001-03-14 $7700.00 Window Closed / Lapsed

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