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US4847178A Expired / Lapsed US ⏱️ 0.0 years remaining

Positive photosensitive o-quinone diazide composition with benzotriazole carboxylic acid or alkyl ester

Assignee: Tokyo Ohka Kogyo Co Ltd
•
Filing: 1987-04-30
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Granted: 1989-07-11
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Expires: 2007-04-30
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Abstract

Abstract A positive type photosensitive composition capable of improving the drawback in the conventional positive type photosensitive resin composition, improving adhesion between the positive type photoresist and the substrate and improving developability is provided by incorporating benzotriazole carboxylic acids in the positive type photoresist.

Inventors

  • 👤 Hiroshi Komano

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-29 16:11
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/085; G03C; G03C1/00; G03C1/72; G03F7/022; G03F7/0226; H; H05; H05K; H05K3/00; H05K3/0073; H05K3/0076

Claims Analysis

Total Claims: 9
Claim 1
Independent Claim 76 words
A positive type photosensitive resin composition, comprising a material comprising a photosensitive amount of an o-quinone diazide group-containing compound wherein the o-quinone diazide group decomposes when subjected to irradiation with actinic rays; and about 0.05 to 5 wt % with respect to the total solid content of the composition of a benzotriazole carboxylic acid or aliphatic ester compound of the formula ##STR3## wherein R is H or a (C 1 -C 3 ) aliphatic hydrocarbon residue.
Claim 2
Dependent Claim 76 words
A positive type photosensitive resin composition, comprising a material comprising a photosensitive amount of an o-quinone diazide group-containing compound wherein the o-quinone diazide group decomposes when subjected to irradiation with actinic rays; and about 0.05 to 5 wt % with respect to the total solid content of the composition of a benzotriazole carboxylic acid or aliphatic ester compound of the formula ##STR3## wherein R is H or a (C 1 -C 3 ) aliphatic hydrocarbon residue.
Claim 3
Dependent Claim 34 words
The resin composition of claim 1, wherein the benzotriazole carboxylic acid compound is present in an amount of about 0.2 to 2 wt % with respect to the total solid content of the composition.
Claim 4
Dependent Claim 26 words
The resin composition of claim 1, wherein the benzotriazole carboxylic acid compound is selected from the group consisting of 4-benzotriazole carboxylic acid and 5-benzotriazole carboxylic acid.
Claim 5
Dependent Claim 20 words
The resin composition of claim 1, wherein the benzotriazole carboxylic acid compound is an ester of a benzotriazole carboxylic acid.
Claim 6
Dependent Claim 27 words
The resin composition of claim 4, wherein the ester of the benzotriazole carboxylic acid is a (C 1 -C 3 ) alkyl ester of benzotriazole carboxylic acid.
Claim 7
Dependent Claim 28 words
The resin composition of claim 1, wherein the o-quinone diazide group-containing compound is selected from the group consisting of o-naphthoquinonediazide sulfonic acid ester and o-naphthoquinonediazide sulfonic acid amide.
Claim 8
Dependent Claim 30 words
The resin composition of claim 6, wherein the o-naphthoquinonediazide sulfonic acid ester is the esterification product of a compound having at least one phenolic hydroxyl group and o-naphthoquinonediazide sulfonic acid.
Claim 9
Dependent Claim 58 words
The resin composition of claim 7, wherein the compound having a phenolic hydroxyl group is selected from the group consisting of Novolak resin, alkyl esters of gallic acid, homopolymers of p-hydroxystyrene, condensates of pyrogallol and acetone, tetrahydroxybenzophenone, trihydroxybenzene, monoethers of trihydroxybenzene, 2,2',4,4'-tetrahydroxydiphenylmethane, 4,4'-dihydroxydiphenylpropane, 2,2'-dihydroxydinaphthylmethane, 4,4'-dihydroxydiphenyl sulfonfic acid, 2-hydroxyfluorene, 2-hydroxyphenanthrene, polyhydroxyanthraquinone, purpurogalline, purpurogallines and phenyl esters of 2,4,6-trihydroxybnezoic acid.

References Cited (Backward Citations)

US3661582A Cited
US3859099A Cited
US4036644A Cited
US4438190A Cited
US4365019A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1992-07-10 1993-01-09 1993-07-11 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1996-07-10 1997-01-09 1997-07-11 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2000-07-10 2001-01-09 2001-07-11 $7700.00 Window Closed / Lapsed

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