Patent US4857382A successfully refreshed from Google Patents.
US4857382A
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Apparatus and method for photoetching of polyimides, polycarbonates and polyetherimides
Assignee: SABIC Global Technologies BV
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Filing: 1988-04-26
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Granted: 1989-08-15
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Expires: 2008-04-26
Abstract
Abstract Polyimides, polycarbonates, polyetherimides and other highly stable organic polymers are photoetched through the use of deep ultraviolet light produced by a broad area, non-coherent, continuous light source. This method is effective in an oxygen-free environment, but provides slightly higher etch rates in an air ambient as a result of the oxygen in the air ambient. The apparatus in which this photoetching occurs may employ a single light source or a plurality of side-by-side lamps and may include ports which allow continuous transport of samples therethrough.
Inventors
- 👤 Yung S. Liu
- 👤 Willard T. Grubb
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-03 06:38
CPC Classifications
B; B29; B29C; B29C59/00; B29C59/16; G; G03; G03F; G03F7/00; G03F7/004; G03F7/039; G03F7/20; G03F7/2002; G03F7/2004; H; H10; H10P; H10P50/00; H10P50/20; H10P50/28; H10P50/286; H10P50/287; B29C35/00; B29C35/02; B29C35/08; B29C35/0805; B29C2035/0827; B29K; B29K2069/00; B29K2079/00; H05; H05K; H05K3/00; H05K3/0011; H05K3/0017; Y; Y10; Y10T; Y10T428/00; Y10T428/24; Y10T428/24479; Y10T428/31504; Y10T428/31507; Y10T428/31721
Claims Analysis
Total Claims: 28
Claim 1
Independent Claim
83 words
A method of etching, by photodecomposition, an organic polymer selected from the group consisting of polyimides, polycarbonates and polyetherimides, comprising: providing a broad area source of continuous ultraviolet light in the form of a high-current-density mercury lamp operating at a current density of at least 1.0 amp/cm 2 of lamp internal cross-sectional area, said ultraviolet light including wavelengths shorter than 200 nanometers; and exposing the portion of said polymer to be etched to the broad area continuous ultraviolet light emanating from said source.
Claim 2
Independent Claim
83 words
A method of etching, by photodecomposition, an organic polymer selected from the group consisting of polyimides, polycarbonates and polyetherimides, comprising: providing a broad area source of continuous ultraviolet light in the form of a high-current-density mercury lamp operating at a current density of at least 1.0 amp/cm 2 of lamp internal cross-sectional area, said ultraviolet light including wavelengths shorter than 200 nanometers; and exposing the portion of said polymer to be etched to the broad area continuous ultraviolet light emanating from said source.
Claim 3
Independent Claim
102 words
A method of etching, by photodecomposition, an organic polymer selected from the group consisting of polyimides, polycarbonates and polyetherimides, comprising: providing a high-current-density mercury lamp operating at a current density of at least 1.0 amp/cm 2 of lamp internal cross-sectional area as a broad area source of continuous ultraviolet light, said ultraviolet light including wavelengths shorter than 200 nanometers; disposing at least the portion of said polymer to be etched in an environment which is free of molecular oxygen and ozone; and exposing the portion of said polymer to be etched to the broad area continuous ultraviolet light emanating from said lamp.
Claim 4
Independent Claim
102 words
A method of etching, by photodecomposition, an organic polymer selected from the group consisting of polyimides, polycarbonates and polyetherimides, comprising: providing a high-current-density mercury lamp operating at a current density of at least 1.0 amp/cm 2 of lamp internal cross-sectional area as a broad area source of continuous ultraviolet light, said ultraviolet light including wavelengths shorter than 200 nanometers; disposing at least the portion of said polymer to be etched in an environment which is free of molecular oxygen and ozone; and exposing the portion of said polymer to be etched to the broad area continuous ultraviolet light emanating from said lamp.
Claim 5
Dependent Claim
13 words
The method recited in claim 2 wherein said environment comprises an inert gas.
Claim 6
Dependent Claim
16 words
The method of claim 2 wherein said environment is a vacuum of less than 1.0 torr.
Claim 7
Dependent Claim
31 words
The method recited in claim 1 wherein said polymer is disposed in an environment which is free of oxidizing species while it is exposed to said broad area continuous ultraviolet radiation.
Claim 8
Dependent Claim
25 words
The method recited in claim 1 wherein: at least 10% of the light energy emitted by said lamp has a wavelength shorter than 200 nanometers.
Claim 9
Dependent Claim
15 words
The method recited in claim 2 wherein said lamp emits a spectrum of ultraviolet light.
Claim 10
Independent Claim
81 words
A method of etching, by photodecomposition, an organic polymer selected from the group consisting of polyimides, polycarbonates and polyetherimides, comprising: providing a broad area source of continuous ultraviolet light, and ultraviolet light including wavelengths shorter than 200 nanometers; disposing at least the portion of said polymer to be etched in an environment which is free of molecular oxygen and ozone; and exposing the portion of said polymer to be etched to the broad area continuous ultraviolet light emanating from said source.
Claim 11
Independent Claim
81 words
A method of etching, by photodecomposition, an organic polymer selected from the group consisting of polyimides, polycarbonates and polyetherimides, comprising: providing a broad area source of continuous ultraviolet light, and ultraviolet light including wavelengths shorter than 200 nanometers; disposing at least the portion of said polymer to be etched in an environment which is free of molecular oxygen and ozone; and exposing the portion of said polymer to be etched to the broad area continuous ultraviolet light emanating from said source.
Claim 12
Dependent Claim
27 words
The method recited in claim 1 wherein the step of exposing the portion of said polymer to be etched is performed for a controlled period of time.
Claim 13
Dependent Claim
17 words
A body of polyimide resin having a surface thereof etched by the method recited in claim 1.
Claim 14
Dependent Claim
17 words
A body of polycarbonate resin having a surface thereof etched by the method recited in claim 1.
Claim 15
Dependent Claim
17 words
A body of polyetherimide resin having a surface thereof etched by the method recited in claim 1.
Claim 16
Dependent Claim
46 words
Etching apparatus for photoetching a sample comprising: means for supporting said sample; a high-current-density mercury lamp disposed to illuminate said sample with ultraviolet light; and control means for operating said lamp at a current density in excess of 1.0 amp/cm 2 of lamp internal cross-sectional area.
Claim 17
Dependent Claim
46 words
Etching apparatus for photoetching a sample comprising: means for supporting said sample; a high-current-density mercury lamp disposed to illuminate said sample with ultraviolet light; and control means for operating said lamp at a current density in excess of 1.0 amp/cm 2 of lamp internal cross-sectional area.
Claim 18
Dependent Claim
21 words
The etching apparatus recited in claim 13 further comprising a housing enclosing said means for supporting said sample and said lamp.
Claim 19
Dependent Claim
20 words
The etching apparatus recited in claim 13 wherein said housing includes means for maintaining a predetermined atmosphere within the housing.
Claim 20
Dependent Claim
36 words
The etching apparatus recited in claim 15 wherein said means for controlling the atmosphere includes: an input port; and an output port; said housing being substantially airtight in use except for said input and output ports.
Claim 21
Dependent Claim
34 words
The etching apparatus recited in claim 16 wherein: said ports are configured to facilitate gas flow; and said housing includes means separate from said ports for introduction and removal of samples to be etched.
Claim 22
Dependent Claim
24 words
The etching apparatus recited in claim 16 wherein said input and output ports are configured to facilitate transport therethrough of samples to be etched.
Claim 23
Dependent Claim
30 words
The etching apparatus recited in claim 18 wherein said input and output ports include means for preventing ambient gases external to said enclosure from entering said enclosure through said ports.
Claim 24
Dependent Claim
23 words
The etching apparatus recited in claim 13 further comprising a reflector for concentrating said ultraviolet light emitted by said lamp on said sample.
Claim 25
Dependent Claim
15 words
The etching apparatus recited in claim 21 comprising: a plurality of said high-current-density mercury lamps.
Claim 26
Dependent Claim
30 words
The etching apparatus recited in claim 21 further comprising: a reflector system positioned and configured for causing said lamps to provide a substantially uniform illumination over a sample exposure zone.
Claim 27
Dependent Claim
16 words
The method of claim 8 wherein said environment is a vacuum of less than 1.0 torr.
Claim 28
Dependent Claim
13 words
The method recited in claim 8 wherein said environment comprises an inert gas.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 1992-08-14 | 1993-02-13 | 1993-08-15 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1996-08-14 | 1997-02-13 | 1997-08-15 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2000-08-14 | 2001-02-13 | 2001-08-15 | $7700.00 | Window Closed / Lapsed |