Electron beam direct drawing device

Claim 2

An electron beam direct drawing device for drawing a predetermined pattern directly on a printed circuit board having a photoresist thereon by exposing it by electron beam scan according to a drawing pattern information obtained by a computer aided printed circuit board pattern design, comprising means for dividing said drawing pattern information over a whole area of printed circuit board into a plurality of fields each capable of being scanned by electron beam and for re-editing drawing patterns of the respective fields, means for storing the divided and then re-edited drawing pattern information, mean for generating a first control signal for reading out the stored drawing pattern information sequentially and performing a main deflection of electron beam by means of a main deflector and means for generating a second control signal including a plurality of gain amplifiers for deriving, from the stored drawing pattern information, information assigning an orientation of a pattern to be drawn and a scan width of a sub-deflection and for performing a predetermined sub-deflection scanning by means of a sub-deflector, whereby the drawing of said predetermined pattern on said printed circuit board is performed by scanning the latter with the electron beam under the control of a combination of said main deflection and said sub-deflection.

Claim 3

An electron beam direct drawing device for drawing a predetermined pattern directly on a printed circuit board having a photoresist thereon by exposing it by electron beam scan according to a drawing pattern information obtained by a computer aided printed circuit board pattern design, comprising means for storing a drawing pattern information corresponding to a field capable of being scanned by a main deflector, means for generating a first control signal for reading out the stored drawing pattern information sequentially and supplying said first control signal to said main deflector to perform a main deflection of electron beam, means for producing a plurality of signals having rectangular waveforms and having different frequencies which enables electron beam deflection scanning of said printed circuit board under control of a combination of said main deflection and said sub-deflection to make a pattern drawing of a predetermined line width possible and determines a scan speed of said main deflection, means responsive to a digital value instructing a sub-deflection scan width to select one of said rectangular signals and means for producing a main deflection scanning data in synchronism with the selected rectangular signal, whereby said main deflection scan speed is varied according to a pattern width to be drawn.

Claim 4

An electron beam direct drawing device for drawing a predetermined pattern directly on a printed circuit board having a photoresist thereon by exposing it by electron beam scan according to a drawing pattern information obtained by a computer aided printed circuit board pattern design, comprising means for storing a drawing pattern information corresponding to a field capable of being scanned by a main deflector, means for generating a first control signal for reading out the stored drawing pattern information sequentially and supplying said first control signal to said main deflector to perform a main deflection of electron beam, means for producing a plurality of signals having rectangular waveforms and having different frequencies which enables electron beam deflection scanning of said printed circuit board under control of a combination of said main deflection and said sub-deflection to make a pattern drawing of a predetermined line width possible and determines a scan speed of said main deflection, means responsive to a digital value instructing a sub-deflection scan width to select one of said rectangular signals and means for producing a main deflection scanning data in synchronism with the selected rectangular signal, whereby said main deflection scan speed is varied according to a pattern width to be drawn.

Claim 5

The electron beam direct drawing device as claimed in claim 2, wherein said digital value assigning said sub-deflection scan width is readout from said memory means for storing said drawing pattern information in real time in synchronism with one of said rectangular signal having a predetermined frequency.

Claim 6

An electron beam direct drawing device for drawing a predetermined pattern directly on a printed circuit board having a photoresist thereon by exposing it by electron beam scan according to a drawing pattern information obtained by a computer aided printed circuit board pattern design, comprising means for dividing said drawing pattern information over a whole area of printed circuit board into a plurality of fields each capable of being scanned by electron beam and for re-editing drawing patterns of the respective fields, means for storing the divided and then re-edited drawing pattern information, means for generating a first control signal for reading out the stored drawing pattern information sequentially and performing a main deflection of electron beam by means of a main deflector and means for generating a second control signal for deriving, from the stored drawing pattern information, information assigning an orientation of a pattern to be drawn and a scan width of a sub-deflection and for performing a predetermined sub-deflection scanning by means of a sub-deflector, whereby the drawing of said predetermined pattern on said printed circuit board is performed by scanning the latter with the electron beam under the control of a combination of said main deflection and said sub-deflection; wherein said means for generating said second control signal includes a plurality of gain amplifiers each determining a different sub-scan width and selects one of said gain amplifiers according to digital information of an orientation of a pattern to be drawn and a sub-deflection gain assignment among others stored in said storing means to produce said second control signal in real time.

Claim 7

An electron beam direct drawing device for drawing a predetermined pattern directly on a printed circuit board having a photoresist thereon by exposing it by electron beam scan according to a drawing pattern information obtained by a computer aided printed circuit board pattern design, comprising means for dividing said drawing pattern information over a whole area of printed circuit board into a plurality of fields each capable of being scanned by electron beam and for re-editing drawing patterns of the respective fields, means for storing the divided and then re-edited drawing pattern information, means for generating a first control signal for reading out the stored drawing pattern information sequentially and performing a main deflection of electron beam by means of a main deflector and means for generating a second control signal for deriving, from the stored drawing pattern information, information assigning an orientation of a pattern to be drawn and a scan width of a sub-deflection and for performing a predetermined sub-deflection scanning by means of a sub-deflector, whereby the drawing of said predetermined pattern on said printed circuit board is performed by scanning the latter with the electron beam under the control of a combination of said main deflection and said sub-deflection; wherein said means for generating said second control signal includes a plurality of gain amplifiers each determining a different sub-scan width and selects one of said gain amplifiers according to digital information of an orientation of a pattern to be drawn and a sub-deflection gain assignment among others stored in said storing means to produce said second control signal in real time.