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US4882238A Expired / Lapsed US ⏱️ 0.0 years remaining

Die for use in forming lens

Assignee: Sumitomo Electric Industries Ltd
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Filing: 1988-10-03
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Granted: 1989-11-21
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Expires: 2008-10-03
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Abstract

Abstract The present invention relates to a die for use in forming optical lenses made of glass or synthetic resin used in OA instruments, VTR, cameras and the like. In order to lengthen the useful life of the die by suppressing the oxidation or deterioration of the die surface due to temperature and atmosphere and reaction of materials of which lenses are made, when lenses are formed, the die is coated with a single-layer or multi-layer thin film of Si3N4 or SiC or compounds thereof, which are superior in wear and corrosion resistance at high temperatures, by the vapor coating method.

Inventors

  • 👤 Takashi Yoshioka
  • 👤 Akira Doi

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-01 14:21
CPC Classifications
B; B29; B29D; B29D11/00; B29D11/00009; B29D11/0048; B29D11/00548; B29C; B29C33/00; B29C33/56; C; C03; C03B; C03B11/00; C03B11/06; C03B11/08; C03B11/084; C03B11/086; C23; C23C; C23C16/00; C23C16/22; C23C16/30; C23C16/32; C23C16/325; C23C16/34; C23C16/345; C03B2215/00; C03B2215/02; C03B2215/08; C03B2215/10; C03B2215/12; C03B2215/14; C03B2215/22; C03B2215/30; C03B2215/34

Claims Analysis

Total Claims: 2
Claim 1
Independent Claim 69 words
A die having superior wear and corrosion resistance, a surface roughness R max of 1000 Å or less, and which is a structure for forming optical lenses, wherein said die is coated at a temperature of 800° C. or lower with a single or multi-layer amorphous film of silicon nitride, silicon carbide or a combination thereof, having a thickness of 5 μm or less, by a plasma-CVD coating method.
Claim 2
Dependent Claim 69 words
A die having superior wear and corrosion resistance, a surface roughness R max of 1000 Å or less, and which is a structure for forming optical lenses, wherein said die is coated at a temperature of 800° C. or lower with a single or multi-layer amorphous film of silicon nitride, silicon carbide or a combination thereof, having a thickness of 5 μm or less, by a plasma-CVD coating method.

References Cited (Backward Citations)

US4585704A Cited
US4474849A Cited
US4594294A Cited
US4522844A Cited
US4608326A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1992-11-20 1993-05-22 1993-11-21 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1996-11-20 1997-05-22 1997-11-21 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2000-11-20 2001-05-22 2001-11-21 $7700.00 Window Closed / Lapsed

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