Alignment signal detecting device

Claim 2

A detecting apparatus for detecting an alignment mark formed on an original and an alignment mark formed on a member disposed at a position optically conjugate with the original with respect to a wavelength of light for exposing the member to a pattern of the original through a projection lens, said apparatus comprising: scanning means for scanning the alignment marks of the original and the member with a light beam having a wavelength which is different from that of the exposing light, wherein the alignment mark of the member is scanned by the light beam after the light beam has passed through the projection lens; detecting means for receiving light from the original and the member and for detecting the alignment marks of the original and the members; and shifting means for shifting an imaging position of the light beam scanning the original and the member in a direction of an optical axis of the projection lens so that the light beam is imaged on the original when the alignment mark of the original is to be detected, and so that the beam is imaged on the member when the alignment mark of the member is to be detected.

Claim 3

An apparatus according to claim 1, wherein said shifting means is also operable for acting on the light beam to selectively focus the beam on the original and on the member during one scan by said scanning means.

Claim 4

An apparatus according to claim 1, wherein said detecting means includes a filter for directing only scattered light scattered by the original and scattered light scattered by the member to a photodetector to convert the scattered light to respective electric signals.

Claim 5

An apparatus according to claim 3, wherein said photodetector includes a first light receiving element for receiving the light scattered by the original and a second light receiving element for receiving the light scattered by the member.

Claim 6

An apparatus according to claim 1, wherein said scanning means includes a deflector for receiving and deflecting the light from a light source for providing the light beam, said shifting means being disposed between the light source and the deflector.

Claim 7

A detecting apparatus for detecting an alignment mark formed on a mask and an alignment mark formed on a wafer disposed at a position optically conjugate with the mask with respect to a wavelength of light for exposing the wafer to a pattern of the mask, through a projection lens, said apparatus comprising: scanning means for scanning the alignment marks of the mask and the wafer with a light beam having a second wavelength which is different from that of the exposing light, wherein the alignment mark of the wafer is scanned by the light beam after the light beam has passed through the projection lens; a light source for providing the light beam having the second wavelength; shifting means, disposed between said light source and said scanning means, for shifting an imaging position of the light beam scanning the mask and the wafer in a direction of an optical axis of the projection lens; control means for controlling said shifting means, said shifting means being operable in a first state to image the light beam on the mask so that it is out of focus on the wafer when the alignment mark of the mask is to be detected, and a second state to image the light beam on the wafer so that it is out of focus on the mask when the alignment mark of the water is to be detected; and detecting means for receiving light from the mask in the first state and light from the wafer in the second state, to detect the alignment marks of the mask and the wafer.

Claim 8

A detecting apparatus for detecting an alignment mark formed on a mask and an alignment mark formed on a wafer disposed at a position optically conjugate with the mask with respect to a wavelength of light for exposing the wafer to a pattern of the mask, through a projection lens, said apparatus comprising: scanning means for scanning the alignment marks of the mask and the wafer with a light beam having a second wavelength which is different from that of the exposing light, wherein the alignment mark of the wafer is scanned by the light beam after the light beam has passed through the projection lens; a light source for providing the light beam having the second wavelength; shifting means, disposed between said light source and said scanning means, for shifting an imaging position of the light beam scanning the mask and the wafer in a direction of an optical axis of the projection lens; control means for controlling said shifting means, said shifting means being operable in a first state to image the light beam on the mask so that it is out of focus on the wafer when the alignment mark of the mask is to be detected, and a second state to image the light beam on the wafer so that it is out of focus on the mask when the alignment mark of the water is to be detected; and detecting means for receiving light from the mask in the first state and light from the wafer in the second state, to detect the alignment marks of the mask and the wafer.

Claim 9

An apparatus according to claim 6 wherein said detecting means includes filter means for directing only light scattered by said mask and wafer to a photoconductor to convert the light received thereby to electric signals.