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US4980268A
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Negative photoresists of the polyimide type containing 1,2-disulfones
Assignee: Novartis Corp
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Filing: 1989-03-09
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Granted: 1990-12-25
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Expires: 2009-03-09
Abstract
Abstract The invention relates to negative photoresists of the polyimide type essentially containing, in an organic solvent, in each case at least (a) one polyamide-acid or polyamide-acid derivative prepolymer which can be converted into a highly heat-resistant polyimide polymer, (b) a photoinitiator, and, if appropriate, further customary additives which contain, as the photoinitiator, a compound of the formula I R.sup.1 --SO.sub.2 --SO.sub.2 --R.sup.2 I in which R 1 and R 2 are as defined.
Inventors
- 👤 Ekkehard Bartmann
- 👤 Rudolf Klug
- 👤 Reinhard Schulz
- 👤 Hartmut Hartner
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 21:25
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/027; G03F7/028; G03F7/031; Y; Y10; Y10S; Y10S430/00; Y10S430/1053; Y10S430/1055; Y10S430/114; Y10S430/122; Y10S430/128
Claims Analysis
Total Claims: 4
Claim 1
Independent Claim
117 words
A negative photoresist of the polyimide type consisting essentially of, in an organic solvent, at least (a) one prepolymer of a polyamide-acid or polyamide-acid derivative which can be converted into a highly heat-resistant polyimide polymer, (b) a photoinitiator corresponding to the formula R.sup.1 --SO.sub.2 --SO.sub.2 --R.sup.2 (I) in which R 1 and R 2 can be identical or different and are alkyl, cycloalkyl, aryl, aralkyl or heteroaryl having up to 12 C atoms and being unsubstituted or monosubstituted or polysubstituted by halogen, cyano, nitro, alkyl, alkoxy, alkylthio, monoalkylamino, bisalkylamino, alkanoyl, acyloxy, acylamido, alkoxycarbonyl, alkylaminocarbonyl, alkylsulfoxy, alkylsulfonyl, aryloxy, arylthio, arylsulfoxy or arylsulfonyl each of which has up to 6 C atoms; said photoresist containing no photopolymerizable unsaturated components.
Claim 2
Dependent Claim
117 words
A negative photoresist of the polyimide type consisting essentially of, in an organic solvent, at least (a) one prepolymer of a polyamide-acid or polyamide-acid derivative which can be converted into a highly heat-resistant polyimide polymer, (b) a photoinitiator corresponding to the formula R.sup.1 --SO.sub.2 --SO.sub.2 --R.sup.2 (I) in which R 1 and R 2 can be identical or different and are alkyl, cycloalkyl, aryl, aralkyl or heteroaryl having up to 12 C atoms and being unsubstituted or monosubstituted or polysubstituted by halogen, cyano, nitro, alkyl, alkoxy, alkylthio, monoalkylamino, bisalkylamino, alkanoyl, acyloxy, acylamido, alkoxycarbonyl, alkylaminocarbonyl, alkylsulfoxy, alkylsulfonyl, aryloxy, arylthio, arylsulfoxy or arylsulfonyl each of which has up to 6 C atoms; said photoresist containing no photopolymerizable unsaturated components.
Claim 3
Dependent Claim
21 words
A negative photoresist according to claim 1 which contains 0.1 to 20% by weight, of a compound of the formula I.
Claim 4
Dependent Claim
18 words
The negative photoresist of claim 2 which contains 1-10%, by weight, of a compound of the formula I.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1993-12-24 | 1994-06-25 | 1994-12-25 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1997-12-24 | 1998-06-25 | 1998-12-25 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2001-12-24 | 2002-06-25 | 2002-12-25 | $7700.00 | Window Closed / Lapsed |