Resist material with carbazole diazonium salt acid generator and process for use

Claim 1

A material comprising: a polymer chosen from the group consisting of compositions having a polymer backbone and pendant acid labile groups bound directly or indirectly to said backbone, said pendant groups represented by the formula: ##STR5## wherein n=0-4 R 1 is hydrogen or a C 1 -C 6 alkyl; R 2 is a C 1 -C 6 alkyl; and R 3 and R 4 independently are hydrogen or C 1 -C 6 alkyl where the definition of C 1 -D 6 alkyl includes the joining of R 1 and R 2 or R 1 and either R 3 or R 4 , or R 2 and either R 3 or R 4 to form a 5-, 6- or 7-membered ring; and material that forms an acid upon irradiation comprising carbazole diazonium salts of the structures: ##STR6## wherein: Y is PF 6 - , AsF 6 - , SbF 6 - , FeCl 4 - , SnCl 6 -2 , SbCl 6 - , BF 4 - or BiCl 5 -2 ; and R is selected from the group consisting of C x H 2x+1 where x is 1-16, benzyl, phenyl, substituted benzyl, substituted phenyl and cycloalkyl, provided, however, where N 2 Y is in the "1" position as in the second structure, R is not phenyl or substituted phenyl.