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US5028979A Expired / Lapsed US ⏱️ 0.0 years remaining

Table cloth matrix of EPROM memory cells with buried junctions, individually accessible by a traditional decoder

Assignee: STMicroelectronics SRL
•
Filing: 1990-03-05
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Granted: 1991-07-02
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Expires: 2010-03-05
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Abstract

Abstract The table cloth matrix comprises a semiconductor substrate, wherein there are contained in deep layers, under strips of field oxide, source lines and drain lines parallel to one another, areas of floating gate connecting said source lines and drain lines and control gate lines, parallel to one another and perpendicular to said source lines and drain lines, in a condition superimposed over said floating gate areas. Each source line is alternated with two drain lines separated by an insulation zone, so that each drain line is associated with a single row of matrix cells.

Inventors

  • 👤 Stefano Mazzali

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-28 11:55
CPC Classifications
G; G11; G11C; G11C16/00; G11C16/02; G11C16/04; G11C16/0408; G11C16/0416; H; H10; H10B; H10B69/00; H10D; H10D30/00; H10D30/60; H10D30/68; H10D30/681; H10D30/684; H10D30/685

Claims Analysis

Total Claims: 3
Claim 1
Independent Claim 118 words
A matrix of EPROM memory cells, comprising a semiconductor substrate, a plurality of first and second parallel strips of field oxide formed on the substrate, parallel source lines arranged in buried layers of the substrate under said first strips of field oxide, pairs of parallel drain lines arranged in buried layers of the substrate under each of said second strips of field oxide, floating gases interposed between said source lines and said drain lines and provided with lateral extensions superimposed over lateral portions of said first and second strips of field oxide, and control gate lines parallel to one another and perpendicular to said source and drain lines and superimposed on and aligned with said floating gate areas.
Claim 2
Dependent Claim 118 words
A matrix of EPROM memory cells, comprising a semiconductor substrate, a plurality of first and second parallel strips of field oxide formed on the substrate, parallel source lines arranged in buried layers of the substrate under said first strips of field oxide, pairs of parallel drain lines arranged in buried layers of the substrate under each of said second strips of field oxide, floating gases interposed between said source lines and said drain lines and provided with lateral extensions superimposed over lateral portions of said first and second strips of field oxide, and control gate lines parallel to one another and perpendicular to said source and drain lines and superimposed on and aligned with said floating gate areas.
Claim 3
Dependent Claim 22 words
A matrix according to claim 1, wherein said first strips of field oxide are narrower than said second strips of field oxide.

References Cited (Backward Citations)

US4342099A Cited
US4376947A Cited
US4451904A Cited
JPS5728364A Cited
US4868629A Cited
US4750024A Cited
US4892840A Cited
JPS63281469A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1994-07-01 1994-12-31 1995-07-02 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1998-07-01 1998-12-31 1999-07-02 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2002-07-01 2002-12-31 2003-07-02 $7700.00 Window Closed / Lapsed

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