Method of fabricating semiconductor device

Claim 1

A method of fabricating a semiconductor device comprising: a step of forming a trench in a semiconductor substrate having a principal surface, said trench having four side-walls which extend into said substrate in a direction substantially perpendicular to said principal surface of said semiconductor substrate and which are perpendicular to each other, and said trench having a bottom substantially parallel to said principal surface; a step of positioning said semiconductor substrate in a first position; a step of implanting ions into a first side-wall of said side-walls of said trench from a direction inclined to a normal to a plane containing said principal surface of said semiconductor substrate; a step of positioning said semiconductor substrate in a second position which is different from said first position by rotating said semiconductor substrate by 90° about an axis of rotation which is perpendicular to said principal surface of said semiconductor substrate; a step of implanting ions of the same type and to the same extent as implanted in the first side-wall into a second side-wall of said side-walls of said trench from said direction inclined to the normal to the plane containing said principal surface of said semiconductor substrate; a step of positioning said semiconductor substrate in a third position which is different from said first and second positions by rotating said semiconductor substrate by 90° about said rotation axis; a step of implanting ions of the same type and to the same extent as implanted in said first and second side-walls into a third side-wall of said side-walls of said trench from said direction inclined to the normal to the plane containing said principal surface of said semiconductor substrate; a step of positioning said semiconductor substrate in a fourth position which is different from said first, second and third positions by rotating said semiconductor substrate by 90° about said rotation axis; a step of implanting ions of the same type and to the same extent implanted in said first, second and third side-walls into a fourth side-wall of said side-walls of said trench from said direction inclined to the normal to the plane containing said principal surface of said semiconductor substrate; and a step of implanting ions into the bottom of the trench by emitting ion beams of the same type as implanted in the side-walls in a direction perpendicular to said principal surface of said semiconductor device.

Claim 2

A method of fabricating a semiconductor device comprising: a step of forming a trench in a semiconductor substrate having a principal surface, said trench having four side-walls which extend into said substrate in a direction substantially perpendicular to said principal surface of said semiconductor substrate and which are perpendicular to each other, and said trench having a bottom substantially parallel to said principal surface; a step of positioning said semiconductor substrate in a first position; a step of implanting ions into a first side-wall of said side-walls of said trench from a direction inclined to a normal to a plane containing said principal surface of said semiconductor substrate; a step of positioning said semiconductor substrate in a second position which is different from said first position by rotating said semiconductor substrate by 90° about an axis of rotation which is perpendicular to said principal surface of said semiconductor substrate; a step of implanting ions of the same type and to the same extent as implanted in the first side-wall into a second side-wall of said side-walls of said trench from said direction inclined to the normal to the plane containing said principal surface of said semiconductor substrate; a step of positioning said semiconductor substrate in a third position which is different from said first and second positions by rotating said semiconductor substrate by 90° about said rotation axis; a step of implanting ions of the same type and to the same extent as implanted in said first and second side-walls into a third side-wall of said side-walls of said trench from said direction inclined to the normal to the plane containing said principal surface of said semiconductor substrate; a step of positioning said semiconductor substrate in a fourth position which is different from said first, second and third positions by rotating said semiconductor substrate by 90° about said rotation axis; a step of implanting ions of the same type and to the same extent implanted in said first, second and third side-walls into a fourth side-wall of said side-walls of said trench from said direction inclined to the normal to the plane containing said principal surface of said semiconductor substrate; and a step of implanting ions into the bottom of the trench by emitting ion beams of the same type as implanted in the side-walls in a direction perpendicular to said principal surface of said semiconductor device.

Claim 3

A method of fabricating a semiconductor device comprising: a step of forming a trench in a semiconductor substrate having a principal surface, said trench having four side-walls which extend into said substrate in a direction substantially perpendicular to said principal surface of said semiconductor substrate and which are perpendicular to each other, and said trench having a bottom substantially parallel to said principal surface; a step of positioning said semiconductor substrate in a first position; a step of implanting ions into a first side-wall of said side-walls of said trench from a direction inclined to a normal to a plane containing said principal surface of said semiconductor substrate; a step of positioning said semiconductor substrate in a second position which is different from said first position by rotating said semiconductor substrate by 90° about an axis of rotation which is perpendicular to said principal surface of said semiconductor substrate; a step of implanting ions of the same type and to the same extent as implanted in the first side-wall into a second side-wall of said side-walls of said trench from said direction inclined to the normal to the plane containing said principal surface of said semiconductor substrate; a step of positioning said semiconductor substrate in a third position which is different from said first and second positions by rotating said semiconductor substrate by 90° about said rotation axis; a step of implanting ions of the same type and to the same extent as implanted in said first and second side-walls into a third side-wall of said side-walls of said trench from said direction inclined to the normal to the plane containing said principal surface of said semiconductor substrate; a step of positioning said semiconductor substrate in a fourth position which is different from said first, second and third positions by rotating said semiconductor substrate by 90° about said rotation axis; a step of implanting ions of the same type and to the same extent implanted in said first, second and third side-walls into a fourth side-wall of said side-walls of said trench from said direction inclined to the normal to the plane containing said principal surface of said semiconductor substrate; a step of implanting ions into the bottom of the trench by emitting ion beams of the same type as implanted in the side-walls in a direction perpendicular to said principal surface is said semiconductor device; and all of the steps of implanting being carried out such that the extent of implantation and type of ion of such that a trench capacitor is thereby formed.

Claim 4

A method of fabricating a semiconductor device comprising: a step of forming a trench in a semiconductor substrate having a principal surface, said trench having four side-walls which extend into said substrate in a direction substantially perpendicular to said principal surface of said semiconductor substrate and which are perpendicular to each other, and said trench having a bottom substantially parallel to said principal surface; a step of positioning said semiconductor substrate in a first position; a step of implanting ions into a first side-wall of said side-walls of said trench from a direction inclined to a normal to a plane containing said principal surface of said semiconductor substrate; a step of positioning said semiconductor substrate in a second position which is different from said first position by rotating said semiconductor substrate by 90° about an axis of rotation which is perpendicular to said principal surface of said semiconductor substrate; a step of implanting ions of the same type and to the same extent as implanted in the first side-wall into a second side-wall of said side-walls of said trench from said direction inclined to the normal to the plane containing said principal surface of said semiconductor substrate; a step of positioning said semiconductor substrate in a third position which is different from said first and second positions by rotating said semiconductor substrate by 90° about said rotation axis; a step of implanting ions of the same type and to the same extent as implanted in said first and second side-walls into a third side-wall of said side-walls of said trench from said direction inclined to the normal to the plane containing said principal surface of said semiconductor substrate; a step of positioning said semiconductor substrate in a fourth position which is different from said first, second and third positions by rotating said semiconductor substrate by 90° about said rotation axis; a step of implanting ions of the same type and to the same extent implanted in said first, second and third side-walls into a fourth side-wall of said side-walls of said trench from said direction inclined to the normal to the plane containing said principal surface of said semiconductor substrate; a step of implanting ions into the bottom of the trench by emitting ion beams of the same type as implanted in the side-walls in a direction perpendicular to said principal surface is said semiconductor device; and all of the steps of implanting being carried out such that the extent of implantation and type of ion of such that a trench capacitor is thereby formed.

Claim 5

A method of fabricating a semiconductor device comprising: a step of forming a trench in a semiconductor substrate having a principal surface, said trench having four side-walls which extend into said substrate in a direction substantially perpendicular to said principal surface of said semiconductor substrate and which are perpendicular to each other, and said trench having a bottom substantially parallel to said principal surface; a step of positioning said semiconductor substrate in a first position; a step of implanting ions into a first side-wall of said side-walls of said trench from a direction inclined to a normal to a plane containing said principal surface of said semiconductor substrate; a step of positioning said semiconductor substrate in a second position which is different from said first position by moving said semiconductor substrate; a step of implanting ions of the same type and to the same extent as implanted in the first side-wall into a second side-wall of said side-walls of said trench from said direction inclined to the normal to the plane containing said principal surface of said semiconductor substrate; a step of positioning said semiconductor substrate in a third position which is different from said first and second positions by moving said semiconductor substrate; a step of implanting ions of the same type and to the same extent as implanted in said first and second side-walls into a third side-wall of said side-walls of said trench from said direction inclined to the normal to the plane containing said principal surface of said semiconductor substrate; a step of positioning said semiconductor substrate in a fourth position which is different from said first, second and third positions by moving said semiconductor substrate; a step of implanting ions of the same type and to the same extent implanted in said first, second and third side-walls into a fourth side-wall of said side-walls of said trench from said direction inclined to the normal to the plane containing said principal surface of said semiconductor substrate; and a step of implanting ions into the bottom of the trench by emitting ion beams of the same type as implanted in the side-walls in a direction perpendicular to said principal surface of said semiconductor device; wherein in said second position said side-walls of said trench are oriented at right angles to the positions of said side-walls in the first position, in said third position said side-walls of said trench are oriented parallel to the positions of said side-walls in the first position, and in said fourth position said side-walls are oriented parallel to said side-walls in the second position.

Claim 6

A method of fabricating a semiconductor device comprising: a step of forming a trench in a semiconductor substrate having a principal surface, said trench having four side-walls which extend into said substrate in a direction substantially perpendicular to said principal surface of said semiconductor substrate and which are perpendicular to each other, and said trench having a bottom substantially parallel to said principal surface; a step of positioning said semiconductor substrate in a first position; a step of implanting ions into a first side-wall of said side-walls of said trench from a direction inclined to a normal to a plane containing said principal surface of said semiconductor substrate; a step of positioning said semiconductor substrate in a second position which is different from said first position by moving said semiconductor substrate; a step of implanting ions of the same type and to the same extent as implanted in the first side-wall into a second side-wall of said side-walls of said trench from said direction inclined to the normal to the plane containing said principal surface of said semiconductor substrate; a step of positioning said semiconductor substrate in a third position which is different from said first and second positions by moving said semiconductor substrate; a step of implanting ions of the same type and to the same extent as implanted in said first and second side-walls into a third side-wall of said side-walls of said trench from said direction inclined to the normal to the plane containing said principal surface of said semiconductor substrate; a step of positioning said semiconductor substrate in a fourth position which is different from said first, second and third positions by moving said semiconductor substrate; a step of implanting ions of the same type and to the same extent implanted in said first, second and third side-walls into a fourth side-wall of said side-walls of said trench from said direction inclined to the normal to the plane containing said principal surface of said semiconductor substrate; and a step of implanting ions into the bottom of the trench by emitting ion beams of the same type as implanted in the side-walls in a direction perpendicular to said principal surface of said semiconductor device; wherein in said second position said side-walls of said trench are oriented at right angles to the positions of said side-walls in the first position, in said third position said side-walls of said trench are oriented parallel to the positions of said side-walls in the first position, and in said fourth position said side-walls are oriented parallel to said side-walls in the second position.