US5120629A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Positive-working photosensitive electrostatic master
Assignee: EIDP Inc
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Filing: 1990-04-10
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Granted: 1992-06-09
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Expires: 2010-04-10
Abstract
Abstract High resolution photosensitive electrostatic master which forms conductive exposed image areas upon imagewise exposure comprising an electrically conductive substrate bearing a photosensitive layer consisting essentially of at least one acid labile compound which decomposes to form acid, and a photoinitiator or photoinitiating system which upon exposure generates a catalytic amount of a strong acid. A xeroprinting process from producing positive images in said photosensitive layer of the master is also disclosed. The master is useful in the graphic arts field. e.g., making color proofs, preparation of printing circuit boards, resists, solder masks, etc.
Inventors
- 👤 Richard D. Bauer
- 👤 Catherine T. Chang
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 01:27
CPC Classifications
G; G03; G03G; G03G5/00; G03G5/02; G03F; G03F7/00; G03F7/004; G03F7/0045; G03F7/039; G03G5/026; H; H05; H05K; H05K3/00; H05K3/02; H05K3/06; H05K3/061; H05K3/065; H05K3/30; H05K3/32; H05K3/34; H05K3/3452
Claims Analysis
Total Claims: 23
Claim 1
Independent Claim
98 words
A high resolution, photosensitive electrostatic master which upon imagewise exposure to actinic radiation forms conductive exposed image areas, the photosensitive electrostatic master comprising an electrically conductive substrate bearing a layer of a photosensitive composition consisting essentially of at least one acid labile ester compound which decomposes to form acid having a pKa of about 5 or less, and a photoinitiator or photoinitiating system which upon exposure generates a strong acid to catalyze the decomposition of the at least one acid labile ester compound, wherein the electrical conductivity of the photosensitive composition in the exposed image areas is increased.
Claim 2
Dependent Claim
98 words
A high resolution, photosensitive electrostatic master which upon imagewise exposure to actinic radiation forms conductive exposed image areas, the photosensitive electrostatic master comprising an electrically conductive substrate bearing a layer of a photosensitive composition consisting essentially of at least one acid labile ester compound which decomposes to form acid having a pKa of about 5 or less, and a photoinitiator or photoinitiating system which upon exposure generates a strong acid to catalyze the decomposition of the at least one acid labile ester compound, wherein the electrical conductivity of the photosensitive composition in the exposed image areas is increased.
Claim 3
Dependent Claim
32 words
A photosensitive electrostatic master according to claim 1 wherein the photosensitive composition also contains either a polymeric binder, a compatible plasticizer, or a combination of the polymeric binder and compatible plasticizer thereof.
Claim 4
Dependent Claim
15 words
A photosensitive electrostatic master according to claim 2 wherein the photosensitive composition contains a colorant.
Claim 5
Dependent Claim
94 words
A photosensitive electrostatic master according to claim 1 wherein the polymer contains an acid labile ester selected from the group consisting of alpha-alkoxy alkyl esters, represented by the formula: --CO.sub.2 --C (R.sup.1) (OR.sup.2)--CH(R.sup.3) (R.sup.4) where: R 1 is hydrogen or alkyl; R 2 is alkyl; and R 3 and R 4 are each independently hydrogen or alkyl and R 1 and R 2 , R 1 and either R 3 or R 4 , or R 2 and either R 3 or R 4 when taken together form a 5-, 6-, or 7-membered ring.
Claim 6
Dependent Claim
21 words
A photosensitive electrostatic master according to claim 4 wherein the acid labile polymer contains tetrahydropyranyl acrylate or tetrahydropyranyl methacrylate ester groups.
Claim 7
Dependent Claim
22 words
A photosensitive electrostatic master according to claim 4 wherein the acid labile polymer is a copolymer of benzyl methacrylate and tetrahydropyranyl methacrylate.
Claim 8
Dependent Claim
19 words
A photosensitive electrostatic master according to claim 4 wherein the acid labile polymer is a homopolymer of tetrahydropyranyl methacrylate.
Claim 9
Dependent Claim
86 words
A photosensitive electrostatic master according to claim 5 wherein the acid labile ester is selected from the group of secondary and tertiary alkyl esters, represented by the formula: CO.sub.2 --C(R.sup.5)R.sup.6) (R.sup.7) where R 5 is H, alkyl, alpha-beta unsaturated alkenyl, aryl, substituted aryl, R 6 is H, alkyl, alkenyl, aryl, substituted aryl, R 7 is alkyl, alkenyl, aryl, substituted aryl, R 5 and either R 6 or R 7 , or R 6 with R 7 when taken together form a 5-, 6-, or 7-membered ring.
Claim 10
Dependent Claim
16 words
A photosensitive electrostatic master according to claim 8 wherein the acid labile polymer is poly(tertiary-butyl acrylate).
Claim 11
Dependent Claim
17 words
A photosensitive electrostatic master according to claim 5 wherein the acid labile ester is a silyl ester.
Claim 12
Dependent Claim
22 words
A photosensitive electrostatic master according to claim 5 wherein the polymer has an acid labile polyester backbone which decomposes to form acid.
Claim 13
Dependent Claim
21 words
A photosensitive electrostatic master according to claim 5 wherein the polymer contains acid labile ester crosslinks which decompose to form acid.
Claim 14
Dependent Claim
38 words
A photosensitive electrostatic master according to claim 1 where the acid forming initiator is selected from the group consisting of onium salts, ortho-nitrobenzyl esters of sulfonic acids, alpha-sulfonyloxy ketone, N-hydroxyimide sulfonates, N-hydroxyamide sulfonates, halogenated compounds, and aryl naphthoquinonediazide-4-sulfonates.
Claim 15
Dependent Claim
17 words
A photosensitive electrostatic master according to claim 13 wherein the acid forming initiator is a triarylsulfonium salt.
Claim 16
Dependent Claim
18 words
A photosensitive electrostatic master according to claim 13 wherein the acid forming initiator is 9-anthracenylpropyl diphenyl sulfonium hexafluoroantimonate.
Claim 17
Dependent Claim
15 words
A photosensitive electrostatic master according to claim 13 wherein the acid forming initiator is dibromotetrachloroethane.
Claim 18
Dependent Claim
45 words
A photosensitive electrostatic master according to claim 1 wherein the photosensitive composition contains a plasticizer or additive having at least one acid labile ester group in which the acid portion of the ester is selected from the group consisting of carboxylic, sulfonic, and sulfinic acids.
Claim 19
Dependent Claim
98 words
A photosensitive electrostatic master according to claim 17 wherein the plasticizer or additive contains at least one acid labile ester group selected from the group of alpha-alkoxy alkyl esters, represented by the formula: --CO.sub.2 --C (R.sup.1) (OR.sup.2)--CH(R.sup.3 (R.sup.4) where: R 1 is hydrogen or alkyl; R 2 is alkyl; and R 3 and R 4 are each independently hydrogen or alkyl and R 1 and R 2 , R 1 and either R 3 or R 4 , or R 2 and either R 3 or R 4 when taken together form a 5-, 6-, or 7-membered ring.
Claim 20
Dependent Claim
93 words
A photosensitive electrostatic master according to claim 17 wherein the plasticizer or additive contains at least one acid labile ester group selected from the group of secondary and tertiary alkyl esters, represented by the formula: CO.sub.2 --C(R.sup.5)R.sup.6) (R.sup.7) where R 5 is H, alkyl, alpha-beta unsaturated alkenyl, aryl, substituted aryl, R 6 is H, alkyl, alkenyl, aryl, substituted aryl, R 7 is alkyl, alkenyl, aryl, substituted aryl, R 5 and either R 6 or R 7 , or R 6 with R 7 when taken together form a 5-, 6-, or 7-membered ring.
Claim 21
Dependent Claim
14 words
A photosensitive electrostatic master according to claim 19 wherein the plasticizer is di-tert-butyl malonate.
Claim 22
Dependent Claim
18 words
A photosensitive electrostatic master according to claim 17 wherein the acid labile ester group is a silyl ester.
Claim 23
Dependent Claim
38 words
A photosensitive electrostatic master according to claim 17 where the acid forming initiator is selected from the group consisting of onium salts, ortho-nitrobenzyl esters of sulfonic acids, alpha-sulfonyloxy ketones, N-hydroxyimide sulfonates, N-hydroxyamide sulfonates, halogenated compounds, and aryl naphthoquinonediazide-4-sulfonates.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1995-06-09 | 1995-12-09 | 1996-06-09 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1999-06-09 | 1999-12-09 | 2000-06-09 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2003-06-09 | 2003-12-09 | 2004-06-09 | $7700.00 | Window Closed / Lapsed |