US5126028A — Sputter coating process control method and appara…

Claim 1

Independent Claim 210 words

A method of manufacturing a sputter coated article, comprising the steps of: providing a sputter coating apparatus having a processing chamber in which a sputter coating material is deposited onto a substrate by a sputter coating process performed with the apparatus operated in accordance with a plurality of machine parameters; supporting in the chamber a target of sputter coating material and a substrate holder holding a first substrate with a surface of the substrate facing the target to receive a coating of sputter coating material sputtered from the target; entering, into a processor, process parameters including the desired thickness of a coating to be deposited on the substrate by performance of the process thereon and the desired deposition rate at which the coating is to be deposited on the substrate; calculating, from the entered process parameters, machine parameters for energizing the target to sputter material therefrom to deposit a coating at the desired deposition rate and to the desired thickness onto the substrate; and electrically energizing the target to cause sputtering therefrom in accordance with the calculated machine parameters to perform the sputter coating process on the substrate supported in the processing chamber to deposit coating material on the substrate at the desired deposition rate and to the desired thickness.

Claim 2

Independent Claim 210 words

A method of manufacturing a sputter coated article, comprising the steps of: providing a sputter coating apparatus having a processing chamber in which a sputter coating material is deposited onto a substrate by a sputter coating process performed with the apparatus operated in accordance with a plurality of machine parameters; supporting in the chamber a target of sputter coating material and a substrate holder holding a first substrate with a surface of the substrate facing the target to receive a coating of sputter coating material sputtered from the target; entering, into a processor, process parameters including the desired thickness of a coating to be deposited on the substrate by performance of the process thereon and the desired deposition rate at which the coating is to be deposited on the substrate; calculating, from the entered process parameters, machine parameters for energizing the target to sputter material therefrom to deposit a coating at the desired deposition rate and to the desired thickness onto the substrate; and electrically energizing the target to cause sputtering therefrom in accordance with the calculated machine parameters to perform the sputter coating process on the substrate supported in the processing chamber to deposit coating material on the substrate at the desired deposition rate and to the desired thickness.

Claim 3

Dependent Claim 132 words

The method of claim 1 further comprising the steps of: storing in a memory the calculated machine parameters by which the process was performed on the substrate; measuring the thickness of the coating deposited on the substrate by the performance of the process thereon; further calculating with the processor, in response to the measured coating thickness, the stored machine parameters, and the entered process parameters, new machine parameters in accordance with which the process may be initiated; supporting a second substrate in the chamber; further energizing the target to cause sputtering therefrom in accordance with the calculated new machine parameters to perform the sputter coating process on the second substrate supported in the processing chamber to deposit coating material on the substrate at the desired deposition rate and to the desired thickness.

Claim 4

Dependent Claim 68 words

The method of claim 1 wherein: the target has a plurality of sputtering regions thereon; the calculating step includes the step of separately adjusting machine parameters applicable to different ones of the regions of the target; and initiating the performance of a process on a substrate supported in the processing chamber by energizing the different regions of the target differently in accordance with the separately adjusted machine parameters.

Claim 5

Dependent Claim 33 words

The method of claim 3 wherein: the separately adjusted machine parameters include those affecting the power levels to which the target is to be energized to cause sputtering from the respective regions thereof.

Claim 6

Independent Claim 203 words

A method of manufacturing a sputter coated article, comprising the steps of: providing a sputter coating apparatus having a processing chamber in which a sputter coating material is deposited onto a substrate by a sputter coating process performed with the apparatus operated in accordance with a plurality of machine parameters; supporting in the chamber a target of sputter coating material, having a plurality of sputtering regions thereon, and a substrate holder holding a substrate with a surface of the substrate facing the target to receive a coating of sputter coating material sputtered from the plurality of regions of the target; storing in a memory the desired thickness of the coating to be deposited on the substrate by performance of the process thereon; entering measured data of the coating thickness distribution on a substrate coated by a prior performance thereon of the process in accordance with previously set machine parameters; calculating modified machine parameters from the entered measured data of the coating thickness distribution, the stored desired thickness and the previously set machine parameters; and performing the process on the substrate supported in the processing chamber to deposit the desired thickness of coating material on the substrate in accordance with the modified machine parameters.

Claim 7

Independent Claim 203 words

A method of manufacturing a sputter coated article, comprising the steps of: providing a sputter coating apparatus having a processing chamber in which a sputter coating material is deposited onto a substrate by a sputter coating process performed with the apparatus operated in accordance with a plurality of machine parameters; supporting in the chamber a target of sputter coating material, having a plurality of sputtering regions thereon, and a substrate holder holding a substrate with a surface of the substrate facing the target to receive a coating of sputter coating material sputtered from the plurality of regions of the target; storing in a memory the desired thickness of the coating to be deposited on the substrate by performance of the process thereon; entering measured data of the coating thickness distribution on a substrate coated by a prior performance thereon of the process in accordance with previously set machine parameters; calculating modified machine parameters from the entered measured data of the coating thickness distribution, the stored desired thickness and the previously set machine parameters; and performing the process on the substrate supported in the processing chamber to deposit the desired thickness of coating material on the substrate in accordance with the modified machine parameters.

Claim 8

Dependent Claim 49 words

The method of claim 5 wherein: the measured data entering step includes the step of measuring the coating thickness at a plurality of points on the surface of the substrate coated by the prior performance of the process thereon to produce the measured data of the coating thickness distribution.

Claim 9

Dependent Claim 36 words

The method of claim 6 wherein the calculating step includes the step of: separately adjusting respective machine parameters applicable to each of the regions of the target from the measured data of the coating thickness distribution.

Claim 10

Dependent Claim 71 words

The method of claim 7 wherein: the target is annular and the regions thereon include an inner region and an outer annular region surrounding the inner region; and the measured data entering step includes the step of entering data of coating thickness measured at inner and outer portions of the surface of the substrate coated by the prior performance thereon of the process in accordance with the previously set machine parameters.

Claim 11

Dependent Claim 32 words

The method of claim 5 wherein: the modified machine parameters include machine parameters affecting the power levels to which the target is energized to cause the sputtering from the respective regions thereof.

Claim 12

Dependent Claim 205 words

A sputter coating apparatus comprising: a processing chamber in which a sputter coating material is deposited onto a substrate by a sputter coating process, the chamber having supported therein: a target of sputter coating material, and a substrate holder for supporting a substrate such that a surface of the substrate faces the target to receive a coating of sputter coating material sputtered from the target; a data processor having means for receiving and storing entered process parameter data including: data of the desired thickness of a coating to be deposited on a substrate by performance of the process thereon, and data of the desired deposition rate at which the coating is to be deposited on the substrate; means for electrically energizing the target to cause sputtering therefrom in accordance with machine parameters communicated thereto to perform the sputter coating process on a substrate supported in the substrate holder; the data processor including means for calculating, from the entered process parameter data, machine parameters for performing the sputter coating process so as to deposit, at the desired deposition rate, a coating on the substrate of the desired thickness; and means connected to the data processor for communicating the calculated machine parameters to the target energizing means.

Claim 13

Dependent Claim 205 words

A sputter coating apparatus comprising: a processing chamber in which a sputter coating material is deposited onto a substrate by a sputter coating process, the chamber having supported therein: a target of sputter coating material, and a substrate holder for supporting a substrate such that a surface of the substrate faces the target to receive a coating of sputter coating material sputtered from the target; a data processor having means for receiving and storing entered process parameter data including: data of the desired thickness of a coating to be deposited on a substrate by performance of the process thereon, and data of the desired deposition rate at which the coating is to be deposited on the substrate; means for electrically energizing the target to cause sputtering therefrom in accordance with machine parameters communicated thereto to perform the sputter coating process on a substrate supported in the substrate holder; the data processor including means for calculating, from the entered process parameter data, machine parameters for performing the sputter coating process so as to deposit, at the desired deposition rate, a coating on the substrate of the desired thickness; and means connected to the data processor for communicating the calculated machine parameters to the target energizing means.

Claim 14

Dependent Claim 75 words

The apparatus of claim 10 wherein: the data processor includes means for storing machine parameters in accordance with which a process has been performed on a previously processed substrate; the data processor includes means for receiving and storing measured data of coating thickness distribution on the previously processed substrate; and the calculating means is operative to calculate the calculated machine parameters from both the measured coating thickness distribution data and the entered process parameter data.

Claim 15

Dependent Claim 74 words

The apparatus of claim 10 wherein: the calculating means includes means for calculating separate sets of machine parameters for each of a plurality of different regions of the target in accordance with the calculated machine parameters; the energizing means is operative to energize the different regions of the target in accordance with the communicated machine parameters; the communicating means is operative to independently communicate the separate calculated machine parameters to the target energizing means.

Claim 16

Dependent Claim 34 words

The apparatus of claim 12 wherein: the separate sets of calculated machine parameters each include machine parameters affecting the power level to which the target is energized to cause sputtering from the respective regions.

Claim 17

Independent Claim 211 words

An apparatus for manufacturing a sputter coated article, comprising: a processing chamber in which a sputter coating material is deposited onto a substrate by a sputter coating process, the chamber having supported therein: a target of sputter coating material having a plurality of sputtering regions thereon, and a substrate holder for supporting a substrate such that a surface of the substrate faces the target to receive a coating of sputter coating material sputtered from the regions of the target; means for electrically energizing the target to cause sputtering from the regions thereof in accordance with machine parameters communicated thereto; a data processor; means for entering into the data processor data of the desired thickness of the coating to be deposited on the substrate; the data processor including: means for storing machine parameters in accordance with which a process has been performed on a previously processed substrate; means for receiving and storing measured data of coating thickness deposited on the substrate previously processed in accordance with the stored parameters; and means for calculating modified machine parameters from the stored machine parameters, the measured data of coating thickness and the data of desired coating thickness; and means connected to the data processor for communicating the modified machine parameters to the target energizing means.

Claim 18

Independent Claim 211 words

An apparatus for manufacturing a sputter coated article, comprising: a processing chamber in which a sputter coating material is deposited onto a substrate by a sputter coating process, the chamber having supported therein: a target of sputter coating material having a plurality of sputtering regions thereon, and a substrate holder for supporting a substrate such that a surface of the substrate faces the target to receive a coating of sputter coating material sputtered from the regions of the target; means for electrically energizing the target to cause sputtering from the regions thereof in accordance with machine parameters communicated thereto; a data processor; means for entering into the data processor data of the desired thickness of the coating to be deposited on the substrate; the data processor including: means for storing machine parameters in accordance with which a process has been performed on a previously processed substrate; means for receiving and storing measured data of coating thickness deposited on the substrate previously processed in accordance with the stored parameters; and means for calculating modified machine parameters from the stored machine parameters, the measured data of coating thickness and the data of desired coating thickness; and means connected to the data processor for communicating the modified machine parameters to the target energizing means.

Claim 19

Dependent Claim 38 words

The apparatus of claim 14 further comprising: means connected to the measured data receiving means for measuring coating thickness at a plurality of points on the surface of the previously processed substrate to produce coating thickness distribution data.

Claim 20

Dependent Claim 33 words

The apparatus of claim 15 wherein the calculating means includes: means for separately adjusting the machine parameters applicable to each respective region of the target in response to the measured thickness distribution data.

Claim 21

Dependent Claim 57 words

The apparatus of claim 16 wherein: the target is annular and the regions thereof include an inner region and an outer annular region surrounding the inner region; and the coating thickness measuring means includes means for measuring the data of coating thickness near both inner and outer portions of the coated surface of the previously processed substrate.

Claim 22

Dependent Claim 32 words

The apparatus of claim 14 wherein: the modified machine parameters include machine parameters affecting the power levels to which the target is energized to cause the sputtering from the respective regions thereof.

Claim 23

Independent Claim 212 words

A method of manufacturing a sputter coated article, comprising the steps of: providing a sputter coating apparatus having a processing chamber in which a sputter coating material is deposited onto a substrate by a sputter coating process performed with the apparatus operated in accordance with a plurality of machine parameters; supporting in the chamber a target of sputter coating material, having a plurality of sputtering regions thereon, and a substrate holder holding a substrate with a surface of the substrate facing the target to receive a coating of sputter coating material sputtered from the plurality of regions of the target; storing initial machine parameters in a memory; entering alternative machine parameters into the memory; displaying to an operator the stored initial machine parameters and the alternative machine parameters; receiving from an operator parameter selection commands and process initiating commands; selecting, in response to the commands received from the operator, selected machine parameters from among the stored initial machine parameters and the stored alternative machine parameters; and performing a sputter coating process on a substrate supported in the processing chamber in accordance with the selected machine parameters by electrically energizing the target so as to independently cause sputtering from each region respectively in accordance with separate machine parameters including the selected machine parameters.

Claim 24

Independent Claim 212 words

A method of manufacturing a sputter coated article, comprising the steps of: providing a sputter coating apparatus having a processing chamber in which a sputter coating material is deposited onto a substrate by a sputter coating process performed with the apparatus operated in accordance with a plurality of machine parameters; supporting in the chamber a target of sputter coating material, having a plurality of sputtering regions thereon, and a substrate holder holding a substrate with a surface of the substrate facing the target to receive a coating of sputter coating material sputtered from the plurality of regions of the target; storing initial machine parameters in a memory; entering alternative machine parameters into the memory; displaying to an operator the stored initial machine parameters and the alternative machine parameters; receiving from an operator parameter selection commands and process initiating commands; selecting, in response to the commands received from the operator, selected machine parameters from among the stored initial machine parameters and the stored alternative machine parameters; and performing a sputter coating process on a substrate supported in the processing chamber in accordance with the selected machine parameters by electrically energizing the target so as to independently cause sputtering from each region respectively in accordance with separate machine parameters including the selected machine parameters.

Claim 25

Dependent Claim 24 words

The method of claim 19 wherein: the alternative machine parameter entering step includes the step of receiving the alternative machine parameters from an operator.

Claim 26

Dependent Claim 78 words

The method of claim 19 further comprising the steps of: receiving from an operator and storing in the memory the desired coating thickness; and the alternative machine parameter entering step including the step of calculating the alternative machine parameters at least partly from said desired coating thickness; the process performing step including the step of energizing the target to a power level, the alternative parameters that are calculated including the power level to which the target is energized.

Claim 27

Dependent Claim 26 words

The method of claim 19 further comprising the step of: storing in the memory measured data from a prior performance of the process on a substrate.

Claim 28

Dependent Claim 21 words

The method of claim 22 further comprising the step of: calculating the alternative parameters at least partly from the measured data.

Claim 29

Dependent Claim 29 words

The method of claim 22 wherein: the measured data is data of the thickness of coating deposited in the prior performance of the process on the previously processed substrate.

Claim 30

Dependent Claim 23 words

The method of claim 24 further comprising the step of: calculating the alternative parameters at least partly from the data of the thickness.

Claim 31

Dependent Claim 25 words

The method of claim 25 further comprising the step of: receiving from an operator and storing in the memory data of a desired coating thickness.

Claim 32

Dependent Claim 25 words

The method of claim 26 further comprising the step of: receiving from an operator and storing in the memory data of a desired deposition rate.

Claim 33

Dependent Claim 42 words

The method of claim 27 wherein: the alternative parameters include the power levels to which the target is to be energized, the power levels being calculated at least partly from said measured and desired coating thickness data and desired deposition rate data.

Claim 34

Dependent Claim 35 words

The method of claim 26 wherein: the alternative parameters include the power levels to which the target is energized, the power levels being calculated at least partly from said measured and desired coating thickness data.

Claim 35

Dependent Claim 37 words

The method of claim 22 wherein: the measured data is data of the thickness of coating, deposited on a substrate by the prior performance of the process thereon, measured at a plurality of points on the substrate.

Claim 36

Dependent Claim 51 words

The method of claim 30 further comprising the steps of: calculating a plurality of alternative parameters respectively relating to each of the plurality of regions of the target, the calculating being at least partly from the data of coating thickness measured at the plurality of points on the previously processed substrate.

Claim 37

Dependent Claim 31 words

The method of claim 30 further comprising the steps of: receiving from an operator and storing in the memory the desired thickness of the coating to be deposited on the substrate.

Claim 38

Dependent Claim 34 words

The method of claim 32 further comprising the step of: receiving from an operator and storing in the memory the desired deposition rate at which the coating is to be deposited on the substrate.

Claim 39

Dependent Claim 48 words

The method of claim 33 wherein: the calculated alternative parameters include the power levels to which the plurality of regions of the target are energized, the power levels being calculated at least partly from the measured coating thickness data, the desired coating thickness and the desired deposition rate.

Claim 40

Dependent Claim 60 words

The method of claim 33 wherein: the calculated alternative parameters include the relative duration of the time intervals during which each of the plurality of regions of the target is to be energized when the process is performed on the substrate, the intervals being calculated at least partly from the measured data of coating thickness and the desired coating thickness.

Claim 41

Dependent Claim 59 words

The method of claim 35 further comprising the steps of: receiving from an operator and storing in the memory the upper power limit of the target; and the calculated relative duration of the time intervals during which the plurality of regions of the target is to be energized being calculated at least partly from the entered upper power limit.

Claim 42

Dependent Claim 57 words

The method of claim 32 wherein: the calculated alternative parameters include the power levels to which each of the plurality of regions of the target is to be energized when a process is performed on the substrate, the power levels being calculated at least partly from the measured data of coating thickness and the desired coating thickness.

Claim 43

Dependent Claim 119 words

The method of claim 37 wherein: the calculated alternative parameters include the relative duration of the time intervals during which each of the plurality of regions of the target is to be energized when the process is performed on the substrate, the intervals being calculated at least partly from the measured data of coating thickness and desired coating thickness; the method further comprising the steps of receiving from an operator, and storing in the memory, data of the upper power limit of the target; and the calculated relative duration of the time intervals during which each of the plurality of regions of the target is to be energized being calculated at least partly from the entered power limit data.

Claim 44

Dependent Claim 43 words

The method of claim 19 further comprising the step of: receiving from an operator the measured data from a prior performance of the process; and storing in the memory the measured data from the prior performance of the process received from the operator.

Claim 45

Dependent Claim 35 words

The method of claim 19 further comprising the step of: measuring the data from a prior performance of the process; and storing in the memory the measured data from the prior performance of the process.

Claim 46

Dependent Claim 24 words

The method of claim 19 further comprising the steps of: receiving from an operator and storing in the memory data of desired process parameters.

Claim 47

Dependent Claim 54 words

The method of claim 19 further comprising the steps of: receiving from an operator, and storing in the memory, a desired process parameter; and calculating, at least partly from the process parameter, the alternative parameters, including parameters in accordance with which each of the plurality of regions of the target is to be energized.

Claim 48

Dependent Claim 23 words

The method of claim 19 wherein: the target includes a single piece of sputtering material having at least two of the regions thereon.

Claim 49

Dependent Claim 19 words

The method of claim 43 wherein: the process is performed by energizing the two regions of the target alternately.

Claim 50

Dependent Claim 62 words

The method of claim 19 wherein: the target includes at least two concentric regions, including an inner region and an outer region; and the method further comprises the steps of calculating the different alternative machine parameters for each of the regions of the target and energizing the inner and outer regions of the target separately in accordance with different respective machine parameters.

Claim 51

Dependent Claim 207 words

A sputter coating apparatus comprising: a processing chamber in which a sputtered coating material is deposited onto a substrate by a process, the chamber having supported therein: a target of sputter coating material having a plurality of sputtering regions thereon, and a substrate holder for supporting a substrate such that a surface of the substrate faces the target to receive a coating of sputter coating material sputtered from the regions of the target; means for electrically energizing the target to independently cause sputtering from each region in accordance with stored parameters communicated thereto; memory means for holding stored parameters therein; entry means including means for entering alternative parameters; the entry means including means for receiving from an operator parameter selection commands and process initiating commands; display means for displaying to an operator the stored parameters and the alternative parameters; control means including means responsive to parameter selection commands received from the operator for selecting parameters, from among the stored and alternative parameters; and the control means including means responsive to the initiating commands received from the operator for communicating the selected parameters to the energizing means to initiate the performance of the process on a substrate supported in the processing chamber in accordance with the selected parameters.

Claim 52

Dependent Claim 207 words

A sputter coating apparatus comprising: a processing chamber in which a sputtered coating material is deposited onto a substrate by a process, the chamber having supported therein: a target of sputter coating material having a plurality of sputtering regions thereon, and a substrate holder for supporting a substrate such that a surface of the substrate faces the target to receive a coating of sputter coating material sputtered from the regions of the target; means for electrically energizing the target to independently cause sputtering from each region in accordance with stored parameters communicated thereto; memory means for holding stored parameters therein; entry means including means for entering alternative parameters; the entry means including means for receiving from an operator parameter selection commands and process initiating commands; display means for displaying to an operator the stored parameters and the alternative parameters; control means including means responsive to parameter selection commands received from the operator for selecting parameters, from among the stored and alternative parameters; and the control means including means responsive to the initiating commands received from the operator for communicating the selected parameters to the energizing means to initiate the performance of the process on a substrate supported in the processing chamber in accordance with the selected parameters.

Claim 53

Dependent Claim 21 words

The apparatus of claim 46 wherein: the alternative parameter entering means includes means for receiving the alternative parameters from an operator.

Claim 54

Dependent Claim 69 words

The apparatus of claim 46 wherein: the entry means includes means for receiving from an operator, and storing in the memory means, data of a desired coating thickness; and the alternative parameter entering means comprises means for calculating the alternative parameters at least partly from said data of desired coating thickness, the calculated alternative parameters including the power levels to which the regions of the target will be energized.

Claim 55

Dependent Claim 25 words

The apparatus of claim 46 wherein: the entry means includes means for receiving from an operator, and storing in the memory means, desired process parameters.

Claim 56

Dependent Claim 25 words

The apparatus of claim 46 wherein: the memory means includes means for storing measured data from a prior performance of the process on a substrate.

Claim 57

Dependent Claim 32 words

The apparatus of claim 50 wherein: the entry means includes means for receiving from an operator, and storing in the memory means, the measured data from the prior performance of the process.

Claim 58

Dependent Claim 19 words

The apparatus of claim 50 further comprising: means for measuring the data from the prior performance of the process.

Claim 59

Dependent Claim 19 words

The apparatus of claim 50 further comprising: means for calculating the alternative parameters at least partly from said data.

Claim 60

Dependent Claim 28 words

The apparatus of claim 50 wherein: the measured data is data of the thickness of coating deposited on a substrate by the prior performance of the process thereon.

Claim 61

Dependent Claim 25 words

The apparatus of claim 54 further comprising: means for calculating the alternative parameters at least partly from said data of the thickness of the coating.

Claim 62

Dependent Claim 28 words

The apparatus of claim 54 wherein: the entry means includes means for receiving from an operator, and storing in the memory means, data of a desired coating thickness.

Claim 63

Dependent Claim 28 words

The apparatus of claim 56 wherein: the entry means includes means for receiving from an operator, and storing in the memory means, data of a desired deposition rate.

Claim 64

Dependent Claim 57 words

The apparatus of claim 57, further comprising: means for calculating the alternative parameters at least partly from said data; and wherein the calculated alternative parameters include the power levels to which the target regions are energized, the power levels being calculated at least partly from said measured and desired coating thickness data and desired deposition rate data.

Claim 65

Dependent Claim 52 words

The apparatus of claim 56, further comprising: means for calculating the alternative parameters at least partly from said data; and wherein the calculated alternative parameters include the power levels to which the target regions are energized, the power levels being calculated at least partly from said measured and desired coating thickness data.

Claim 66

Dependent Claim 37 words

The apparatus of claim 50 wherein: the measured data is data of the thickness of coating deposited on a substrate, by the prior performance of the process thereon, measured at a plurality of points on the substrate.

Claim 67

Dependent Claim 44 words

The apparatus of claim 60 further comprising: means for calculating a plurality of alternative parameters respectively affecting each of the plurality target regions, the parameters being calculated at least partly from said data of coating thickness at a plurality of points on the substrate.

Claim 68

Dependent Claim 28 words

The apparatus of claim 60 wherein: the entry means includes means for receiving from an operator, and storing in the memory means, data of a desired coating thickness.

Claim 69

Dependent Claim 28 words

The apparatus of claim 62 wherein: the entry means includes means for receiving rom an operator, and storing in the memory means, data of a desired deposition rate.

Claim 70

Dependent Claim 46 words

The apparatus of claim 63 wherein: the calculated alternative parameters include the power levels to which the plurality of regions of the target are energized, the power levels being calculated at least partly from said measured and desired coating thickness data and desired deposition rate data.

Claim 71

Dependent Claim 46 words

The apparatus of claim 63 wherein: the calculated alternative parameters include the relative duration of the time intervals during which each of the plurality of regions of the target is energized, the duration being calculated at least partly from said measured and desired coating thickness data.

Claim 72

Dependent Claim 62 words

The apparatus of claim 65 wherein: the entry means includes means for receiving from an operator, and storing in the memory means, data of the upper power limit of the target; and the calculated relative duration of the time intervals during which the plurality of regions of the target is energized is calculated at least partly from said entered power limit data.

Claim 73

Dependent Claim 47 words

The apparatus of claim 50, further comprising means for calculating alternative parameters, wherein: the calculated alternative parameters include the power levels to which each of the plurality of regions of the target is energized is calculated at least partly from said measured and desired coating thickness data.

Claim 74

Dependent Claim 103 words

The apparatus of claim 67 wherein: the calculated alternative parameter include the relative duration of time intervals during which each of the plurality of regions of the target is energized, the duration being calculated at least partly from said measured and desired coating thickness data; the entry means includes means for receiving from the operator, and storing in the memory means, data of the upper power limit of the target; and the calculated relative duration of the time intervals during which each of the plurality of regions of the target is energized is calculated at least partly from said entered power limit data.

Claim 75

Dependent Claim 60 words

The apparatus of claim 46 wherein: the entry means includes means for receiving from the operator, and storing in the memory means, data of the desired process parameters; and the apparatus further comprises means for calculating, at least partly from said data, the alternative parameters in accordance with which each of the plurality of regions of the target are energized.

Claim 76

Dependent Claim 23 words

The apparatus of claim 46 wherein: the target includes a single piece of sputtering material having at least two of the regions thereon.

Claim 77

Dependent Claim 23 words

The apparatus of claim 70 wherein: the energizing means is operative to cause the two regions of the target to be energized alternately.

Claim 78

Dependent Claim 49 words

The apparatus of claim 46 wherein: the target includes at least two concentric regions, including an inner region and an outer region; and the apparatus further comprises means for calculating separate alternative parameters in accordance with which each of the plurality of regions of the target is respectively energized.

Annuity Stage	Window Opens	Payment Deadline	Surcharge Period Until	Estimated Fee	Status
3.5 Years (Year 4)	1995-06-30	1995-12-30	1996-06-30	$2000.00	Window Closed / Lapsed
7.5 Years (Year 8)	1999-06-30	1999-12-30	2000-06-30	$3760.00	Window Closed / Lapsed
11.5 Years (Year 12)	2003-06-30	2003-12-30	2004-06-30	$7700.00	Window Closed / Lapsed

Sputter coating process control method and apparatus

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