Patent US1756547A successfully refreshed from Google Patents.
Patent US5138973A successfully refreshed from Google Patents.
US5138973A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Wafer processing apparatus having independently controllable energy sources
Assignee: Texas Instruments Inc
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Filing: 1988-12-05
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Granted: 1992-08-18
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Expires: 2008-12-05
Abstract
Abstract A processing apparatus and method wherein a wafer is exposed to activated species generated by a first plasma which is separate from the wafer, but is in the process gas flow stream upstream of the wafer, and is also exposed to plasma bombardment generated by a second plasma which has a dark space which substantially adjoins the surface of the wafer. The in situ plasma is relatively low-power, so that the remote plasma can generate activated species, and therefore the in situ plasma power level can be adjusted to optimize the plasma bombardment. Ultraviolet light to illuminate the face of a wafer being processed is generated by a plasma which is within the vacuum chamber but is remote from the face of the wafer and controlled independent of the in situ plasma. It is useful to design the gas flow system such that the ultraviolet-generating plasma has its own gas feed, and the reaction products from the ultraviolet-generating plasma do not substantially flow or diffuse to the wafer face. A transparent isolator is usefully included between the ultraviolet plasma space and the processing space near the wafer face, so that the ultraviolet plasma can be operated at a vacuum level slightly different from that used near the wafer face.
Inventors
- 👤 Cecil J. Davis
- 👤 Rhett B. Jucha
- 👤 Joseph D. Luttmer
- 👤 Rudy L. York
- 👤 Lee M. Loewenstein
- 👤 Robert T. Matthews
- 👤 Randall C. Hildenbrand
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 22:20
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/48; C23C16/482; C23C16/50; C23C16/517; C23C16/54
Claims Analysis
Total Claims: 16
Claim 1
Independent Claim
139 words
An apparatus for processing of wafers, comprising: (a) a vacuum processing chamber; (b) a wafer support within said vacuum processing chamber, said wafer support being capable of supporting a wafer; (c) gas flow passages positioned to perit release of a desired process gas flow into said processing chamber; (d) an independently controllable ultraviolet energy source within said vacuum processing chamber separated from the wafer, in fluid communication with the vacuum processing chamber, and positioned to illuminate the wafer with ultraviolet energy; (e) an independently controllable plasma genrator remote from and in fluid communication with said vacuum processing chamber, at least some of said gas flow passages being connected to flow process gasses through said plasma generator; and (f) an independently controllable RF power source positioned to generate a second plasma, separate from said first plasma, in said process chamber.
Claim 2
Independent Claim
139 words
An apparatus for processing of wafers, comprising: (a) a vacuum processing chamber; (b) a wafer support within said vacuum processing chamber, said wafer support being capable of supporting a wafer; (c) gas flow passages positioned to perit release of a desired process gas flow into said processing chamber; (d) an independently controllable ultraviolet energy source within said vacuum processing chamber separated from the wafer, in fluid communication with the vacuum processing chamber, and positioned to illuminate the wafer with ultraviolet energy; (e) an independently controllable plasma genrator remote from and in fluid communication with said vacuum processing chamber, at least some of said gas flow passages being connected to flow process gasses through said plasma generator; and (f) an independently controllable RF power source positioned to generate a second plasma, separate from said first plasma, in said process chamber.
Claim 3
Dependent Claim
35 words
The apparatus of claim 1, further comprising an environmental and vacuum control device for maintaining a vacuum in a processing chamber and for volatilization and removal of any particulate from the surface of said chamber.
Claim 4
Dependent Claim
68 words
The apparatus of claim 1, wherein said internal ultraviolet source comprises: (a) an ultraviolet chamber bounded on one side by and in fluid communication with the process chamber; (b) a gas supply to the ultraviolet chamber; (c) a thin window substantially transparent to ultraviolet light separating the process chamber from the ultraviolet chamber; (d) an electrode for coupling radio frequency energy to a plasma inside said ultraviolet chamber.
Claim 5
Dependent Claim
15 words
The apparatus of claim 3, wherein said thin window of said ultraviolet source comprises quartz.
Claim 6
Dependent Claim
15 words
The apparatus of claim 3, wherein said thin window of said ultraviolet source comprises sapphire.
Claim 7
Dependent Claim
37 words
The plasma generator of claim 1, further comprising (a) a gas supply; (b) a microwave power source; (c) a microwave cavity in which power supplied by the microwave power source excites the gas from the gas supply.
Claim 8
Dependent Claim
22 words
The apparatus of claim 1 wherein the wafer is supported in a manner such that a face to be processed faces downward.
Claim 9
Independent Claim
67 words
An apparatus for processing a workpiece in a process chamber comprising: (a) an independently controllable plasma generator remote from and in fluid communication with the process chamber; (b) an independently controllable ultraviolet energy source chamber separated from the workpiece and in fluid communication with the vacuum processing chamber and positioned to illuminate said workpiece; and (c) an independently controllable radio frequency energy source coupled to said workpiece.
Claim 10
Independent Claim
67 words
An apparatus for processing a workpiece in a process chamber comprising: (a) an independently controllable plasma generator remote from and in fluid communication with the process chamber; (b) an independently controllable ultraviolet energy source chamber separated from the workpiece and in fluid communication with the vacuum processing chamber and positioned to illuminate said workpiece; and (c) an independently controllable radio frequency energy source coupled to said workpiece.
Claim 11
Dependent Claim
16 words
The apparatus of claim 8 wherein the face of said workpiece to be processed faces downward.
Claim 12
Dependent Claim
17 words
The apparatus of claim 8 wherein said plasma generator and said ultraviolet energy source are operated simultaneously.
Claim 13
Dependent Claim
20 words
The apparatus of claim 8 wherein said plasma generator, ultraviolet energy source and radio frequency energy source are operated simultaneously.
Claim 14
Dependent Claim
18 words
The apparatus of claim 8 wherein said ultraviolet energy source is in fluid communication with the process chamber.
Claim 15
Dependent Claim
16 words
The apparatus of claim 8 wherein said ultraviolet energy source is outside of the process chamber.
Claim 16
Dependent Claim
31 words
The apparatus of claim 8 wherein said ultraviolet energy source is in fluid communication with said process chamber and wherein a thin window separates said ultraviolet energy source from said workpiece.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1995-08-18 | 1996-02-17 | 1996-08-18 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1999-08-18 | 2000-02-17 | 2000-08-18 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2003-08-18 | 2004-02-17 | 2004-08-18 | $7700.00 | Window Closed / Lapsed |