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US5183972A Expired / Lapsed US ⏱️ 0.0 years remaining

Copper/epoxy structures

Assignee: Microelectronics and Computer Technology Corp
•
Filing: 1991-02-04
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Granted: 1993-02-02
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Expires: 2011-02-04
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Abstract

Abstract A high density, high performance circuit fabricated with a copper/epoxy structure. The circuit is well suited for an integrated circuit interconnect device. Fluorene-containing epoxy resins may be used to obtain certain material and processing advantages over copper/polyimide structures. The circuit structure resides on a substrate which may be ceramic, a semiconductor such as silicon, or, advantageously, a cured epoxy resin.

Inventors

  • 👤 Diana C. Duane
  • 👤 Eric L. Zilley
  • 👤 Robert C. Jordan

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-09 14:45
CPC Classifications
H; H10; H10W; H10W70/00; H10W70/60; H10W70/62; H10W70/66; H05; H05K; H05K3/00; H05K3/46; H05K3/4644; H05K3/4647; H05K3/4682; H10W70/611; H10W70/67; H10W70/68; H10W70/685; H10W70/69; H10W70/695; H05K2201/00; H05K2201/02; H05K2201/0203; H05K2201/0242; H05K2201/0254; H05K2201/09; H05K2201/09209; H05K2201/095; H05K2201/096; H05K2203/00; H05K2203/07; H05K2203/0703; H05K2203/0733; H05K3/10; H05K3/108; H05K3/20; H05K3/205; H05K3/22; H05K3/24; H05K3/243; H05K3/38; H05K3/388

Claims Analysis

Total Claims: 27
Claim 1
Independent Claim 85 words
A multilayer circuit comprising: a substrate; a first cured epoxy resin dielectric layer on said substrate wherein the thermal coefficient of expansion of said first cured epoxy resin dielectric layer and said substrate are matched; at least two high density circuit pattern layers located above said first cured epoxy resin dielectric layer wherein said circuit pattern layers exhibit a conductor line density of greater than 300 lines per inch per level; and a second cured epoxy resin dielectric layer located between said circuit pattern layers.
Claim 2
Dependent Claim 85 words
A multilayer circuit comprising: a substrate; a first cured epoxy resin dielectric layer on said substrate wherein the thermal coefficient of expansion of said first cured epoxy resin dielectric layer and said substrate are matched; at least two high density circuit pattern layers located above said first cured epoxy resin dielectric layer wherein said circuit pattern layers exhibit a conductor line density of greater than 300 lines per inch per level; and a second cured epoxy resin dielectric layer located between said circuit pattern layers.
Claim 3
Dependent Claim 14 words
A circuit according to claim 1 wherein said circuit pattern layers are copper layers.
Claim 4
Dependent Claim 36 words
A circuit according to claim 1, further comprising a circuit power layer located above said circuit pattern layers; and an additional cured epoxy resin dielectric layer separating said circuit power layer from said circuit pattern layers.
Claim 5
Dependent Claim 26 words
A circuit according to claim 1 further comprising at least one interconnection extending through said second cured epoxy resin dielectric layer between said circuit pattern layers.
Claim 6
Dependent Claim 14 words
A circuit according to claim 1 wherein said substrate is a cured epoxy resin.
Claim 7
Dependent Claim 32 words
A circuit according to claim 5 wherein the thermal coefficient of expansion of said cured epoxy resin substrate and said first cured epoxy resin dielectric layer is about 60×10 -6 /° C.
Claim 8
Dependent Claim 25 words
A circuit according to claim 5 wherein said cured epoxy resin substrate and said first cured epoxy resin dielectric layer are the same epoxy resin.
Claim 9
Dependent Claim 19 words
A circuit according to claim 7 wherein said second cured epoxy resin dielectric layer is said same epoxy resin.
Claim 10
Dependent Claim 19 words
A circuit according to claim 1 wherein said conductor line density is over 500 lines per inch per level.
Claim 11
Dependent Claim 60 words
A high density interconnect device, comprising: a substrate; a high density interconnect circuit pattern located on said substrate wherein said circuit pattern exhibits a conductor line density of over 300 lines per inch per level; and a cured epoxy resin dielectric surrounding said circuit pattern wherein said cured epoxy resin has a glass transition temperature of at least 175° C.
Claim 12
Dependent Claim 60 words
A high density interconnect device, comprising: a substrate; a high density interconnect circuit pattern located on said substrate wherein said circuit pattern exhibits a conductor line density of over 300 lines per inch per level; and a cured epoxy resin dielectric surrounding said circuit pattern wherein said cured epoxy resin has a glass transition temperature of at least 175° C.
Claim 13
Dependent Claim 69 words
A device according to claim 10 wherein said circuit pattern comprises a first set of essentially parallel wire segments arranged in a first layer; a second set of essentially parallel wire segments perpendicular to said first set and arranged in a second layer; and a plurality of interconnections between said first set and said second set; wherein said cured epoxy resin dielectric separates said wire segments and said layers.
Claim 14
Dependent Claim 13 words
A device according to claim 10 wherein said circuit pattern comprises copper lines.
Claim 15
Dependent Claim 14 words
A device according to claim 10 wherein the substrate is a cured epoxy resin.
Claim 16
Dependent Claim 19 words
A device according to claim 11 wherein said conductor line density is over 500 lines per inch per level.
Claim 17
Dependent Claim 41 words
The invention according to claims 1 or 2 or 3 or 4 or 5 or 6 or 7 or 8 or 9 or 10 or 11 or 12 or 13 or 14 wherein the cured epoxy resin contains a fluorene-containing polyepoxide.
Claim 18
Dependent Claim 14 words
The invention according to claim 15 wherein the cured epoxy resin contains an adjuvant.
Claim 19
Dependent Claim 21 words
The invention according to claim 15 wherein the cured epoxy resin has a glass transition temperature of at least 175° C.
Claim 20
Dependent Claim 25 words
The invention according to claim 15 wherein the cured epoxy resin dielectric contains a plurality of hollow glass microspheres which reduce the dielectric constant thereof.
Claim 21
Dependent Claim 54 words
A high density interconnect device, comprising: a substrate; a high density interconnect circuit pattern located on said substrate wherein said circuit pattern exhibits a conductor line density of over 300 lines per inch per level; and a cured epoxy resin dielectric surrounding said circuit pattern wherein said cured epoxy resin contains a fluorene-containing polyepoxide.
Claim 22
Dependent Claim 54 words
A high density interconnect device, comprising: a substrate; a high density interconnect circuit pattern located on said substrate wherein said circuit pattern exhibits a conductor line density of over 300 lines per inch per level; and a cured epoxy resin dielectric surrounding said circuit pattern wherein said cured epoxy resin contains a fluorene-containing polyepoxide.
Claim 23
Dependent Claim 53 words
A high density interconnect device, comprising: a substrate; a high density interconnect circuit pattern located on said substrate wherein said circuit pattern exhibits a conductor line density of over 300 lines per inch per level; and a cured epoxy resin dielectric surrounding said circuit pattern wherein said cured epoxy resin contains an adjuvant.
Claim 24
Dependent Claim 53 words
A high density interconnect device, comprising: a substrate; a high density interconnect circuit pattern located on said substrate wherein said circuit pattern exhibits a conductor line density of over 300 lines per inch per level; and a cured epoxy resin dielectric surrounding said circuit pattern wherein said cured epoxy resin contains an adjuvant.
Claim 25
Dependent Claim 26 words
A device according to claim 20 wherein said adjuvant is a plurality of hollow glass microspheres which reduce the dielectric constant of the cured epoxy resin.
Claim 26
Dependent Claim 45 words
A high density interconnect device, comprising: a substrate; a high density interconnect circuit pattern located on said substrate wherein said circuit pattern exhibits a conductor line density of over 300 lines per inch per level; and a cured epoxy resin dielectric surrounding said circuit pattern.
Claim 27
Dependent Claim 45 words
A high density interconnect device, comprising: a substrate; a high density interconnect circuit pattern located on said substrate wherein said circuit pattern exhibits a conductor line density of over 300 lines per inch per level; and a cured epoxy resin dielectric surrounding said circuit pattern.

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1996-02-02 1996-08-03 1997-02-02 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2000-02-02 2000-08-03 2001-02-02 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2004-02-02 2004-08-03 2005-02-02 $7700.00 Window Closed / Lapsed

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