Alignment device having irradiation and detection light correcting optical elements

Claim 2

An alignment device adapted for use in an exposure apparatus equipped with a projection optical system for transferring a predetermined pattern, formed on a reticle, onto a substrate with an exposure light, and adapted for detecting the position of an alignment mark formed on said substrate, comprising: light irradiation means for irradiating said alignment mark, through said projection optical system, with alignment light of a wavelength different from that of said exposure light; detection means for detecting, through said projection optical system, light from said alignment mark; an irradiation light correcting optical element provided between said reticle and said substrate and adapted for deflecting the irradiation optical path so as to correct, by predetermined amounts, the longitudinal chromatic aberration and the chromatic aberration of magnification of the projection optical system for the irradiation light; and a detection light correcting optical element provided between said reticle and said substrate and adapted for deflecting the detection optical path toward the peripheral part of an exposure area of said reticle, so as to correct, by a predetermined amount, the chromatic aberration of magnification of the projection optical system for the detection light.

Claim 3

An alignment device according to claim 1, wherein said irradiation light correcting optical element and said detection light correcting optical element are substantially provided at the position of entrance pupil of said projection optical system.

Claim 4

An alignment device according to claim 2, wherein: said light irradiation means includes beam generation means for generating two beams for irradiating the alignment mark on said substrate from two directions with a predetermined crossing angle; and said beam generation means includes a frequency modulator for providing said two beams with a predetermined frequency difference.

Claim 5

An alignment device according to claim 2, wherein: said light irradiation means includes beam generation means for generating two beams for irradiating the alignment mark on said substrate from two directions with a predetermined crossing angle; said beam generation means includes a frequency modulator for providing said two beams with a predetermined frequency difference and a reference signal generation unit for generating a reference signal corresponding to said frequency difference; and the position of the alignment mark formed on said substrate is detected, based on an output from said detection means and the reference signal from said reference signal generation unit.

Claim 6

An alignment device according to claim 3, wherein: said irradiation light correcting optical element includes first and second irradiation light correcting optical elements; said first irradiation light correcting optical element is adapted to deflect, by a predetermined angle, one of the beams from said light irradiation means; and said second irradiation light correcting optical element is adapted to deflect, by a predetermined angle, the other of the beams from said light irradiation means.

Claim 7

An alignment device according to claim 5, wherein said first and second irradiation light correcting optical elements and said detection light correcting optical element are composed of diffraction gratings of mutually different pitches.

Claim 8

An alignment device according to claim 6, wherein the pitches P XA1 , P XA2 , P XA3 respectively of said first and second irradiation light correcting optical elements and of said detection light correcting optical element satisfy following relationships: P.sub.XA1 =m.sub.1 λ.sub.a /sinθ.sub.1 P.sub.XA2 =m.sub.2 λ.sub.a /sinθ.sub.2 P.sub.XA3 =m.sub.3 λ.sub.a /sinθ.sub.3 wherein θ 1 , θ 2 , θ 3 are beam deflection angles respectively by said first and second irradiation light correcting optical elements and by said detection light correcting optical element; m 1 , m 2 , m 3 are orders of beam diffraction respectively by said first and second irradiation light correcting optical elements and by said detection light correcting optical element; and λ a is the wavelength of the alignment light.

Claim 9

An alignment device according to claim 7, wherein said first and second irradiation light correcting optical elements and said detection light correcting optical element are linearly arranged along a predetermined direction.

Claim 10

An alignment device according to claim 5, wherein: said detection light correcting optical element is composed of a diffraction grating having a predetermined pitch along a predetermined direction; said first irradiation light correcting optical element is composed of a diffraction grating having a predetermined pitch along a direction inclined, by a predetermined angle, to the direction of pitch of said detection light correcting optical element; and said second irradiation light correcting optical element is composed of a diffraction grating having a predetermined pitch along a direction inclined, by a predetermined angle and oppositely to said first irradiation light correcting optical element, with respect to the direction of pitch of said detection light correcting optical element.

Claim 11

An alignment device according to claim 9, wherein: said first and second irradiation light correcting optical elements have a mutually same pitch in order to deflect the irradiation optical paths by a same angle but in mutually opposite directions; and the pitch P YA1 of said first and second irradiation light correcting optical elements and the pitch P YA3 of said detection light correcting optical element satisfy following relationships: tanθ.sub.4 =sinθ.sub.2 /sinθ.sub.1 P.sub.YA1 =m.sub.1 λ.sub.a cosθ.sub.4 /sinθ.sub.1 P.sub.YA3 =m.sub.3 λ.sub.a /sinθ.sub.2 wherein θ 1 is beam deflection angle by said first or second irradiation light correcting optical element in a direction connecting the centers of said first and second irradiation light correcting optical elements; θ 2 is beam deflection angle by said detection light correcting optical element; θ 4 is the angle of direction of pitch of said first or second irradiation light correcting optical element with respect to the direction of grooves of said detection light correcting optical element; m 1 is the order of diffraction of the beam deflected by a predetermined deflection angle by said first or second irradiation light correcting optical element; m 3 is the order of diffraction of the beam deflected by a predetermined deflection angle by said detection light correcting optical element; and λ a is the wavelength of the alignment light.

Claim 12

An alignment device according to claim 10, wherein said first and second irradiation light correcting optical elements and said detection light correcting optical element are linearly arranged along a predetermined direction.

Claim 13

An alignment device according to claim 5, wherein said first and second irradiation light correcting optical elements and said detection light correcting optical element are composed of concentric Fresnel zone plates having substantially same center points.

Claim 14

An alignment device according to claim 5, wherein said first and second irradiation light correcting optical elements and said detection light correcting optical element are composed of phase diffraction gratings, of which step d satisfies a relationship: d=[(2m+1)λ.sub.a ]/[2(n.sub.a -1)] wherein λ a is the wavelength of the alignment light; n a is the refractive index of the phase diffraction gratings for the wavelength of the alignment light; and m is an integer.

Claim 15

An alignment device according to claim 5, wherein said first and second irradiation light correcting optical elements and said detection light correcting optical element are composed of phase diffraction gratings, of which step d satisfies a relationship: d=mλ.sub.e /(n.sub.e -1) wherein λ e is the wavelength of the exposure light; n e is the refractive index of the phase diffraction gratings for the wavelength of the exposure light; and m is an integer.

Claim 16

An alignment device according to claim 1, wherein said irradiation light correcting optical element and said detection light correcting optical element are composed of phase diffraction gratings, of which step d satisfies a relationship: d=[(2m+1)λ.sub.a /[2(n.sub.a -1)] wherein λ a is the wavelength of the phase diffraction gratings; n a is the refractive index of the phase diffraction gratings for the wavelength of the alignment light; and m is an integer.

Claim 17

An alignment device according to claim 1, wherein said irradiation light correcting optical element and said detection light correcting optical element are composed of phase diffraction gratings, of which step d satisfies a relationship: d=mλ.sub.e /(n.sub.e -1) wherein λ e is the wavelength of the exposure light; n e is the refractive index of the phase diffraction gratings for the wavelength of the exposure light; and m is an integer.

Claim 18

An alignment device according to claim 1, wherein said irradiation light correcting optical element and said detection light correcting optical element are composed of Fresnel zone plates.

Claim 19

An alignment device according to claim 17, wherein said Fresnel zone plates are composed of phase Fresnel zone plates formed by steps d, which satisfy a relationship: d=[(2m+1)λ.sub.a ]/[2(n.sub.a -1)] wherein λ a is the wavelength of the alignment light; n a is the refractive index of the phase Fresnel zone plates for the wavelength of the alignment light; and m is an integer.

Claim 20

An alignment device according to claim 17, wherein said Fresnel zone plates are composed of phase Fresnel zone plates formed by steps d, which satisfy a relationship: d=mλ.sub.e /(n.sub.e -1) wherein λ e is the wavelength of the exposure light; n e is the refractive index of the phase Fresnel zone plates for the wavelength of the exposure light; and m is an integer.

Claim 21

An alignment device adapted for use in an exposure apparatus equipped with a projection optical system for transferring a predetermined pattern, formed on a reticle, onto a substrate with an exposure light, and adapted for setting the position of said substrate by detecting the position of a diffraction grating mark formed on said substrate, comprising: light irradiation means for irradiating said diffraction grating mark, through said projection optical system, from predetermined two directions, with two alignment light beams having a predetermined frequency difference and also having a wavelength different from that of said exposure light; detection means for detecting, through said projection optical system, a predetermined diffracted light beam from said diffraction grating mark; movement means for moving said substrate, based on a detection signal from said detection means; an irradiation light correcting optical element provided in said projection optical system and adapted for deflecting the irradiation optical paths so as to correct, by predetermined amounts, the longitudinal chromatic aberration and the chromatic aberration of magnification of said projection optical system for said irradiation light beams; and a detection light correcting optical element provided in said projection optical system and adapted for deflecting the detection optical path toward the peripheral part of the exposure area of said reticle, so as to correct, by a predetermined amount, the chromatic aberration of magnification of said projection optical system for said detection light beam; wherein said irradiation light correcting optical element and said detection light correcting optical element are provided in a plane perpendicular to the optical axis of said projection optical system.

Claim 22

An alignment device adapted for use in an exposure apparatus equipped with a projection optical system for transferring a predetermined pattern, formed on a reticle, onto a substrate with an exposure light, and adapted for setting the position of said substrate by detecting the position of a diffraction grating mark formed on said substrate, comprising: light irradiation means for irradiating said diffraction grating mark, through said projection optical system, from predetermined two directions, with two alignment light beams having a predetermined frequency difference and also having a wavelength different from that of said exposure light; detection means for detecting, through said projection optical system, a predetermined diffracted light beam from said diffraction grating mark; movement means for moving said substrate, based on a detection signal from said detection means; an irradiation light correcting optical element provided in said projection optical system and adapted for deflecting the irradiation optical paths so as to correct, by predetermined amounts, the longitudinal chromatic aberration and the chromatic aberration of magnification of said projection optical system for said irradiation light beams; and a detection light correcting optical element provided in said projection optical system and adapted for deflecting the detection optical path toward the peripheral part of the exposure area of said reticle, so as to correct, by a predetermined amount, the chromatic aberration of magnification of said projection optical system for said detection light beam; wherein said irradiation light correcting optical element and said detection light correcting optical element are provided in a plane perpendicular to the optical axis of said projection optical system.

Claim 23

An alignment device according to claim 20, wherein said irradiation light correcting optical element and said detection light correcting optical element are provided at the entrance pupil of said projection optical system.

Claim 24

An alignment device according to claim 21 wherein: said light irradiation means includes a frequency modulator for providing two beams, irradiating said diffraction grating mark from predetermined two direction, with a predetermined frequency difference, and a reference signal generation unit for generating a reference signal corresponding to said frequency difference; and said detection means includes a detection signal generation unit for generating a detection signal by the diffracted light beam from said diffraction grating mark, and a phase difference detection unit for detecting the phase difference between said detection signal and said reference signal.

Claim 25

An alignment device according to claim 22, wherein: said irradiation light correcting optical element includes first and second irradiation light correcting optical elements; said first irradiation light correcting optical element is adapted to deflect, by a predetermined angle, one of the beams from said light irradiation means; and said second irradiation light correcting optical element is adapted to deflect, by a predetermined angle, the other of the beams from said light irradiation means.

Claim 26

An alignment device according to claim 23, wherein said first and second irradiation light correcting optical elements and said detection light correcting optical element are composed of diffraction gratings of mutually different pitches.

Claim 27

An alignment device according to claim 24, wherein the pitches P XA1 , P XA2 , P XA3 respectively of said first and second irradiation light correcting optical elements and of said detection light correcting optical element satisfy following relationships: P.sub.XA1 =m.sub.1 λ.sub.a /sinθ.sub.1 P.sub.XA2 =m.sub.2 λ.sub.a /sinθ.sub.2 P.sub.XA3 =m.sub.3 λ.sub.a /sinθ.sub.3 wherein, θ 1 , θ 2 , θ 3 are beam deflection angles respectively by said first and second irradiation light correcting optical elements and by said detection light correcting optical element; m 1 , m 2 , m 3 are orders of beam diffraction respectively by said first and second irradiation light correcting optical elements and by said detection light correcting optical element; and λ a is the wavelength of the alignment light.

Claim 28

An alignment device according to claim 25, wherein said first and second irradiation light correcting optical elements and said detection light correcting optical element are composed of phase diffraction gratings, of which step d satisfies a relationship: d=[(2m+1)λ.sub.a ]/[2(n.sub.a -1)] wherein λ a is the wavelength of the alignment light; n a is the refractive index of the phase diffraction gratings for the wavelength of the alignment light; and m is an integer.

Claim 29

An alignment device according to claim 25, wherein said first and second irradiation light correcting optical elements and said detection light correcting optical element are composed of phase diffraction gratings, of which step d satisfies a relationship: d=mλ.sub.e /(n.sub.e -1) wherein λ e is the wavelength of the exposure light; n e is the refractive index of the phase diffraction grating for the wavelength of the exposure light; and m is an integer.

Claim 30

An alignment device according to claim 23, wherein: said detection light correcting optical element is composed of a diffraction grating having a predetermined pitch along a predetermined direction; said first irradiation light correcting optical element is composed of a diffraction grating having a predetermined pitch along a direction inclined, by a predetermined angle, to the direction of pitch of said detection light correcting optical element; and said second irradiation light correcting optical element is composed of a diffraction grating having a predetermined pitch along a direction inclined, by a predetermined angle and oppositely to said first irradiation light correcting optical element, with respect to the direction of pitch of said detection light correcting optical element.

Claim 31

An alignment device according to claim 28, wherein: said first and second irradiation light correcting optical elements have a mutually same pitch in order to deflect the irradiation optical paths by a same angle but in mutually opposite directions; and the pitch P YA1 of said first and second irradiation light correcting optical elements and the pitch P YA3 of said detection light correcting optical element satisfy following relationships: tanθ.sub.4 =sinθ.sub.2 /sinθ.sub.1 P.sub.YA1 =m.sub.1 λ.sub.a cosθ.sub.4 /sinθ.sub.1 P.sub.YA3 =m.sub.3 λ.sub.a /sinθ.sub.2 wherein θ 1 is the beam deflection angle by said first or second irradiation light correcting optical element in a direction connecting the centers of said first and second irradiation light correcting optical elements; θ 2 is the beam deflection angle by said detection light correcting optical element; θ 4 is the angle of direction of pitch of said first or second irradiation light correcting optical element with respect to the direction of grooves of said detection light correcting optical element; m 1 is the order of diffraction of the beam deflected by a predetermined deflection angle by said first or second irradiation light correcting optical element; m 3 is the order of diffraction of the beam deflected by a predetermined deflection angle by said detection light correcting optical element; and λ a is the wavelength of the alignment light.

Claim 32

An alignment device according to claim 29, wherein said first and second irradiation light correcting optical elements and said detection light correcting optical element are composed of phase diffraction gratings, of which step d satisfies a relationship: d=[(2m+1)λ.sub.a ]/[2(n.sub.a -1)] wherein λ a is the wavelength of the alignment light; n a is the refractive index of the phase diffraction gratings for the wavelength of the alignment light; and m is an integer.

Claim 33

An alignment device according to claim 29, wherein said first and second irradiation light correcting optical elements and said detection light correcting optical element are composed of phase diffraction gratings, of which step d satisfies a relationship: d=mλ.sub.e /(n.sub.e -1) wherein λ e is the wavelength of the exposure light; n e is the refractive index of the phase diffraction gratings for the wavelength of the exposure light; and m is an integer.

Claim 34

An alignment device according to claim 23, wherein said first and second irradiation light correcting optical elements and said detection light correcting optical element are composed of concentric Fresnel zone plates having substantially same center points.

Claim 35

An alignment device according to claim 32, wherein said Fresnel zone plates are composed of phase Fresnel zone plates formed by steps d, which satisfy a relationship: d=[(2m+1)λ.sub.a ]/[2(n.sub.a -1)] wherein λ a is the wavelength of the alignment light: n a is the refractive index of the phase Fresnel zone plates for the wavelength of the alignment light; and m is an integer.

Claim 36

An alignment device according to claim 32, wherein said Fresnel zone plates are composed of phase Fresnel zone plates formed by steps d, which satisfy a relationship: d=mλ.sub.e /(n.sub.e -1) wherein λ e is the wavelength of the exposure light; n e is the refractive index of the phase Fresnel zone plates for the wavelength of the exposure light; and m is an integer.

Claim 37

An alignment device adapted for use in an exposure apparatus equipped with a projection optical system for transferring a predetermined pattern, formed on a reticle, onto a substrate with an exposure light, and adapted for detecting the position of a diffraction grating mark formed on said substrate, comprising: light irradiation means for irradiating said diffraction grating mark, through said projection optical system, with alignment light of a wavelength different from that of said exposure light; detection means for detecting, through said projection optical system, diffracted light from said diffraction grating mark; an irradiation light correcting optical element provided between said reticle and said substrate and adapted for deflecting the irradiation optical path so as to correct, by a predetermined amount, the chromatic aberration of magnification of the projection optical system for the irradiation light; and a detection light correcting optical element provided between said reticle and said substrate and adapted for deflecting the detection optical path toward the peripheral part of an exposure area of said reticle, so as to correct, by predetermined amounts, the longitudinal chromatic aberration and the chromatic aberration of magnification of the projection optical system for said detection light.

Claim 38

An alignment device adapted for use in an exposure apparatus equipped with a projection optical system for transferring a predetermined pattern, formed on a reticle, onto a substrate with an exposure light, and adapted for detecting the position of a diffraction grating mark formed on said substrate, comprising: light irradiation means for irradiating said diffraction grating mark, through said projection optical system, with alignment light of a wavelength different from that of said exposure light; detection means for detecting, through said projection optical system, diffracted light from said diffraction grating mark; an irradiation light correcting optical element provided between said reticle and said substrate and adapted for deflecting the irradiation optical path so as to correct, by a predetermined amount, the chromatic aberration of magnification of the projection optical system for the irradiation light; and a detection light correcting optical element provided between said reticle and said substrate and adapted for deflecting the detection optical path toward the peripheral part of an exposure area of said reticle, so as to correct, by predetermined amounts, the longitudinal chromatic aberration and the chromatic aberration of magnification of the projection optical system for said detection light.

Claim 39

An alignment device according to claim 35, wherein said detection light correcting optical element includes first and second detection light correcting optical element for deflecting, by predetermined angles, predetermined two diffracted beams among plural diffracted beams generated from said diffraction grating mark.

Claim 40

An alignment device according to claim 36, wherein said irradiation light correcting optical element and said first and second detection light correcting optical elements are composed of diffraction gratings of mutually different pitches.

Claim 41

An alignment device according to claim 36, wherein: said irradiation light correcting optical element is composed of a diffraction grating having a predetermined pitch along a predetermined direction; said first detection light correcting optical element is composed of a diffraction grating having a predetermined pitch along a direction inclined, by a predetermined angle, to the direction of pitch of said irradiation light correcting optical element; and said second detection light correcting optical element is composed of a diffraction grating having a predetermined pitch along a direction inclined, by a predetermined angle and oppositely to said first detection light correcting optical element, with respect to the direction of pitch of said irradiation light correcting optical element.

Claim 42

An alignment device according to claim 36, wherein said irradiation light correcting optical element and said first and second detection light correcting optical elements are composed of Fresnel zone plates.

Claim 43

An alignment device according to claim 36, wherein said irradiation light correcting optical element and said first and second detection light correcting optical elements are composed of phase diffraction gratings, of which step d satisfies a relationship: d=[(2m+1)λ.sub.a ]/[2(n.sub.a -1)] wherein λ a is the wavelength of the alignment light; n a is the refractive index of the phase diffraction gratings for the wavelength of the alignment light; and m is an integer.

Claim 44

An alignment device according to claim 36, wherein said irradiation light correcting optical element and said first and second detection light correcting optical elements are composed of phase diffraction gratings, of which step d satisfies a relationship: d=mλ.sub.e /(n.sub.e -1) wherein λ e is the wavelength of the exposure light; n e is the refractive index of the phase diffraction gratings for the wavelength of the exposure light; and m is an integer.

Claim 45

An alignment device adapted for use in an exposure apparatus equipped with a projection optical system for transferring a predetermined pattern, formed on a reticle, onto a substrate with an exposure light, and adapted for detecting the position of an alignment mark formed on said substrate, comprising: light irradiation means for irradiating said alignment mark, through said projection optical system, with alignment light of a wavelength different from that of said exposure light; detection means for detecting, through said projection optical system, light from said alignment mark; an irradiation light correcting optical element for generating a longitudinal chromatic aberration and a chromatic aberration of magnification which are opposite, in direction, to the longitudinal chromatic aberration and the chromatic aberration of magnification of said projection optical system for the irradiation light, and a detection light correcting optical element for generating a chromatic aberration of magnification which is opposite, in direction, to the chromatic aberration of magnification of said projection optical system for the detection light, both elements being positioned between said reticle and said substrate; wherein said irradiation light correcting optical element is adapted to generate a longitudinal chromatic aberration equal to that of said projection optical system at a first position at which an image of said alignment mark is projected by said projection optical system onto said reticle under said irradiation light, and also to generate a chromatic aberration of magnification not less than that of said projection optical system at said first position, thereby deflecting the irradiation optical path toward the peripheral part of a non-exposure area of which boundary includes a second position where an image of said alignment mark is projected by said projection optical system onto said reticle under said exposure light; and said detection light correcting optical element is adapted to generate a chromatic aberration of magnification exceeding that of said projection optical system at said first position, thereby deflecting the detection optical path toward the peripheral part of the non-exposure are of which boundary contains said second position.

Claim 46

An alignment device adapted for use in an exposure apparatus equipped with a projection optical system for transferring a predetermined pattern, formed on a reticle, onto a substrate with an exposure light, and adapted for detecting the position of an alignment mark formed on said substrate, comprising: light irradiation means for irradiating said alignment mark, through said projection optical system, with alignment light of a wavelength different from that of said exposure light; detection means for detecting, through said projection optical system, light from said alignment mark; an irradiation light correcting optical element for generating a longitudinal chromatic aberration and a chromatic aberration of magnification which are opposite, in direction, to the longitudinal chromatic aberration and the chromatic aberration of magnification of said projection optical system for the irradiation light, and a detection light correcting optical element for generating a chromatic aberration of magnification which is opposite, in direction, to the chromatic aberration of magnification of said projection optical system for the detection light, both elements being positioned between said reticle and said substrate; wherein said irradiation light correcting optical element is adapted to generate a longitudinal chromatic aberration equal to that of said projection optical system at a first position at which an image of said alignment mark is projected by said projection optical system onto said reticle under said irradiation light, and also to generate a chromatic aberration of magnification not less than that of said projection optical system at said first position, thereby deflecting the irradiation optical path toward the peripheral part of a non-exposure area of which boundary includes a second position where an image of said alignment mark is projected by said projection optical system onto said reticle under said exposure light; and said detection light correcting optical element is adapted to generate a chromatic aberration of magnification exceeding that of said projection optical system at said first position, thereby deflecting the detection optical path toward the peripheral part of the non-exposure are of which boundary contains said second position.

Claim 47

An alignment device according to claim 42, wherein: said irradiation light correcting optical element includes first and second irradiation light correcting optical elements; and said first and second irradiation light correcting optical elements and said detection light correcting optical element are composed of phase diffraction gratings, of which step d satisfies a relationship: d=[(2m+1)λ.sub.a ]/[2(n.sub.a -1)] wherein λ a is the wavelength of the alignment light; n a is the refractive index of the phase diffraction gratings for the wavelength of the alignment light; and m is an integer.

Claim 48

An alignment device according to claim 42, wherein: said irradiation light correcting optical element includes first and second irradiation light correcting optical elements; and said first and second irradiation light correcting optical elements and said detection light correcting optical element are composed of phase diffraction gratings, of which step d satisfies a relationship: d=mλ.sub.e /(n.sub.e -1) wherein λ e is the wavelength of the exposure light; n e is the refractive index of the phase diffraction gratings for the wavelength of the exposure light; and m is an integer.

Claim 49

An alignment device according to claim 42, wherein: said irradiation light correcting optical element includes first and second irradiation light correcting optical elements; and said first and second irradiation light correcting optical elements and said detection light correcting optical element are composed of Fresnel zone plates.

Claim 50

An alignment device according to claim 45, wherein said Fresnel zone plates are composed of phase Fresnel zone plates formed by steps d which satisfy following relationship: d=[(2m+1)λ.sub.a ]/[2(n.sub.a -1)] wherein λ a is the wavelength of the alignment light; n a is the refractive index of the phase Fresnel zone plates for the alignment light; and m is an integer.

Claim 51

An alignment device according to claim 45, wherein said Fresnel zone plates are composed of phase Fresnel zone plates formed by steps d, which satisfy following relationship: d=mλ.sub.e (n.sub.e -1) wherein λ e is the wavelength of the exposure light; n e is the refractive index of the phase Fresnel zone plates for the wavelength of the exposure light; and m is an integer.

Claim 52

An alignment device adapted for use in an exposure apparatus equipped with a projection optical system for transferring a predetermined pattern, formed on a reticle, onto a substrate with an exposure light, and adapted for detecting the position of an alignment mark formed on said substrate, comprising: light irradiation means for irradiating said alignment mark, through said projection optical system, with alignment light of a wavelength different from that of said exposure light; detection means for detecting, through said projection optical system, light from said alignment mark; an irradiation light correcting optical element for generating a chromatic aberration which is opposite, in direction, to that of said projection optical system for the irradiation light, and a detection light correcting optical element for generating a longitudinal chromatic aberration and a chromatic aberration of magnification which are opposite, in direction, to those of said projection optical system for the detection light, both elements being positioned between said reticle and said substrate; wherein said irradiation light correcting optical element is adapted to generate a chromatic aberration of magnification exceeding that of said projection optical system at a first position at which an image of said alignment mark is projected by said projection optical system onto said reticle under said irradiation light, thereby deflecting the irradiation optical path toward the peripheral part of a non-exposure area of which boundary includes a second position where an image of said alignment mark is projected by said projection optical system onto said reticle under said exposure light; and said detection light correcting optical element is adapted to generate a longitudinal chromatic aberration equal to that of said projection optical system at said first position and also to generate a chromatic aberration of magnification exceeding that of said projection optical system at said first position, thereby deflecting the detection optical path toward the peripheral part of the non-exposure area of which boundary contains said second position.

Claim 53

An alignment device adapted for use in an exposure apparatus equipped with a projection optical system for transferring a predetermined pattern, formed on a reticle, onto a substrate with an exposure light, and adapted for detecting the position of an alignment mark formed on said substrate, comprising: light irradiation means for irradiating said alignment mark, through said projection optical system, with alignment light of a wavelength different from that of said exposure light; detection means for detecting, through said projection optical system, light from said alignment mark; an irradiation light correcting optical element for generating a chromatic aberration which is opposite, in direction, to that of said projection optical system for the irradiation light, and a detection light correcting optical element for generating a longitudinal chromatic aberration and a chromatic aberration of magnification which are opposite, in direction, to those of said projection optical system for the detection light, both elements being positioned between said reticle and said substrate; wherein said irradiation light correcting optical element is adapted to generate a chromatic aberration of magnification exceeding that of said projection optical system at a first position at which an image of said alignment mark is projected by said projection optical system onto said reticle under said irradiation light, thereby deflecting the irradiation optical path toward the peripheral part of a non-exposure area of which boundary includes a second position where an image of said alignment mark is projected by said projection optical system onto said reticle under said exposure light; and said detection light correcting optical element is adapted to generate a longitudinal chromatic aberration equal to that of said projection optical system at said first position and also to generate a chromatic aberration of magnification exceeding that of said projection optical system at said first position, thereby deflecting the detection optical path toward the peripheral part of the non-exposure area of which boundary contains said second position.

Claim 54

An alignment device according to claim 48, wherein: said detection light correcting optical element includes first and second detection light correcting optical elements; and said irradiation light correcting optical element and said first and second detection light correcting optical elements are composed of phase diffraction gratings, of which step d satisfies a relationship: d=[(2m+1)λ.sub.a ]/[2(n.sub.a -1)] wherein λ a is the wavelength of the alignment light; n a is the refractive index of the phase diffraction gratings for the wavelength of the alignment light; and m is an integer.

Claim 55

An alignment device according to claim 48, wherein: said detection light correcting optical element includes first and second detection light correcting optical elements; and said irradiation light correcting optical element and said first and second detection light correcting optical elements are composed of phase diffraction gratings, of which step d satisfies a relationship: d=mλ.sub.e /(n.sub.e -1) wherein λ e is the wavelength of the exposure light; n e is the refractive index of the phase diffraction gratings for the wavelength of the exposure light; and m is an integer.

Claim 56

An alignment device according to claim 48, wherein: said detection light correcting optical element includes first and second detection light correcting optical elements; and said irradiation light correcting optical element and said first and second detection light correcting optical elements are composed of Fresnel zone plates.

Claim 57

An alignment device according to claim 51, wherein said Fresnel zone plates are composed of phase Fresnel zone plates formed by steps d which satisfy following relationship: d=[(2m+1)λ.sub.a ]/2(n.sub.a -1)] wherein λ a is the wavelength of the alignment light; n a is the refractive index of the phase Fresnel zone plates for the alignment light; and m is an integer.

Claim 58

An alignment device according to claim 51, wherein said Fresnel zone plates are composed of phase Fresnel zone plates formed by steps d, which satisfy following relationship: d=mλ.sub.e (n.sub.e -1) wherein λ e is the wavelength of the exposure light; n e is the refractive index of the phase Fresnel zone plates for the wavelength of the exposure light; and m is an integer.