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US5230743A Expired / Lapsed US ⏱️ 0.0 years remaining

Method for single wafer processing in which a semiconductor wafer is contacted with a fluid

Assignee: Semitool Inc
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Filing: 1992-07-30
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Granted: 1993-07-27
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Expires: 2012-07-30
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Abstract

Abstract A single wafer processor supports a semiconductor wafer having at least one surface that is to be subjected to contact with a fluid. The equipment includes a portable module including a gripper assembly that is rotatable about the axis of a portable housing and is capable of mechanically engaging or disengaging the edge of an individual wafer. The portable module is complementary to a receiving base having an open bowl provided with liquid jets for discharging processing liquids or reagents in parallel streams directed toward the outer surface of a rotating wafer. The bowl can also be filled with liquid for immersion treatment of a wafer, which can be held stationary or rotated at slow speeds. The portable unit is moved between base units by a robotic arm. All elements associated with holding of the wafer are physically shielded to minimize wafer contamination from environmental contact.

Inventors

  • 👤 Raymon F. Thompson
  • 👤 Robert W. Gordon
  • 👤 Daniel Durado

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-01 02:33
CPC Classifications
H; H10; H10P; H10P72/00; H10P72/70; H10P72/76; H10P72/7604; H10P72/7624; H10P72/04; H10P72/0402; H10P72/0404

Claims Analysis

Total Claims: 6
Claim 1
Independent Claim 91 words
A method for single wafer processing in which a semiconductor wafer is subjected to contact with a fluid, comprising the following steps: engaging the edge of a wafer by releasable gripper means centered about a central axis on a portable housing; moving the portable housing to the location of a complementary open bowl formed about a bowl axis on a support surface; mounting the portable housing to the support surface with the wafer perpendicular to the bowl axis; and subjecting the wafer to contact with a fluid at the bowl interior.
Claim 2
Independent Claim 91 words
A method for single wafer processing in which a semiconductor wafer is subjected to contact with a fluid, comprising the following steps: engaging the edge of a wafer by releasable gripper means centered about a central axis on a portable housing; moving the portable housing to the location of a complementary open bowl formed about a bowl axis on a support surface; mounting the portable housing to the support surface with the wafer perpendicular to the bowl axis; and subjecting the wafer to contact with a fluid at the bowl interior.
Claim 3
Dependent Claim 33 words
The method of claim 1 and further comprising the step of rotating the grippers to rotate the wafer about the central axis of the portable housing while contacting the wafer with the fluid.
Claim 4
Dependent Claim 28 words
The method of claim 1 and further comprising the step of supporting the wafer by the grippers while immersing the wafer in a liquid contained in the bowl.
Claim 5
Dependent Claim 29 words
The method of claim 1 and further comprising the step of supporting the wafer by the grippers while the wafer is subjected to a liquid spray within the bowl.
Claim 6
Dependent Claim 33 words
The method of claim 1 and further comprising the step of rotating the grippers to rotate the wafer about the central axis of the bowl while spraying the wafer with a liquid spray.

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1996-07-26 1997-01-25 1997-07-27 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2000-07-26 2001-01-25 2001-07-27 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2004-07-26 2005-01-25 2005-07-27 $7700.00 Window Closed / Lapsed

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