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US5252181A
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US
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Method for cleaning the surface of a substrate with plasma
Assignee: Orange SA
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Filing: 1991-12-17
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Granted: 1993-10-12
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Expires: 2011-12-17
Abstract
Abstract Method for cleaning, with plasma, the surface of a substrate before another treatment, consisting: in a first cleaning step, in negatively polarizing the substrate and in subjecting it to an argon plasma, and in a second cleaning step, in subjecting the pretreated substrate to a hydrogen plasma, in order to ensure an efficient cleaning of the surface of the substrate. Application to the prior cleaning of a silicon substrate intended to receive an epitaxy.
Inventors
- 👤 Didier Dutartre
- 👤 Daniel Bensahel
- 👤 Jorge L. Regolini
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-07 21:30
CPC Classifications
H; H10; H10P; H10P70/00; H10P70/10; H10P70/12; B; B08; B08B; B08B7/00; B08B7/0035; C; C23; C23C; C23C14/00; C23C14/02; C23C14/021; C23C14/022; C23F; C23F4/00
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
68 words
Method for cleaning, with plasma, the surface of a substrate before the application of a treatment, wherein said method consists: in a first cleaning step, in polarizing negatively the substrate and in subjecting it to plasma, consisting of argon plasma and in a second cleaning step, in subjecting the pretreated substrate to a hydrogen plasma, in order to ensure an efficient cleaning of the surface of the substrate.
Claim 2
Dependent Claim
68 words
Method for cleaning, with plasma, the surface of a substrate before the application of a treatment, wherein said method consists: in a first cleaning step, in polarizing negatively the substrate and in subjecting it to plasma, consisting of argon plasma and in a second cleaning step, in subjecting the pretreated substrate to a hydrogen plasma, in order to ensure an efficient cleaning of the surface of the substrate.
Claim 3
Dependent Claim
22 words
Method as claimed in claim 1, wherein said method consists in performing the first and second cleaning steps, without using heating means.
Claim 4
Dependent Claim
29 words
Method as claimed in claim 1, wherein said method consists, during the first cleaning step, in polarizing negatively the substrate within a voltage range of 20 to 100 volts.
Claim 5
Dependent Claim
27 words
Method as claimed in claim 1, wherein said method consists in subjecting the substrate to an argon plasma whose ion energy ranges between 20 and 100 electron-volts.
Claim 6
Dependent Claim
27 words
Method as claimed in claim 1, wherein said method consists in subjecting the substrate to a hydrogen plasma whose ion energy is set to around the electron-volt.
Claim 7
Dependent Claim
20 words
Method as claimed in claim 1, wherein said method consists, in the second cleaning step, in polarizing positively the substrate.
Claim 8
Dependent Claim
22 words
Method as claimed in claim 1, wherein said method consists in performing the first and second cleaning steps in two different chambers.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1996-10-11 | 1997-04-12 | 1997-10-12 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2000-10-11 | 2001-04-12 | 2001-10-12 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2004-10-11 | 2005-04-12 | 2005-10-12 | $7700.00 | Window Closed / Lapsed |