US5261963A — CVD apparatus comprising exhaust gas condensation…

Claim 1

Independent Claim 144 words

Chemical vapor deposition apparatus, comprising: (a) a reactor having a chamber therein, said chamber having a coating region for coating a heated substrate and an exhaust region communicating with the coating region, said coating region having inlet means for introduction of a gaseous reactant stream therein for passing over the heated substrate to react therewith to form a coating thereon and generate a spent gas stream, said exhaust region having outlet means for exhausting the spent gas stream from the coating region, (b) means for supporting the substrate in the coating region, (c) means for heating the substrate to an elevated reaction temperature, and (d) condensing means disposed int he exhaust region inside the reactor chamber between said coating region and said outlet means for condensing excess, unreacted gaseous reactant from the spent gas stream before said spent gas stream enters said outlet means.

Claim 2

Dependent Claim 144 words

Chemical vapor deposition apparatus, comprising: (a) a reactor having a chamber therein, said chamber having a coating region for coating a heated substrate and an exhaust region communicating with the coating region, said coating region having inlet means for introduction of a gaseous reactant stream therein for passing over the heated substrate to react therewith to form a coating thereon and generate a spent gas stream, said exhaust region having outlet means for exhausting the spent gas stream from the coating region, (b) means for supporting the substrate in the coating region, (c) means for heating the substrate to an elevated reaction temperature, and (d) condensing means disposed int he exhaust region inside the reactor chamber between said coating region and said outlet means for condensing excess, unreacted gaseous reactant from the spent gas stream before said spent gas stream enters said outlet means.

Claim 3

Dependent Claim 27 words

The apparatus of claim 1 wherein said condensing means includes an enclosure disposed thereabout to provide a thermal barrier between the coating region and the condensing means.

Claim 4

Dependent Claim 42 words

The apparatus of claim 1 wherein said condensing means includes a plurality of apertured condensing members disposed in a stock in the exhaust region where the temperature of the spent gas stream is sufficiently low to condense excess, unreacted gaseous reactant therefrom.

Claim 5

Dependent Claim 48 words

The apparatus of claim 3 wherein the condensing means further includes an enclosure disposed about said condensing structure and configured to direct the spent gas stream from the coating region to flow through said condensing structure where said excess, unreacted gaseous reactant can condense onto said condensing structure.

Claim 6

Dependent Claim 69 words

The apparatus of claim 4 wherein the enclosure comprises (a) an upper tubular member disposed about the condensing structure and having an open lower end and (b) a collection member spaced beneath the tubular member so as to provide a peripheral opening therebetween through which the spent gas stream is directed to pass through condensing structure, said collection member collecting any condensed gaseous reactant falling from the condensing structure.

Claim 7

Dependent Claim 23 words

The apparatus of claim 3 wherein the condensing structure comprises a plurality of metal screens stacked atop one another in the exhaust region.

Claim 8

Dependent Claim 38 words

The apparatus of claim 3 wherein a reactor inlet conduit extends through the exhaust region to the coating region for supplying the gaseous reactant stream thereto, said condensing structure including a central opening for receiving the inlet conduit.

Claim 9

Dependent Claim 37 words

The apparatus of claim 1 wherein the reactor includes an upstanding chamber, said coating region being located in a lower portion of the chamber and the exhaust region being located in an upper region of the chamber.

Claim 10

Dependent Claim 14 words

The apparatus of claim 1 wherein the condensing means comprises an internally cooled structure.

Claim 11

Dependent Claim 15 words

The apparatus of claim 9 wherein the internally cooled structure comprises an internally cooled coil.

Claim 12

Dependent Claim 142 words

Chemical vapor deposition apparatus, comprising: (a) a reactor having a chamber with a coating region for coating a heated substrate and an exhaust region communicating wit the coating region, said coating region having inlet means for introduction of a gaseous reactant stream therein for passing over the heated substrate to react therewith to form a coating thereon and generate a spent gas stream, said exhaust region having outlet means for exhausting the spent gas stream from the coating region, (b) means for supporting the substrate in the coating region, (c) means for heating the substrate to an elevated reaction temperature, and (d) an apertured condensing structure disposed in the exhaust region where the temperature of the spent gas stream is reduced enough to condense excess, unreacted gaseous reactant from the spent gas stream before the spent gas stream enters said outlet means.

Claim 13

Dependent Claim 142 words

Chemical vapor deposition apparatus, comprising: (a) a reactor having a chamber with a coating region for coating a heated substrate and an exhaust region communicating wit the coating region, said coating region having inlet means for introduction of a gaseous reactant stream therein for passing over the heated substrate to react therewith to form a coating thereon and generate a spent gas stream, said exhaust region having outlet means for exhausting the spent gas stream from the coating region, (b) means for supporting the substrate in the coating region, (c) means for heating the substrate to an elevated reaction temperature, and (d) an apertured condensing structure disposed in the exhaust region where the temperature of the spent gas stream is reduced enough to condense excess, unreacted gaseous reactant from the spent gas stream before the spent gas stream enters said outlet means.

Claim 14

Dependent Claim 206 words

Chemical vapor deposition apparatus, comprising: (a) a reactor having a chamber with a coating region for coating a heated substrate and an exhaust region communicating with the coating region, said coating region having inlet means for introduction of a gaseous reactant stream therein for passing over the heated substrate to react therewith to form a coating thereon and generate a spent gas stream, said exhaust region having outlet means for exhausting the spent gas stream from the coating region, (b) means for supporting the substrate in the coating region, (c) means for heating the substrate to an elevated reaction temperature, and (d) condensing means comprising an apertured condensing structure disposed in the exhaust region and an enclosure disposed about the condensing structure, said enclosure including an upper tubular member disposed about the condensing structure and having an open lower end and including a collection member spaced beneath the tubular member so as to provide a peripheral opening therebetween through which the spent gas stream is directed from the coating region to flow through the condensing structure to condense excess, unreacted gaseous reactant from the spent gas stream before it enters the outlet means, said collection member collecting any condensed gaseous reactant falling from the condensing structure.

Claim 15

Dependent Claim 206 words

Chemical vapor deposition apparatus, comprising: (a) a reactor having a chamber with a coating region for coating a heated substrate and an exhaust region communicating with the coating region, said coating region having inlet means for introduction of a gaseous reactant stream therein for passing over the heated substrate to react therewith to form a coating thereon and generate a spent gas stream, said exhaust region having outlet means for exhausting the spent gas stream from the coating region, (b) means for supporting the substrate in the coating region, (c) means for heating the substrate to an elevated reaction temperature, and (d) condensing means comprising an apertured condensing structure disposed in the exhaust region and an enclosure disposed about the condensing structure, said enclosure including an upper tubular member disposed about the condensing structure and having an open lower end and including a collection member spaced beneath the tubular member so as to provide a peripheral opening therebetween through which the spent gas stream is directed from the coating region to flow through the condensing structure to condense excess, unreacted gaseous reactant from the spent gas stream before it enters the outlet means, said collection member collecting any condensed gaseous reactant falling from the condensing structure.

Claim 16

Dependent Claim 13 words

The apparatus of claim 12 wherein the collection member comprises a pan-shaped member.

Claim 17

Dependent Claim 42 words

The apparatus of claim 12 wherein the tubular member and the collection member include respective peripheral side walls proximate an outer side wall of the chamber to facilitate directing the spent gas stream from the coating region into the peripheral opening therebetween.

Claim 18

Dependent Claim 179 words

Chemical vapor deposition apparatus, comprising: (a) a reactor having a chamber with a coating region for coating a heated substrate and an exhaust region communicating with the coating region, said coating region having inlet means for introduction of a gaseous reactant stream therein for passing over the heated substrate to react therewith to form a coating thereon and generate a spent gas stream, said exhaust region having outlet means for exhausting the spent gas stream from the coating region, (b) conduit means extending through the exhaust region to the coating region and communicating to said inlet means for supplying the gaseous reactant stream thereto, (c) means for supporting the substrate in the coating region, (d) means for heating the substrate to an elevated reaction temperature, and (e) an apertured condensing structure disposed in the exhaust region where the temperature of the spent gas stream is reduced enough to condense excess, unreacted gaseous reactant from the spent gas stream before the spent gas stream enters said outlet means, said condensing structure including a central opening for receiving said conduit means.

Claim 19

Dependent Claim 179 words

Chemical vapor deposition apparatus, comprising: (a) a reactor having a chamber with a coating region for coating a heated substrate and an exhaust region communicating with the coating region, said coating region having inlet means for introduction of a gaseous reactant stream therein for passing over the heated substrate to react therewith to form a coating thereon and generate a spent gas stream, said exhaust region having outlet means for exhausting the spent gas stream from the coating region, (b) conduit means extending through the exhaust region to the coating region and communicating to said inlet means for supplying the gaseous reactant stream thereto, (c) means for supporting the substrate in the coating region, (d) means for heating the substrate to an elevated reaction temperature, and (e) an apertured condensing structure disposed in the exhaust region where the temperature of the spent gas stream is reduced enough to condense excess, unreacted gaseous reactant from the spent gas stream before the spent gas stream enters said outlet means, said condensing structure including a central opening for receiving said conduit means.

Claim 20

Dependent Claim 23 words

The apparatus of claim 15 wherein a reactor outlet conduit concentric with the inlet conduit communicates with the condensing structure in the enclosure.

Claim 21

Dependent Claim 164 words

Chemical vapor deposition apparatus, comprising: (a) a reactor having a chamber with an aluminizing coating region for forming an aluminide coating on a heated substrate and an exhaust region communicating with the coating region, said coating region having inlet means for introduction of a gaseous aluminum bearing reactant stream therein for passing over the heated substrate to react therewith to form the aluminide coating thereon and generate a spent gas stream, said exhaust region having outlet means for exhausting the spent gas stream from the coating region, (b) means for supporting the substrate in the aluminizing coating region, (c) means for heating the substrate to an elevated reaction temperature, and (d) means disposed in the exhaust region for condensing excess, unreacted gaseous reactant from the spent gas stream before entering the outlet, said condensing means including an apertured condensing structure disposed in the exhaust region where the temperature of the spent gas stream is sufficiently low to condense the excess, unreacted gaseous reactant therefrom.

Claim 22

Dependent Claim 164 words

Chemical vapor deposition apparatus, comprising: (a) a reactor having a chamber with an aluminizing coating region for forming an aluminide coating on a heated substrate and an exhaust region communicating with the coating region, said coating region having inlet means for introduction of a gaseous aluminum bearing reactant stream therein for passing over the heated substrate to react therewith to form the aluminide coating thereon and generate a spent gas stream, said exhaust region having outlet means for exhausting the spent gas stream from the coating region, (b) means for supporting the substrate in the aluminizing coating region, (c) means for heating the substrate to an elevated reaction temperature, and (d) means disposed in the exhaust region for condensing excess, unreacted gaseous reactant from the spent gas stream before entering the outlet, said condensing means including an apertured condensing structure disposed in the exhaust region where the temperature of the spent gas stream is sufficiently low to condense the excess, unreacted gaseous reactant therefrom.

Annuity Stage	Window Opens	Payment Deadline	Surcharge Period Until	Estimated Fee	Status
3.5 Years (Year 4)	1996-11-15	1997-05-17	1997-11-16	$2000.00	Window Closed / Lapsed
7.5 Years (Year 8)	2000-11-15	2001-05-17	2001-11-16	$3760.00	Window Closed / Lapsed
11.5 Years (Year 12)	2004-11-15	2005-05-17	2005-11-16	$7700.00	Window Closed / Lapsed

CVD apparatus comprising exhaust gas condensation means

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