Patent US5280154A successfully refreshed from Google Patents.
US5280154A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Radio frequency induction plasma processing system utilizing a uniform field coil
Assignee: International Business Machines Corp
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Filing: 1992-01-30
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Granted: 1994-01-18
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Expires: 2012-01-30
Abstract
Abstract A plasma processing apparatus comprising: a chamber for supporting a workpiece; an inlet for introducing a gas into the chamber; a coil of conductive material having a generally flattened configuration whereby to provide a at least one generally planar surface defined by parallel conductors disposed on the chamber; and apparatus for applying radio frequency energy to the coil.
Inventors
- 👤 Jerome J. Cuomo
- 👤 Charles R. Guarnieri
- 👤 Jeffrey A. Hopwood
- 👤 Stanley J. Whitehair
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 15:19
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/32009; H01J37/32082; H01J37/321
Claims Analysis
Total Claims: 14
Claim 1
Independent Claim
73 words
A plasma processing apparatus comprising: a chamber for supporting a workpiece; means for introducing a gas into said chamber; a coil of conductive material disposed on said chamber and including at least one generally flattened surface defined by straight parallel conductors, said generally flattened surface positioned to overlie and be generally parallel to said workpiece when said workpiece is supported in said chamber; and means for applying radio frequency energy to said coil.
Claim 2
Dependent Claim
73 words
A plasma processing apparatus comprising: a chamber for supporting a workpiece; means for introducing a gas into said chamber; a coil of conductive material disposed on said chamber and including at least one generally flattened surface defined by straight parallel conductors, said generally flattened surface positioned to overlie and be generally parallel to said workpiece when said workpiece is supported in said chamber; and means for applying radio frequency energy to said coil.
Claim 3
Dependent Claim
15 words
The apparatus of claim 1 wherein said coil is comprised of generally flat, strap-like material.
Claim 4
Dependent Claim
26 words
The apparatus of claim 1 wherein said coil includes a second flattened surface defined by parallel conductors and disposed generally parallel to the first flattened surface.
Claim 5
Dependent Claim
28 words
The apparatus of claim 3 wherein the conductors defining the first surface of said coil are generally parallel to the conductors defining the second surface of the coil.
Claim 6
Dependent Claim
22 words
The apparatus of claim 3 wherein the conductors defining the first and second surfaces of said coil are generally helical in configuration.
Claim 7
Dependent Claim
78 words
The apparatus of claim 3 and further including: a second coil having a generally flattened configuration whereby to provide a second pair of opposing, generally planar surfaces, said second coil positioned closely spaced to said first coil with the conductors defining said second coil generally at a ninety degree angle to the conductors defining said first coil; and means for providing RF energy to each of said first and second coils whereby to generate a rotating electromagnetic field.
Claim 8
Dependent Claim
38 words
The apparatus of claim 1 wherein said means for applying radio frequency energy to said coil includes: a source for generating said radio frequency energy; and an electrical circuit for coupling said radio frequency energy to said coil.
Claim 9
Dependent Claim
27 words
The plasma processing apparatus of claim 1 wherein the shape of said generally flattened surface of said coil is selected to match the shape of said workpiece.
Claim 10
Independent Claim
92 words
A method of operating a plasma processing apparatus, said apparatus comprising a chamber for supporting a workpiece in a controlled pressure environment, and means for introducing a gas into said chamber, said method comprising the steps of: placing a coil of conductive material, said coil including at least one generally flattened surface defined by straight parallel conductors, onto said chamber such that said generally flattened surface is positioned to overlie and be parallel to said workpiece when said workpiece is supported in said chamber; and applying radio frequency energy to said coil.
Claim 11
Independent Claim
92 words
A method of operating a plasma processing apparatus, said apparatus comprising a chamber for supporting a workpiece in a controlled pressure environment, and means for introducing a gas into said chamber, said method comprising the steps of: placing a coil of conductive material, said coil including at least one generally flattened surface defined by straight parallel conductors, onto said chamber such that said generally flattened surface is positioned to overlie and be parallel to said workpiece when said workpiece is supported in said chamber; and applying radio frequency energy to said coil.
Claim 12
Dependent Claim
15 words
The method of claim 9 wherein said coil is comprised of generally flat, strap-like material.
Claim 13
Dependent Claim
82 words
The method of claim 10 and further including the steps of: placing a second coil, said second coil having at least one generally flattened surface defined by parallel conductors, closely spaced to said first coil with the conductors defining said flattened surface of said second coil generally at a ninety degree angle to the conductors defining said flattened surface of said first coil; and applying RF energy to each of said first and second coils whereby to generate a rotating electromagnetic field.
Claim 14
Dependent Claim
25 words
The method of claim 9 wherein the shape of said generally flattened surface of said coil is selected to match the shape of said workpiece.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1997-01-17 | 1997-07-19 | 1998-01-18 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2001-01-17 | 2001-07-19 | 2002-01-18 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2005-01-17 | 2005-07-19 | 2006-01-18 | $7700.00 | Window Closed / Lapsed |