Patent US5290381A successfully refreshed from Google Patents.
US5290381A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Plasma etching apparatus
Assignee: Toshiba Corp
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Filing: 1991-11-27
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Granted: 1994-03-01
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Expires: 2011-11-27
Abstract
Abstract A plasma etching apparatus comprising a susceptor for holding a semiconductive wafer, a cooling jacket having a coolant of a large cooling capacity and capable of quickly cooling said susceptor to an intended low temperature, a process chamber enclosing the susceptor and the cooling jacket, a gas discharging mechanism for evacuating the process chamber, an insulating member interposed between the susceptor and the cooling jacket, a gas supply device for supplying gas to an O-ring holding groove arranged on the interface regions of the susceptor, the insulating member and the cooling section and a pressure control mechanism for controlling the pressure of the supplied gas.
Inventors
- 👤 Toshihisa Nozawa
- 👤 Junichi Arami
- 👤 Keiji Horioka
- 👤 Isahiro Hasegawa
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 21:41
CPC Classifications
H; H10; H10P; H10P50/00; H10P72/00; H10P72/04; H10P72/0402; H10P72/0418; H10P72/0421; H01; H01J; H01J37/00; H01J37/32; H01J37/32431; H10P72/70; H10P72/78; H01J2237/00; H01J2237/20; H01J2237/2001; H01J2237/32; H01J2237/33; H01J2237/334
Claims Analysis
Total Claims: 17
Claim 1
Independent Claim
91 words
A plasma etching apparatus comprising: a susceptor for holding an object to be etched; a cooling section for cooling said susceptor; a process chamber enclosing the susceptor and the cooling section; exhausting means for exhausting a gas in the process chamber; gas supply means for supplying a heat transfer gas at a interface region between the susceptor and the cooling section; heating means for heating the susceptor; and temperature detecting means for detecting a temperature of the susceptor, to thereby control heating of said heating means based on the detected temperature.
Claim 2
Dependent Claim
91 words
A plasma etching apparatus comprising: a susceptor for holding an object to be etched; a cooling section for cooling said susceptor; a process chamber enclosing the susceptor and the cooling section; exhausting means for exhausting a gas in the process chamber; gas supply means for supplying a heat transfer gas at a interface region between the susceptor and the cooling section; heating means for heating the susceptor; and temperature detecting means for detecting a temperature of the susceptor, to thereby control heating of said heating means based on the detected temperature.
Claim 3
Dependent Claim
39 words
A plasma etching apparatus according to claim 1, further comprising pressure control means for controlling the pressure to supply the heat transfer gas to the interface region, on the basis of a temperature detected by said temperature detecting means.
Claim 4
Dependent Claim
35 words
A plasma etching apparatus according to claim 1, whereby the pressure of the heat transfer gas supplied to an interface region between said heating means and the susceptor is controlled by said pressure control means.
Claim 5
Dependent Claim
24 words
A plasma etching apparatus according to claim 1, wherein a gas supply region is isolated and sealed against the atmosphere in the process chamber.
Claim 6
Dependent Claim
16 words
A plasma etching apparatus according to claim 1, wherein said heat transfer gas is inert gas.
Claim 7
Dependent Claim
21 words
A plasma etching apparatus according to claims 1, further comprising an insulation frame interposed between the susceptor and the cooling section.
Claim 8
Dependent Claim
28 words
A plasma etching apparatus according to claim 1, wherein the susceptor has an upper susceptor member and a lower susceptor member which are in a state of contact.
Claim 9
Dependent Claim
31 words
A plasma etching apparatus according to claim 7, further comprising means for adjusting the state of contact of the upper and lower susceptor members of the susceptor in the interface region.
Claim 10
Dependent Claim
37 words
A plasma etching apparatus according to claim 1, further comprising means for supplying gas to an interface region between the object and the susceptor, thereby controlling pressure of the heat transfer gas by said pressure control means.
Claim 11
Dependent Claim
47 words
A plasma etching apparatus according to claim 7, wherein the heat transfer gas is supplied to an interface region between the lower susceptor and the upper susceptor member, through an inner surface side of an O-ring holding groove formed in an upper surface of the lower susceptor.
Claim 12
Dependent Claim
38 words
A plasma etching apparatus according to claim 7, whereby the pressure of the heat transfer gas supplied to an interface region between the upper and lower susceptor members of the susceptor is controlled by said pressure control means.
Claim 13
Dependent Claim
36 words
A plasma etching apparatus according to claim 6, whereby the pressure of the heat transfer gas supplied to an interface region between the insulation frame and the cooling section is controlled by said pressure control means.
Claim 14
Dependent Claim
25 words
A plasma etching apparatus according to claim 6, wherein said insulation frame is made of material for electrically insulating said susceptor from said cooling section.
Claim 15
Dependent Claim
47 words
A plasma etching apparatus according to claim 6, wherein the heat transfer gas is supplied to the interface region between the insulation frame and the cooling section, and to that between the insulation frame and the susceptor, via an inner surface side of an O-ring holding groove.
Claim 16
Dependent Claim
37 words
A plasma etching apparatus according to claim 6, further comprising means for supplying gas to an interface region between the object and the susceptor, thereby controlling pressure of the heat transfer gas by said pressure control means.
Claim 17
Dependent Claim
35 words
A plasma etching apparatus according to claim 6, whereby the pressure of the heat transfer gas supplied to an interface region between the insulation frame and the susceptor is controlled by said pressure control means.
References Cited (Backward Citations)
US4508161A
Cited
US4565601A
Cited
US4609037A
Cited
US4771730A
Cited
JPS63141317A
Cited
JPS63227021A
Cited
JPS63229716A
Cited
US4931135A
Cited
JPH01268030A
Cited
EP0339580A2
Cited
US5078851A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1997-02-28 | 1997-08-30 | 1998-03-01 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2001-02-28 | 2001-08-30 | 2002-03-01 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2005-02-28 | 2005-08-30 | 2006-03-01 | $7700.00 | Window Closed / Lapsed |