Abstract A method of forming a capacitor on a semiconductor wafer includes: a) in a dry etching reactor, selectively anisotropically dry etching a capacitor contact opening having a minimum selected open dimension into an insulating dielectric layer utilizing selected gas flow rates of a reactive gas component and an inert gas bombarding component, the flow rate of the bombarding component significantly exceeding the flow rate of the reactive component to effectively produce a capacitor contact opening having grooved striated sidewalls and thereby defining female capacitor contact opening striations; b) providing a layer of an electrically conductive storage node material within the striated capacitor contact opening; c) removing at least a portion of the conductive material layer to define an isolated capacitor storage node within the insulating dielectric having striated sidewalls; d) etching the insulating dielectric layer selectively relative to the conductive material sufficiently to expose at least a portion of the external male striated conductive material sidewalls; and e) providing conformal layers of capacitor dielectric and capacitor cell material atop the etched conductive material and over its exposed striated sidewalls. The invention also includes a stacked capacitor construction having an electrically conductive storage node with upwardly rising external sidewalls. Such sidewalls have longitudinally extending striations to maximize surface area and corresponding capacitance in a resulting construction.
A stacked capacitor construction formed within a semiconductor substrate comprising: an electrically conductive storage node, the storage node having upwardly rising external sidewalls, the upwardly rising external sidewalls having longitudinally extending striations to maximize surface area and corresponding capacitance; a striated cell dielectric layer provided over the storage node and its associated longitudinally extending striations; and an electrically conductive striated cell layer provided over the striated cell dielectric layer.
Claim 2
Dependent Claim
69 words
A stacked capacitor construction formed within a semiconductor substrate comprising: an electrically conductive storage node, the storage node having upwardly rising external sidewalls, the upwardly rising external sidewalls having longitudinally extending striations to maximize surface area and corresponding capacitance; a striated cell dielectric layer provided over the storage node and its associated longitudinally extending striations; and an electrically conductive striated cell layer provided over the striated cell dielectric layer.
Claim 3
Dependent Claim
20 words
The stacked capacitor construction of claim 1 wherein the electrically conductive material of the storage node comprises conductively doped polysilicon.
Claim 4
Dependent Claim
20 words
The stacked capacitor construction of claim 1 wherein the electrically conductive material of the cell layer comprises conductively doped polysilicon.
Claim 5
Dependent Claim
33 words
The stacked capacitor construction of claim 1 wherein the electrically conductive material of the storage node comprises conductively doped polysilicon, and the electrically conductive material of the cell layer comprises conductively doped polysilicon.